Ultra Clean Processing Of Semiconductor Surfaces Xvi
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Author | : Paul Mertens |
Publisher | : Trans Tech Publications Ltd |
Total Pages | : 363 |
Release | : 2023-08-14 |
Genre | : Science |
ISBN | : 303641312X |
Selected peer-reviewed full text papers from the 16th International Symposium on Ultra Clean Processing of Semiconductor Surfaces (UCPSS 2023) Selected peer-reviewed full text papers from the 16th International Symposium on Ultra Clean Processing of Semiconductor Surfaces (UCPSS 2023), September 12-14, 2023, Brugge, Belgium
Author | : Paul Mertens |
Publisher | : |
Total Pages | : 0 |
Release | : 2023-09-14 |
Genre | : |
ISBN | : 9783036403120 |
Selected peer-reviewed full text papers from the 16th International Symposium on Ultra Clean Processing of Semiconductor Surfaces (UCPSS 2023) Selected peer-reviewed full text papers from the 16th International Symposium on Ultra Clean Processing of Semiconductor Surfaces (UCPSS 2023), September 12-14, 2023, Brugge, Belgium
Author | : Paul W. Mertens |
Publisher | : Trans Tech Publications Ltd |
Total Pages | : 395 |
Release | : 2016-09-05 |
Genre | : Technology & Engineering |
ISBN | : 3035730849 |
Selected, peer reviewed papers from the 13th International Symposium on Ultra Clean Processing of Semiconductor Surfaces (UCPSS), September 12-14, 2016, Knokke, Belgium
Author | : Paul Mertens |
Publisher | : Trans Tech Publications Ltd |
Total Pages | : 365 |
Release | : 2012-04-12 |
Genre | : Technology & Engineering |
ISBN | : 3038137006 |
Selected, peer reviewed papers from the 10th International Symposium on Ultra Clean Processing of Semiconductor Surfaces (UCPSS), September 20-22, 2010, Ostend, Belgium
Author | : Takeshi Hattori |
Publisher | : Springer Science & Business Media |
Total Pages | : 634 |
Release | : 2013-03-09 |
Genre | : Technology & Engineering |
ISBN | : 3662035359 |
A totally new concept for clean surface processing of Si wafers is introduced in this book. Some fifty distinguished researchers and engineers from the leading Japanese semiconductor companies, such as NEC, Hitachi, Toshiba, Sony and Panasonic as well as from several universities reveal to us for the first time the secrets of these highly productive institutions. They describe the techniques and equipment necessary for the preparation of clean high-quality semiconductor surfaces as a first step in high-yield/high-quality device production. This book thus opens the door to the manufacturing of reliable nanoscale devices and will be extremely useful for every engineer, physicist and technician involved in the production of silicon semiconductor devices.
Author | : Michael Liehr |
Publisher | : |
Total Pages | : 440 |
Release | : 1995 |
Genre | : Technology & Engineering |
ISBN | : |
Wafer cleaning, microcontamination and surface passivation are the key focus of this proceedings volume, the 3rd in a successful series from MRS. It is a field in which control of surface chemistry and surface morphology, as well as particle and molecular contamination removal, are of critical importance. This volume expands the scope of the topic to include ultraclean technology in a broader sense, emphasizing the identification and characterization of trace contamination, strategies for removal, and equipment considerations, as well as critical limits for impact on devices. Novel processes, such as chemical mechanical polishing (CMP), and their ramifications for contamination removal are also addressed.
Author | : Robert P. Donovan |
Publisher | : CRC Press |
Total Pages | : 461 |
Release | : 2018-10-08 |
Genre | : Technology & Engineering |
ISBN | : 1482289997 |
Recognizing the need for improved control measures in the manufacturing process of highly sensitized semiconductor technology, this practical reference provides in-depth and advanced treatment on the origins, procedures, and disposal of a variety of contaminants. It uses contemporary examples based on the latest hardware and processing apparatus to illustrate previously unavailable results and insights along with experimental and theoretical developments. Ensures the proper methods necessary to meet the standards established in the 1997 National Technology Roadmap for Semiconductors (NTRS)! Summarizing up-to-date control practices in the industry, Contamination-Free Manufacturing for Semiconductors and Other Precision Products: Details the physics and chemistry behind the mechanisms leading to contamination-induced failures Considers particles and molecular contaminants, including the entire spectrum of mass-based contaminants Outlines primary contamination problems and target control levels Reveals and offers solutions to inadequate areas of measurement capability and control technology Clarifies significant problems and decisions facing the industry by analyzing NTRS standards and contamination mechanisms Containing over 700 literature references, drawings, photographs, equations, and tables, Contamination-Free Manufacturing for Semiconductors and Other Precision Products is an essential reference for electrical and electronics, instrumentation, process, manufacturing, development, contamination control and quality engineers; physicists; and upper-level undergraduate and graduate students in these disciplines.
Author | : |
Publisher | : |
Total Pages | : 426 |
Release | : 2004 |
Genre | : Contamination control |
ISBN | : |
Author | : Richard E. Novak |
Publisher | : The Electrochemical Society |
Total Pages | : 642 |
Release | : 1996 |
Genre | : Technology & Engineering |
ISBN | : 9781566771153 |
Author | : |
Publisher | : The Electrochemical Society |
Total Pages | : 636 |
Release | : 2000 |
Genre | : Technology & Engineering |
ISBN | : 9781566772594 |