Plasma Kinetics in Atmospheric Gases

Plasma Kinetics in Atmospheric Gases
Author: M. Capitelli
Publisher: Springer Science & Business Media
Total Pages: 302
Release: 2013-03-09
Genre: Science
ISBN: 3662041588

Emphasis is placed on the analysis of translational, rotational, vibrational and electronically excited state kinetics, coupled to the electron Boltzmann equation.

Plasma Processes and Plasma Kinetics

Plasma Processes and Plasma Kinetics
Author: Boris M. Smirnov
Publisher: John Wiley & Sons
Total Pages: 582
Release: 2008-09-26
Genre: Science
ISBN: 3527619089

This problems supplement to plasma physics textbooks covers plasma theory for both science and technology. Written by a renowned plasma scientist, experienced book author and skilled teacher, it treats all aspects of plasma theory in no fewer than 520 very detailed worked-out problems. With this systematic collection the reader will gain a sound understanding of plasma physics in all fields, from fusion and astrophysics to surface treatment. The book also includes the transport of particles as well as radiation in plasmas, and while designed for graduate students and young researchers, it can equally serve as a reference.

Lecture Notes on Principles of Plasma Processing

Lecture Notes on Principles of Plasma Processing
Author: Francis F. Chen
Publisher: Springer Science & Business Media
Total Pages: 213
Release: 2012-12-06
Genre: Science
ISBN: 1461501814

Plasma processing of semiconductors is an interdisciplinary field requiring knowledge of both plasma physics and chemical engineering. The two authors are experts in each of these fields, and their collaboration results in the merging of these fields with a common terminology. Basic plasma concepts are introduced painlessly to those who have studied undergraduate electromagnetics but have had no previous exposure to plasmas. Unnecessarily detailed derivations are omitted; yet the reader is led to understand in some depth those concepts, such as the structure of sheaths, that are important in the design and operation of plasma processing reactors. Physicists not accustomed to low-temperature plasmas are introduced to chemical kinetics, surface science, and molecular spectroscopy. The material has been condensed to suit a nine-week graduate course, but it is sufficient to bring the reader up to date on current problems such as copper interconnects, low-k and high-k dielectrics, and oxide damage. Students will appreciate the web-style layout with ample color illustrations opposite the text, with ample room for notes. This short book is ideal for new workers in the semiconductor industry who want to be brought up to speed with minimum effort. It is also suitable for Chemical Engineering students studying plasma processing of materials; Engineers, physicists, and technicians entering the semiconductor industry who want a quick overview of the use of plasmas in the industry.

Plasma Chemistry

Plasma Chemistry
Author: Alexander Fridman
Publisher: Cambridge University Press
Total Pages:
Release: 2008-05-05
Genre: Technology & Engineering
ISBN: 1139471732

Providing a fundamental introduction to all aspects of modern plasma chemistry, this book describes mechanisms and kinetics of chemical processes in plasma, plasma statistics, thermodynamics, fluid mechanics and electrodynamics, as well as all major electric discharges applied in plasma chemistry. Fridman considers most of the major applications of plasma chemistry, from electronics to thermal coatings, from treatment of polymers to fuel conversion and hydrogen production and from plasma metallurgy to plasma medicine. It is helpful to engineers, scientists and students interested in plasma physics, plasma chemistry, plasma engineering and combustion, as well as chemical physics, lasers, energy systems and environmental control. The book contains an extensive database on plasma kinetics and thermodynamics and numerical formulas for practical calculations related to specific plasma-chemical processes and applications. Problems and concept questions are provided, helpful in courses related to plasma, lasers, combustion, chemical kinetics, statistics and thermodynamics, and high-temperature and high-energy fluid mechanics.

Plasma Physics and Engineering

Plasma Physics and Engineering
Author: Alexander Fridman
Publisher: CRC Press
Total Pages: 888
Release: 2004-04-15
Genre: Science
ISBN: 9781560328483

Plasma engineering is a rapidly expanding area of science and technology with increasing numbers of engineers using plasma processes over a wide range of applications. An essential tool for understanding this dynamic field, Plasma Physics and Engineering provides a clear, fundamental introduction to virtually all aspects of modern plasma science and technology, including plasma chemistry and engineering, combustion, chemical physics, lasers, electronics, methods of material treatment, fuel conversion, and environmental control. The book contains an extensive database on plasma kinetics and thermodynamics, many helpful numerical formulas for practical calculations, and an array of problems and concept questions.

