Remote Microwave-enhanced Chemical Vapor Deposition of Silicon-nitrogen (SixNy) Thin Films
Author | : Gary M. Gladysz |
Publisher | : |
Total Pages | : 96 |
Release | : 1991 |
Genre | : Protective coatings |
ISBN | : |
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Author | : Gary M. Gladysz |
Publisher | : |
Total Pages | : 96 |
Release | : 1991 |
Genre | : Protective coatings |
ISBN | : |
Author | : Madan Gopal |
Publisher | : |
Total Pages | : 0 |
Release | : 1991 |
Genre | : Protective coatings |
ISBN | : |
Author | : Ram Ekwal Sah |
Publisher | : The Electrochemical Society |
Total Pages | : 606 |
Release | : 2005 |
Genre | : Nature |
ISBN | : 9781566774598 |
Author | : Vikram J. Kapoor |
Publisher | : The Electrochemical Society |
Total Pages | : 644 |
Release | : 1994 |
Genre | : Science |
ISBN | : 9781566770484 |
Author | : Guanghui Yao |
Publisher | : |
Total Pages | : 148 |
Release | : 1997 |
Genre | : Plasma-enhanced chemical vapor deposition |
ISBN | : |
Author | : DW. Hess |
Publisher | : |
Total Pages | : 8 |
Release | : 1983 |
Genre | : Chemical vapor deposition |
ISBN | : |
The use of a radio frequency (rf) glow discharge or plasma has recently come into favor for the deposition of thin films. In plasma-enhanced chemical vapor deposition (PECVD), chemical reactions can be carried out at low (