Spectroscopic Ellipsometry And Reflectometry
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| Author | : Harland G. Tompkins |
| Publisher | : Wiley-Interscience |
| Total Pages | : 0 |
| Release | : 1999-03-18 |
| Genre | : Science |
| ISBN | : 9780471181729 |
While single wave ellipsometry has been around for years, spectroscopic ellipsometry is fast becoming the method of choice for measuring the thickness and optical properties of thin films. This book provides the first practical introduction to spectroscopic ellipsometry and the related techniques of reflectometry. A guide for practitioners and researchers in a variety of disciplines, it addresses a broad range of applications in physics, chemistry, electrical engineering, and materials science.
| Author | : Harland G. Tompkins |
| Publisher | : Momentum Press |
| Total Pages | : 138 |
| Release | : 2015-12-16 |
| Genre | : Technology & Engineering |
| ISBN | : 1606507281 |
Ellipsometry is an experimental technique for determining the thickness and optical properties of thin films. It is ideally suited for films ranging in thickness from sub-nanometer to several microns. Spectroscopic measurements have greatly expanded the capabilities of this technique and introduced its use into all areas where thin films are found: semiconductor devices, flat panel and mobile displays, optical coating stacks, biological and medical coatings, protective layers, and more. While several scholarly books exist on the topic, this book provides a good introduction to the basic theory of the technique and its common applications. The target audience is not the ellipsometry scholar, but process engineers and students of materials science who are experts in their own fields and wish to use ellipsometry to measure thin film properties without becoming an expert in ellipsometry itself.
| Author | : Hiroyuki Fujiwara |
| Publisher | : John Wiley & Sons |
| Total Pages | : 388 |
| Release | : 2007-09-27 |
| Genre | : Technology & Engineering |
| ISBN | : 9780470060186 |
Ellipsometry is a powerful tool used for the characterization of thin films and multi-layer semiconductor structures. This book deals with fundamental principles and applications of spectroscopic ellipsometry (SE). Beginning with an overview of SE technologies the text moves on to focus on the data analysis of results obtained from SE, Fundamental data analyses, principles and physical backgrounds and the various materials used in different fields from LSI industry to biotechnology are described. The final chapter describes the latest developments of real-time monitoring and process control which have attracted significant attention in various scientific and industrial fields.
| Author | : Karsten Hinrichs |
| Publisher | : Springer Science & Business Media |
| Total Pages | : 369 |
| Release | : 2013-10-24 |
| Genre | : Science |
| ISBN | : 3642401287 |
Ellipsometry is the method of choice to determine the properties of surfaces and thin films. It provides comprehensive and sensitive characterization in contactless and non-invasive measurements. This book gives a state-of-the-art survey of ellipsometric investigations of organic films and surfaces, from laboratory to synchrotron applications, with a special focus on in-situ use in processing environments and at solid-liquid interfaces. In conjunction with the development of functional organic, meta- and hybrid materials for new optical, electronic, sensing and biotechnological devices and fabrication advances, the ellipsometric analysis of their optical and material properties has progressed rapidly in the recent years.
| Author | : Maria Losurdo |
| Publisher | : Springer Science & Business Media |
| Total Pages | : 740 |
| Release | : 2013-03-12 |
| Genre | : Technology & Engineering |
| ISBN | : 3642339565 |
This book presents and introduces ellipsometry in nanoscience and nanotechnology making a bridge between the classical and nanoscale optical behaviour of materials. It delineates the role of the non-destructive and non-invasive optical diagnostics of ellipsometry in improving science and technology of nanomaterials and related processes by illustrating its exploitation, ranging from fundamental studies of the physics and chemistry of nanostructures to the ultimate goal of turnkey manufacturing control. This book is written for a broad readership: materials scientists, researchers, engineers, as well as students and nanotechnology operators who want to deepen their knowledge about both basics and applications of ellipsometry to nanoscale phenomena. It starts as a general introduction for people curious to enter the fields of ellipsometry and polarimetry applied to nanomaterials and progresses to articles by experts on specific fields that span from plasmonics, optics, to semiconductors and flexible electronics. The core belief reflected in this book is that ellipsometry applied at the nanoscale offers new ways of addressing many current needs. The book also explores forward-looking potential applications.
| Author | : Olaf Stenzel |
| Publisher | : Springer |
| Total Pages | : 474 |
| Release | : 2018-03-09 |
| Genre | : Science |
| ISBN | : 3319753258 |
This book is an up-to-date survey of the major optical characterization techniques for thin solid films. Emphasis is placed on practicability of the various approaches. Relevant fundamentals are briefly reviewed before demonstrating the application of these techniques to practically relevant research and development topics. The book is written by international top experts, all of whom are involved in industrial research and development projects.
