Optimal Programmed Rate Chemical Vapor Deposition of Tungsten
Author | : John Joseph Kristof |
Publisher | : |
Total Pages | : 216 |
Release | : 2000 |
Genre | : Chemical vapor deposition |
ISBN | : |
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Author | : John Joseph Kristof |
Publisher | : |
Total Pages | : 216 |
Release | : 2000 |
Genre | : Chemical vapor deposition |
ISBN | : |
Author | : Kathryn M. Tracy |
Publisher | : |
Total Pages | : 246 |
Release | : 1996 |
Genre | : Chemical vapor deposition |
ISBN | : |
Author | : Electrochemical Society. High Temperature Materials Division |
Publisher | : The Electrochemical Society |
Total Pages | : 1686 |
Release | : 1997 |
Genre | : Science |
ISBN | : 9781566771788 |
Author | : S Neralla |
Publisher | : BoD – Books on Demand |
Total Pages | : 292 |
Release | : 2016-08-31 |
Genre | : Science |
ISBN | : 9535125729 |
This book provides an overview of chemical vapor deposition (CVD) methods and recent advances in developing novel materials for application in various fields. CVD has now evolved into the most widely used technique for growth of thin films in electronics industry. Several books on CVD methods have emerged in the past, and thus the scope of this book goes beyond providing fundamentals of the CVD process. Some of the chapters included highlight current limitations in the CVD methods and offer alternatives in developing coatings through overcoming these limitations.
Author | : M. L. Hitchman |
Publisher | : Academic Press |
Total Pages | : 692 |
Release | : 1993-04-13 |
Genre | : Science |
ISBN | : |
This wide-ranging volume covers recent developments in the theoretical understanding of the chemistry and physics of chemical vapour deposition (CVD). Contributors are drawn from both academia and industry to achieve a balaced coverage of the subject. The volume emphasizes principles and understanding rather than details of specific materials or processes. Specific examples are given to illustrate the principles.
Author | : Arthur Sherman |
Publisher | : William Andrew |
Total Pages | : 240 |
Release | : 1987 |
Genre | : Computers |
ISBN | : |
Presents an extensive, comprehensive study of chemical vapor deposition (CVD). Understanding CVD requires knowledge of fluid mechanics, plasma physics, chemical thermodynamics, and kinetics as well as homogenous and heterogeneous chemical reactions. This text presents these aspects of CVD in an integrated fashion, and also reviews films for use in integrated circuit technology.
Author | : Jong-Hee Park |
Publisher | : ASM International |
Total Pages | : 477 |
Release | : 2001 |
Genre | : Technology & Engineering |
ISBN | : 161503224X |
Author | : D.M. Dobkin |
Publisher | : Springer Science & Business Media |
Total Pages | : 277 |
Release | : 2013-03-09 |
Genre | : Technology & Engineering |
ISBN | : 9401703698 |
Principles of Chemical Vapor Deposition provides a simple introduction to heat and mass transfer, surface and gas phase chemistry, and plasma discharge characteristics. In addition, the book includes discussions of practical films and reactors to help in the development of better processes and equipment. This book will assist workers new to chemical vapor deposition (CVD) to understand CVD reactors and processes and to comprehend and exploit the literature in the field. The book reviews several disparate fields with which many researchers may have only a passing acquaintance, such as heat and mass transfer, discharge physics, and surface chemistry, focusing on key issues relevant to CVD. The book also examines examples of realistic industrial reactors and processes with simplified analysis to demonstrate how to apply the principles to practical situations. The book does not attempt to exhaustively survey the literature or to intimidate the reader with irrelevant mathematical apparatus. This book is as simple as possible while still retaining the essential physics and chemistry. The book is generously illustrated to assist the reader in forming the mental images which are the basis of understanding.
Author | : Srinivasan Sivaram |
Publisher | : Springer Science & Business Media |
Total Pages | : 302 |
Release | : 2013-11-11 |
Genre | : Technology & Engineering |
ISBN | : 1475747519 |
In early 1987 I was attempting to develop a CVD-based tungsten process for Intel. At every step ofthe development, information that we were collecting had to be analyzed in light of theories and hypotheses from books and papers in many unrelated subjects. Thesesources were so widely different that I came to realize there was no unifying treatment of CVD and its subprocesses. More interestingly, my colleagues in the industry were from many disciplines (a surface chemist, a mechanical engineer, a geologist, and an electrical engineer werein my group). To help us understand the field of CVD and its players, some of us organized the CVD user's group of Northern California in 1988. The idea for writing a book on the subject occurred to me during that time. I had already organized my thoughts for a course I taught at San Jose State University. Later Van Nostrand agreed to publish my book as a text intended for students at the senior/first year graduate level and for process engineers in the microelectronics industry, This book is not intended to be bibliographical, and it does not cover every new material being studied for chemical vapor deposition. On the other hand, it does present the principles of CVD at a fundamental level while uniting them with the needs of the microelectronics industry.