Spectroscopic Ellipsometry And Reflectometry Users Guide
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Author | : Harland G. Tompkins |
Publisher | : Wiley-Interscience |
Total Pages | : 0 |
Release | : 1999-03-18 |
Genre | : Science |
ISBN | : 9780471181729 |
While single wave ellipsometry has been around for years, spectroscopic ellipsometry is fast becoming the method of choice for measuring the thickness and optical properties of thin films. This book provides the first practical introduction to spectroscopic ellipsometry and the related techniques of reflectometry. A guide for practitioners and researchers in a variety of disciplines, it addresses a broad range of applications in physics, chemistry, electrical engineering, and materials science.
Author | : Harland G. Tompkins |
Publisher | : Momentum Press |
Total Pages | : 138 |
Release | : 2015-12-16 |
Genre | : Technology & Engineering |
ISBN | : 1606507281 |
Ellipsometry is an experimental technique for determining the thickness and optical properties of thin films. It is ideally suited for films ranging in thickness from sub-nanometer to several microns. Spectroscopic measurements have greatly expanded the capabilities of this technique and introduced its use into all areas where thin films are found: semiconductor devices, flat panel and mobile displays, optical coating stacks, biological and medical coatings, protective layers, and more. While several scholarly books exist on the topic, this book provides a good introduction to the basic theory of the technique and its common applications. The target audience is not the ellipsometry scholar, but process engineers and students of materials science who are experts in their own fields and wish to use ellipsometry to measure thin film properties without becoming an expert in ellipsometry itself.
Author | : Harland Tompkins |
Publisher | : William Andrew |
Total Pages | : 887 |
Release | : 2005-01-06 |
Genre | : Science |
ISBN | : 0815517475 |
The Handbook of Ellipsometry is a critical foundation text on an increasingly critical subject. Ellipsometry, a measurement technique based on phase and amplitude changes in polarized light, is becoming popular in a widening array of applications because of increasing miniaturization of integrated circuits and breakthroughs in knowledge of biological macromolecules deriving from DNA and protein surface research. Ellipsometry does not contact or damage samples, and is an ideal measurement technique for determining optical and physical properties of materials at the nano scale. With the acceleration of new instruments and applications now occurring, this book provides an essential foundation for the current science and technology of ellipsometry for scientists and engineers in industry and academia at the forefront of nanotechnology developments in instrumentation, integrated circuits, biotechnology, and pharmaceuticals. Divided into four parts, this comprehensive handbook covers the theory of ellipsometry, instrumentation, applications, and emerging areas. Experts in the field contributed to its twelve chapters, covering various aspects of ellipsometry.
Author | : Michael Bass |
Publisher | : McGraw Hill Professional |
Total Pages | : 1251 |
Release | : 2009-10-06 |
Genre | : Technology & Engineering |
ISBN | : 0071629254 |
The most comprehensive and up-to-date optics resource available Prepared under the auspices of the Optical Society of America, the five carefully architected and cross-referenced volumes of the Handbook of Optics, Third Edition, contain everything a student, scientist, or engineer requires to actively work in the field. From the design of complex optical systems to world-class research and development methods, this definitive publication provides unparalleled access to the fundamentals of the discipline and its greatest minds. Individual chapters are written by the world's most renowned experts who explain, illustrate, and solve the entire field of optics. Each volume contains a complete chapter listing for the entire Handbook, extensive chapter glossaries, and a wealth of references. This pioneering work offers unprecedented coverage of optics data, techniques, and applications. Volume I covers geometrical and physical optics, polarized light, components, and instruments.
Author | : Hiroyuki Fujiwara |
Publisher | : John Wiley & Sons |
Total Pages | : 388 |
Release | : 2007-09-27 |
Genre | : Technology & Engineering |
ISBN | : 9780470060186 |
Ellipsometry is a powerful tool used for the characterization of thin films and multi-layer semiconductor structures. This book deals with fundamental principles and applications of spectroscopic ellipsometry (SE). Beginning with an overview of SE technologies the text moves on to focus on the data analysis of results obtained from SE, Fundamental data analyses, principles and physical backgrounds and the various materials used in different fields from LSI industry to biotechnology are described. The final chapter describes the latest developments of real-time monitoring and process control which have attracted significant attention in various scientific and industrial fields.
Author | : Rointan Framroze Bunshah |
Publisher | : William Andrew |
Total Pages | : 888 |
Release | : 1994 |
Genre | : Science |
ISBN | : 0815513372 |
This second edition, edited by the world-renowned Dr. Rointain Bunshah, is an extensive update of the many improvements in deposition technologies, mechanisms, and applications. Considerably more material was added in Plasma Assisted Vapor Deposition processes, as well as Metallurgical Coating Applications.