| Author | : Alain C. Diebold |
| Publisher | : CRC Press |
| Total Pages | : 703 |
| Release | : 2001-06-29 |
| Genre | : Technology & Engineering |
| ISBN | : 0203904540 |
Containing more than 300 equations and nearly 500 drawings, photographs, and micrographs, this reference surveys key areas such as optical measurements and in-line calibration methods. It describes cleanroom-based measurement technology used during the manufacture of silicon integrated circuits and covers model-based, critical dimension, overlay
| Author | : Jai Singh |
| Publisher | : John Wiley & Sons |
| Total Pages | : 667 |
| Release | : 2020-01-07 |
| Genre | : Science |
| ISBN | : 111950631X |
Provides a semi-quantitative approach to recent developments in the study of optical properties of condensed matter systems Featuring contributions by noted experts in the field of electronic and optoelectronic materials and photonics, this book looks at the optical properties of materials as well as their physical processes and various classes. Taking a semi-quantitative approach to the subject, it presents a summary of the basic concepts, reviews recent developments in the study of optical properties of materials and offers many examples and applications. Optical Properties of Materials and Their Applications, 2nd Edition starts by identifying the processes that should be described in detail and follows with the relevant classes of materials. In addition to featuring four new chapters on optoelectronic properties of organic semiconductors, recent advances in electroluminescence, perovskites, and ellipsometry, the book covers: optical properties of disordered condensed matter and glasses; concept of excitons; photoluminescence, photoinduced changes, and electroluminescence in noncrystalline semiconductors; and photoinduced bond breaking and volume change in chalcogenide glasses. Also included are chapters on: nonlinear optical properties of photonic glasses; kinetics of the persistent photoconductivity in crystalline III-V semiconductors; and transparent white OLEDs. In addition, readers will learn about excitonic processes in quantum wells; optoelectronic properties and applications of quantum dots; and more. Covers all of the fundamentals and applications of optical properties of materials Includes theory, experimental techniques, and current and developing applications Includes four new chapters on optoelectronic properties of organic semiconductors, recent advances in electroluminescence, perovskites, and ellipsometry Appropriate for materials scientists, chemists, physicists and electrical engineers involved in development of electronic materials Written by internationally respected professionals working in physics and electrical engineering departments and government laboratories Optical Properties of Materials and Their Applications, 2nd Edition is an ideal book for senior undergraduate and postgraduate students, and teaching and research professionals in the fields of physics, chemistry, chemical engineering, materials science, and materials engineering.
| Author | : Gertjan Koster |
| Publisher | : Elsevier |
| Total Pages | : 295 |
| Release | : 2011-10-05 |
| Genre | : Technology & Engineering |
| ISBN | : 0857094955 |
Advanced techniques for characterizing thin film growth in situ help to develop improved understanding and faster diagnosis of issues with the process. In situ characterization of thin film growth reviews current and developing techniques for characterizing the growth of thin films, covering an important gap in research.Part one covers electron diffraction techniques for in situ study of thin film growth, including chapters on topics such as reflection high-energy electron diffraction (RHEED) and inelastic scattering techniques. Part two focuses on photoemission techniques, with chapters covering ultraviolet photoemission spectroscopy (UPS), X-ray photoelectron spectroscopy (XPS) and in situ spectroscopic ellipsometry for characterization of thin film growth. Finally, part three discusses alternative in situ characterization techniques. Chapters focus on topics such as ion beam surface characterization, real time in situ surface monitoring of thin film growth, deposition vapour monitoring and the use of surface x-ray diffraction for studying epitaxial film growth.With its distinguished editors and international team of contributors, In situ characterization of thin film growth is a standard reference for materials scientists and engineers in the electronics and photonics industries, as well as all those with an academic research interest in this area. - Chapters review electron diffraction techniques, including the methodology for observations and measurements - Discusses the principles and applications of photoemission techniques - Examines alternative in situ characterisation techniques
| Author | : Michel Grediac |
| Publisher | : John Wiley & Sons |
| Total Pages | : 376 |
| Release | : 2012-12-17 |
| Genre | : Science |
| ISBN | : 1118578473 |
This timely book presents cutting-edge developments by experts in the field on the rapidly developing and scientifically challenging area of full-field measurement techniques used in solid mechanics – including photoelasticity, grid methods, deflectometry, holography, speckle interferometry and digital image correlation. The evaluation of strains and the use of the measurements in subsequent parameter identification techniques to determine material properties are also presented. Since parametric identification techniques require a close coupling of theoretical models and experimental measurements, the book focuses on specific modeling approaches that include finite element model updating, the equilibrium gap method, constitutive equation gap method, virtual field method and reciprocity gap method. In the latter part of the book, the authors discuss two particular applications of selected methods that are of special interest to many investigators: the analysis of localized phenomenon and connections between microstructure and constitutive laws. The final chapter highlights infrared measurements and their use in the mechanics of materials. Written and edited by knowledgeable scientists, experts in their fields, this book will be a valuable resource for all students, faculties and scientists seeking to expand their understanding of an important, growing research area
