Silicide Thin Films: Volume 402

Silicide Thin Films: Volume 402
Author: Raymond T. Tung
Publisher:
Total Pages: 680
Release: 1996
Genre: Technology & Engineering
ISBN:

Tremendous advances have been made in the use of silicides as contacts and interconnects in micro-electronic devices and as active layers in sensors. A flourish of novel fabrication concepts and characterization techniques has led to high-quality silicide devices and a better understanding of the electronic and micrometallurgical properties of their interfaces. However, the shrinking physical dimensions of ULSI devices beyond the deep submicron regime now poses new and serious materials challenges for the development of manufacturable silicide processes. Scientists and engineers from materials science, physics, chemistry, device, processing and other disciplines come together in this book to examine the current issues facing silicide thin-film applications. Topics include: silicide fundamentals - energetics and kinetics; processing of silicide thin films; ULSI issues; CVD silicides; semiconducting silicides; processing of germano-silicide thin films; silicides and analogs for IR detection; interfaces, surfaces and epitaxy; novel structures and techniques and properties of silicide thin films.

Ferroelectric Thin Films V: Volume 433

Ferroelectric Thin Films V: Volume 433
Author: Seshu B. Desu
Publisher:
Total Pages: 480
Release: 1996-11-08
Genre: Technology & Engineering
ISBN:

The MRS Symposium Proceeding series is an internationally recognised reference suitable for researchers and practitioners.

Epitaxial Oxide Thin Films II: Volume 401

Epitaxial Oxide Thin Films II: Volume 401
Author: James S. Speck
Publisher:
Total Pages: 588
Release: 1996-03-29
Genre: Science
ISBN:

Our understanding and control of epitaxial oxide heterostructures has progressed along multiple frontiers including magnetic, dielectric, ferroelectric, and superconducting oxide materials. This has resulted in both independent rediscovery and the successful borrowing of ideas from ceramic science, solid-state physics, and semiconductor epitaxy. A new field of materials science has emerged which aims at the use of the intrinsic properties of various oxide materials in single-crystal thin-film form. Exploiting the potential of these materials, however, will only be possible if many fundamental and engineering questions can be answered. This book represents continued progress toward fulfilling that promise. Technical information on epitaxial oxide thin films from industry, academia and government laboratories is presented. Topics include: dielectrics; ferroelectrics; optics; superconductors; magnetics; magnetoresistance.

Thin Films for Photovoltaic and Related Device Applications: Volume 426

Thin Films for Photovoltaic and Related Device Applications: Volume 426
Author: David Ginley
Publisher:
Total Pages: 632
Release: 1996-11-18
Genre: Technology & Engineering
ISBN:

There has been considerable progress in the development of thin-film photovoltaic devices with new efficiency records and enhanced durability. These achievements are the result of significant advances in the fundamental understanding of the materials, interfaces and devices. With 18 countries represented, this truly international volume brings together engineers and researchers from academic, industrial and national laboratories worldwide to review different materials systems and address common issues and problems. A wide variety of topics related to the development of thin-film photovoltaic and related devices, including thick-film transistors and materials for flat-panel displays, are addressed. Areas of emphasis include materials synthesis, device fabrication and characterization, and modelling. Topics include: thin-film amorphous silicon devices; thin-film silicon devices; thin-film devices based on copper-indium diselenide; cadmium-telluride devices; transparent conductive oxides and related materials for thin-film devices; and novel concepts for thin-film photovoltaics.

