Processing Techniques For The Fabrication Of Gaas Algaas Quantum Well Waveguide Devices
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Author | : J. T. Lie |
Publisher | : CRC Press |
Total Pages | : 716 |
Release | : 2000-01-18 |
Genre | : Science |
ISBN | : 9789056996895 |
Semiconductor Quantum Well Intermixing is an international collection of research results dealing with several aspects of the diffused quantum well (DFQW), ranging from Physics to materials and device applications. The material covered is the basic interdiffusion mechanisms of both cation and anion groups as well as the properties of band structure modifiations. Its comprehensive coverage of growth and pos-growth processing technologies along with its presentation of the various interesting and advanced features of the DFQW materials make this book an essential reference to the study of QW layer intermixing.
Author | : |
Publisher | : |
Total Pages | : 302 |
Release | : 1992 |
Genre | : Military research |
ISBN | : |
Author | : M. Balkanski |
Publisher | : Springer Science & Business Media |
Total Pages | : 462 |
Release | : 2012-12-06 |
Genre | : Technology & Engineering |
ISBN | : 9401100896 |
A recent major development in high technology, and one which bears considerable industrial potential, is the advent of low-dimensional semiconductor quantum structures. The research and development activity in this field is moving fast and it is thus important to afford scientists and engineers the opportunity to get updated by the best experts in the field. The present book draws together the latest developments in the fabrication technology of quantum structures, as well as a competent and extensive review of their fundamental properties and some remarkable applications. The book is based on a set of lectures that introduce different aspects of the basic knowledge available, it has a tutorial content and could be used as a textbook. Each aspect is reviewed, from elementary concepts up to the latest developments. Audience: Undergraduates and graduates in electrical engineering and physics schools. Also for active scientists and engineers, updating their knowledge and understanding of the frontiers of the technology.
Author | : Theodor Tamir |
Publisher | : Springer Science & Business Media |
Total Pages | : 412 |
Release | : 2013-03-08 |
Genre | : Technology & Engineering |
ISBN | : 3642970745 |
The first guided-wave components that employed signals in the form of light beams traveling along thin films were fabricated a little more than two decades ago. The parallel development of semiconductor lasers and the subsequent availability of low-loss optical fibers made possible the imple mentation of completely optical systems for communications, signal pro cessing and other applications that had used only electronic circuitry in the past. Referred to as integrated optics, this technology has been rein forced by utilizing electronic components that act as controlling elements or perform other functions for which the optical counterparts are not as effec tive. The broader area thus generated was aptly named optoelectronics and it currently represents a fascinating, rapidly evolving and most promising technology. Specifically, the amalgamation of electronic and optics compo nents into an integrated optoelectronics format is expected to provide a wide range of systems having miniaturized, high speed, broad band and reliable components for telecommunications, data processing, optical computing and other applications in the near and far future. This book is intended to cover primarily the optical portion of the op toelectronics area by focusing on the theory and applications of components that use guided optical waves. Hence all aspects of integrated optics are dis cussed, but optoelectronic components having primarily electronic rather than optical functions have not been included. Each chapter has been writ ten by experts who have actively participated in developing the specific areas addressed by them.
Author | : R.J. Shul |
Publisher | : Springer Science & Business Media |
Total Pages | : 664 |
Release | : 2011-06-28 |
Genre | : Technology & Engineering |
ISBN | : 3642569897 |
Pattern transfer by dry etching and plasma-enhanced chemical vapor de position are two of the cornerstone techniques for modern integrated cir cuit fabrication. The success of these methods has also sparked interest in their application to other techniques, such as surface-micromachined sen sors, read/write heads for data storage and magnetic random access memory (MRAM). The extremely complex chemistry and physics of plasmas and their interactions with the exposed surfaces of semiconductors and other materi als is often overlooked at the manufacturing stage. In this case, the process is optimized by an informed "trial-and-error" approach which relies heavily on design-of-experiment techniques and the intuition of the process engineer. The need for regular cleaning of plasma reactors to remove built-up reaction or precursor gas products adds an extra degree of complexity because the interaction of the reactive species in the plasma with the reactor walls can also have a strong effect on the number of these species available for etching or deposition. Since the microelectronics industry depends on having high process yields at each step of the fabrication process, it is imperative that a full understanding of plasma etching and deposition techniques be achieved.
Author | : Albert G. Baca |
Publisher | : IET |
Total Pages | : 372 |
Release | : 2005-09 |
Genre | : Technology & Engineering |
ISBN | : 9780863413537 |
This book provides fundamental and practical information on all aspects of GaAs processing and gives pragmatic advice on cleaning and passivation, wet and dry etching and photolithography. Other topics covered include device performance for HBTs (Heterojunction Bipolar Transistors) and FETs (Field Effect Transistors), how these relate to processing choices, and special processing issues such as wet oxidation, which are especially important in optoelectronic devices. This book is suitable for both new and practising engineers.
Author | : |
Publisher | : Allied Publishers |
Total Pages | : 800 |
Release | : 2000 |
Genre | : |
ISBN | : 9788170239987 |
Author | : |
Publisher | : |
Total Pages | : 1002 |
Release | : 1990 |
Genre | : Aeronautics |
ISBN | : |
Author | : Mauro Fernandes Pereira |
Publisher | : Springer Nature |
Total Pages | : 290 |
Release | : 2021-04-30 |
Genre | : Science |
ISBN | : 9402420827 |
Critical infrastructures are targets for terrorism and deliver a valuable vector through which the proliferation of CBRN and explosive precursors can be detected. Recent technological breakthroughs, notably in the field of near infrared (NIR), mid infrared (MIR), Terahertz (THz) and Gigahertz (GHz) sources and detectors, have led to rugged commercial devices, capable of standoff sensing a range of these dangerous substances. However, at the same time criminal and terrorist organizations have also benefited from the availability of technologies to increase the threat they pose to the security of citizens and a concerted effort is needed to improve early detection measures to identify activities, such as the production of homemade explosives or CBRN that can be potentially dangerous to society. The key global technological bottleneck to be overcome is the current lack of integration and networking of mature detection technology into early warning systems for critical infrastructures. Thus, this book brings together complementary information connecting the research of leading teams working on critical Infrastructure protection with academic developers and industrial producers of state of the art sensors.
Author | : I.W. Boyd |
Publisher | : Elsevier |
Total Pages | : 482 |
Release | : 1990-02-01 |
Genre | : Science |
ISBN | : 0444596658 |
This volume discusses both the practical and theoretical aspects of energy beam materials processing. It highlights the recent advances in the use of beams and incoherent light sources to enhance or modify chemical processes at solid surfaces. Special attention is given to the latest developments in the use of ion, electron and photon beams, and on laser-assisted process chemistry. Thin film and surface and interface reactions as well as bulk phase transformations are discussed. Practical technological details and the criteria for present and future applications are also reviewed. The papers collected in this volume reflect the continuing strong interest and variety of development in this field.