Study On Amorphous Silicon Thin Films By Plasma Enhanced Chemical Vapor Deposition
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Fundamental Studies of Defect Generation in Amorphous Silicon Alloys Grown by Remote Plasma-enhanced Chemical-vapor Deposition (remote PECVD)
Author | : G. Lucovsky |
Publisher | : |
Total Pages | : 44 |
Release | : 1993 |
Genre | : Photovoltaic cells |
ISBN | : |
Amorphous and Heterogeneous Silicon Thin Films - 2000: Volume 609
Author | : Robert W. Collins |
Publisher | : |
Total Pages | : 1118 |
Release | : 2001-04-10 |
Genre | : Science |
ISBN | : |
The MRS Symposium Proceeding series is an internationally recognised reference suitable for researchers and practitioners.
Plasma Deposition of Amorphous Silicon-Based Materials
Author | : Pio Capezzuto |
Publisher | : Elsevier |
Total Pages | : 339 |
Release | : 1995-10-10 |
Genre | : Science |
ISBN | : 0080539106 |
Semiconductors made from amorphous silicon have recently become important for their commercial applications in optical and electronic devices including FAX machines, solar cells, and liquid crystal displays. Plasma Deposition of Amorphous Silicon-Based Materials is a timely, comprehensive reference book written by leading authorities in the field. This volume links the fundamental growth kinetics involving complex plasma chemistry with the resulting semiconductor film properties and the subsequent effect on the performance of the electronic devices produced. - Focuses on the plasma chemistry of amorphous silicon-based materials - Links fundamental growth kinetics with the resulting semiconductor film properties and performance of electronic devices produced - Features an international group of contributors - Provides the first comprehensive coverage of the subject, from deposition technology to materials characterization to applications and implementation in state-of-the-art devices
Study of Plasma-enhanced Chemical Vapor Deposition of Silicon Thin Films
Author | : Guanghui Yao |
Publisher | : |
Total Pages | : 148 |
Release | : 1997 |
Genre | : Plasma-enhanced chemical vapor deposition |
ISBN | : |
Carbide, Nitride and Boride Materials Synthesis and Processing
Author | : A.W. Weimer |
Publisher | : Springer Science & Business Media |
Total Pages | : 675 |
Release | : 2012-12-06 |
Genre | : Technology & Engineering |
ISBN | : 9400900716 |
Carbide, Nitride and Boride Materials Synthesis and Processing is a major reference text addressing methods for the synthesis of non-oxides. Each chapter has been written by an expert practising in the subject area, affiliated with industry, academia or government research, thus providing a broad perspective of information for the reader. The subject matter ranges from materials properties and applications to methods of synthesis including pre- and post-synthesis processing. Although most of the text is concerned with the synthesis of powders, chapters are included for other materials such as whiskers, platelets, fibres and coatings. Carbide, Nitride and Boride Materials Synthesis and Processing is a comprehensive overview of the subject and is suitable for practitioners in the industry as well as those looking for an introduction to the field. It will be of interest to chemical, mechanical and ceramic engineers, materials scientists and chemists in both university and industrial environments working on or with refractory carbides, nitrides and borides.