Gallium Nitride and Related Materials: Volume 395

Gallium Nitride and Related Materials: Volume 395
Author: F. A. Ponce
Publisher:
Total Pages: 1008
Release: 1996-09-04
Genre: Science
ISBN:

This book reflects the excitement in the scientific community about III-V nitrides. Based on papers presented at the First International Symposium on Gallium Nitride and Related Materials (ISGN-1), it reveals the large amount of work that has taken place since the field exploded with the announcement of commercial blue-light-emitting devices. The compound semiconductors in the III-V nitride systems are of increasing interest for high-performance optoelectronic and electronic device applications. These wide-bandgap semiconductor materials are also of great fundamental scientific interest because of their unique structural, electrical and optical properties. From the advances in the technologies for the heteroepitaxial growth of these materials, leading to improved quality and device performance, it is expected that III-V nitrides will soon be of significant practical and commercial interest. Topics include: crystal growth - substrates and early stages; molecular beam growth techniques; chemical vapor phase and alloys and novel growth techniques; structural properties; electronic properties; optical properties; point defects; hydrogen, etching and other materials processes; surfaces and metal contacts and devices.

Handbook of Nanostructured Materials and Nanotechnology, Five-Volume Set

Handbook of Nanostructured Materials and Nanotechnology, Five-Volume Set
Author: Hari Singh Nalwa
Publisher: Academic Press
Total Pages: 3593
Release: 1999-10-29
Genre: Science
ISBN: 0080533647

Nanostructured materials is one of the hottest and fastest growing areas in today's materials science field, along with the related field of solid state physics. Nanostructured materials and their based technologies have opened up exciting new possibilites for future applications in a number of areas including aerospace, automotive, x-ray technology, batteries, sensors, color imaging, printing, computer chips, medical implants, pharmacy, and cosmetics. The ability to change properties on the atomic level promises a revolution in many realms of science and technology. Thus, this book details the high level of activity and significant findings are available for those involved in research and development in the field. It also covers industrial findings and corporate support. This five-volume set summarizes fundamentals of nano-science in a comprehensive way. The contributors enlisted by the editor are at elite institutions worldwide. Key Features * Provides comprehensive coverage of the dominant technology of the 21st century * Written by 127 authors from 16 countries, making this truly international * First and only reference to cover all aspects of nanostructured materials and nanotechnology

Thin Films Stresses and Mechanical Properties VI

Thin Films Stresses and Mechanical Properties VI
Author: William W. Gerberich
Publisher:
Total Pages: 576
Release: 1997
Genre: Technology & Engineering
ISBN:

Interest in the mechanical properties of thin films remains high throughout the world, as evidenced by the large international contingent represented in this book. With regard to stresses, techniques for sorting out residual stress and strain states are becoming more varied and sophisticated. Discussions include Raman scattering, nonlinear acoustic responses and back-scattered electron imaging microscopies, as well as the more standard wafer-bending and X-ray techniques. Spectroscopy, indenting and the burgeoning field of nanoprobe imaging for the characterization of mechanical properties of thin films are also highlighted. Topics include: mechanical properties of films and multilayers; fracture and adhesion; nanoindentation of films and surfaces; mechanical property methods and modelling; tribological properties of thin films; properties of polymer films; stress effects in thin films and interconnects; epitaxy and strain relief mechanisms, measurements.

Applications of Synchrotron Radiation to III: Volume 437

Applications of Synchrotron Radiation to III: Volume 437
Author: Louis J. Terminello
Publisher:
Total Pages: 282
Release: 1996-12-03
Genre: Technology & Engineering
ISBN:

As third-generation synchrotron facilities are constructed and go online in both the United States and around the world, increasingly more applications of synchrotron radiation will be realized. Both basic and applied research possibilities are manyfold, and include studies of solid surfaces and interfaces, electronic materials, metal oxides, glasses, thin films, superconductors, polymers, alloys, multilayer metal systems and intermetallic compounds. In addition, the combination of synchrotron-based spectroscopic techniques, with ever increasing high-resolution microscopy, allows researchers to study very small domains of materials in an attempt to understand their chemical and electronic properties. This book from MRS focuses on the various types of information that can be obtained from synchrotron-related techniques in order to expand the use of this unique and powerful experimental approach to materials research. Topics include: structure of reduced dimensional materials; magnetic materials; microscopy, topography and tomography; X-ray probes of solids; and materials characterization with X-ray absorption.