Author | : Rointan F. Bunshah |
Publisher | : William Andrew |
Total Pages | : 887 |
Release | : 1994-12-31 |
Genre | : Science |
ISBN | : 0815517467 |
This second edition, edited by the world-renowned Dr. Rointain Bunshah, is an extensive update of the many improvements in deposition technologies, mechanisms, and applications. Considerably more material was added in Plasma Assisted Vapor Deposition processes, as well as Metallurgical Coating Applications.
Author | : Syed Rizvi |
Publisher | : CRC Press |
Total Pages | : 728 |
Release | : 2018-10-03 |
Genre | : Technology & Engineering |
ISBN | : 1420028782 |
As the semiconductor industry attempts to increase the number of functions that will fit into the smallest space on a chip, it becomes increasingly important for new technologies to keep apace with these demands. Photomask technology is one of the key areas to achieving this goal. Although brief overviews of photomask technology exist in the literature, the Handbook of Photomask Manufacturing Technology is the first in-depth, comprehensive treatment of existing and emerging photomask technologies available. The Handbook of Photomask Manufacturing Technology features contributions from 40 internationally prominent authors from industry, academia, government, national labs, and consortia. These authors discuss conventional masks and their supporting technologies, as well as next-generation, non-optical technologies such as extreme ultraviolet, electron projection, ion projection, and x-ray lithography. The book begins with an overview of the history of photomask development. It then demonstrates the steps involved in designing, producing, testing, inspecting, and repairing photomasks, following the sequences observed in actual production. The text also includes sections on materials used as well as modeling and simulation. Continued refinements in the photomask-making process have ushered in the sub-wavelength era in nanolithography. This invaluable handbook synthesizes these refinements and provides the tools and possibilities necessary to reach the next generation of microfabrication technologies.
Author | : Hiroyuki Fujiwara |
Publisher | : Springer |
Total Pages | : 602 |
Release | : 2019-01-10 |
Genre | : Science |
ISBN | : 3319753770 |
This book provides a basic understanding of spectroscopic ellipsometry, with a focus on characterization methods of a broad range of solar cell materials/devices, from traditional solar cell materials (Si, CuInGaSe2, and CdTe) to more advanced emerging materials (Cu2ZnSnSe4, organics, and hybrid perovskites), fulfilling a critical need in the photovoltaic community. The book describes optical constants of a variety of semiconductor light absorbers, transparent conductive oxides and metals that are vital for the interpretation of solar cell characteristics and device simulations. It is divided into four parts: fundamental principles of ellipsometry; characterization of solar cell materials/structures; ellipsometry applications including optical simulations of solar cell devices and online monitoring of film processing; and the optical constants of solar cell component layers.
Author | : Ahmed Busnaina |
Publisher | : CRC Press |
Total Pages | : 432 |
Release | : 2017-12-19 |
Genre | : Technology & Engineering |
ISBN | : 1420004921 |
Breakthroughs in nanotechnology have been coming at a rapid pace over the past few years. This was fueled by significant worldwide investments by governments and industry. But if these promising young technologies cannot begin to show commercial viability soon, that funding is in danger of disappearing as investors lose their appetites and the economic and scientific promise of nanotechnology may not be realized. Scrutinizing the barriers to commercial scale-up of nanotechnologies, the Nanomanufacturing Handbook presents a broad survey of the research being done to bring nanotechnology out of the laboratory and into the factory. Current research into nanotechnology focuses on the underlying science, but as this forward-looking handbook points out, the immediate need is for research into scale-up, process robustness, and system integration issues. Taking that message to heart, this book collects cutting-edge research from top experts who examine such topics as surface-programmed assembly, fabrication and applications of single-walled carbon nanotubes (SWNTs) including nanoelectronics, manufacturing nanoelectrical contacts, room-temperature nanoimprint and nanocontact technologies, nanocontacts and switch reliability, defects and surface preparation, and other innovative, application-driven initiatives. In addition to these technical issues, the author provides a survey of the current state of nanomanufacturing in the United States—the first of its kind—and coverage also reaches into patenting nanotechnologies as well as regulatory and societal issues. With timely, authoritative coverage accompanied by numerous illustrations, the Nanomanufacturing Handbook clarifies the current challenges facing industrial-scale nanotechnologies and outlines advanced tools and strategies that will help overcome them.