Fundamental Aspects of Plasma Chemical Physics

Fundamental Aspects of Plasma Chemical Physics
Author: Mario Capitelli
Publisher: Springer Science & Business Media
Total Pages: 330
Release: 2015-11-26
Genre: Science
ISBN: 1441981853

Describing non-equilibrium "cold" plasmas through a chemical physics approach, this book uses the state-to-state plasma kinetics, which considers each internal state as a new species with its own cross sections. Extended atomic and molecular master equations are coupled with Boltzmann and Monte Carlo methods to solve the electron energy distribution function. Selected examples in different applied fields, such as microelectronics, fusion, and aerospace, are presented and discussed including the self-consistent kinetics in RF parallel plate reactors, the optimization of negative ion sources and the expansion of high enthalpy flows through nozzles of different geometries. The book will cover the main aspects of the state-to-state kinetic approach for the description of nonequilibrium cold plasmas, illustrating the more recent achievements in the development of kinetic models including the self-consistent coupling of master equations and Boltzmann equation for electron dynamics. To give a complete portrayal, the book will assess fundamental concepts and theoretical formulations, based on a unified methodological approach, and explore the insight in related scientific problems still opened for the research community.

Principles of Plasma Discharges and Materials Processing

Principles of Plasma Discharges and Materials Processing
Author: Michael A. Lieberman
Publisher: John Wiley & Sons
Total Pages: 837
Release: 2024-10-15
Genre: Technology & Engineering
ISBN: 1394245378

A new edition of this industry classic on the principles of plasma processing Plasma-based technology and materials processes have been central to the revolution of the last half-century in micro- and nano-electronics. From anisotropic plasma etching on microprocessors, memory, and analog chips, to plasma deposition for creating solar panels and flat-panel displays, plasma-based materials processes have reached huge areas of technology. As key technologies scale down in size from the nano- to the atomic level, further developments in plasma materials processing will only become more essential. Principles of Plasma Discharges and Materials Processing is the foundational introduction to the subject. It offers detailed information and procedures for designing plasma-based equipment and analyzing plasma-based processes, with an emphasis on the abiding fundamentals. Now fully updated to reflect the latest research and data, it promises to continue as an indispensable resource for graduate students and industry professionals in a myriad of technological fields. Readers of the third edition of Principles of Plasma Discharges and Materials Processing will also find: Extensive figures and tables to facilitate understanding A new chapter covering the recent development of processes involving high-pressure capacitive discharges New subsections on discharge and processing chemistry, physics, and diagnostics Principles of Plasma Discharges and Materials Processing is ideal for professionals and process engineers in the field of plasma-assisted materials processing with experience in the field of science or engineering. It is the premiere world-wide basic text for graduate courses in the field.

Kinetics of Nonequilibrium Low-Temperature Plasmas

Kinetics of Nonequilibrium Low-Temperature Plasmas
Author: Leon Mikhaĭlovich Biberman
Publisher: Springer
Total Pages: 512
Release: 1987-09-30
Genre: Science
ISBN:

The first research on plasma was done in connection with the study of electrical discharges in gases. The focus of attention for physicists was the partially ionized plasma, the kinetics of which is governed by various collisional and radiative processes. The choice of this area of research was motivated largely by the practical problems of that time the creation of gas-discharge light sources, rectifiers, and inverters. Since the early 1950s interest in plasma physics has risen sharply, particularly in the study of the completely ionized plasma with its various collective phenomena, insta bilities, and the interesting and sometimes unexpected effects attending the propagation of electromagnetic waves in such a plasma and the action on it of external electric and magnetic fields. Interest in hot plasmas has been stimulated not only by the diverse and novel physical phenomena, but also by the problems arising in connection with controlled nuclear fusion. The advent, in the early 1960s, of new technical fields such as gas-discharge lasers, magnetohydrodynamic generators, thermoemission converters, plasma chemistry, plasma propul sion devices, various methods in plasma technology, etc. , has led to increased interest in weakly ionized low-tempera ture plasmas. This is particularly true of nonequilibrium plasmas, which are characterized by an extraordinary diver sity of states and properties.

Introduction to Plasma Dynamics

Introduction to Plasma Dynamics
Author: A. I. Morozov
Publisher: CRC Press
Total Pages: 828
Release: 2012-12-06
Genre: Science
ISBN: 1439881332

As the twenty-first century progresses, plasma technology will play an increasing role in our lives, providing new sources of energy, ion-plasma processing of materials, wave electromagnetic radiation sources, space plasma thrusters, and more. Studies of the plasma state of matter not only accelerate technological developments but also improve the

Thermal Plasmas

Thermal Plasmas
Author: M.I. Boulos
Publisher: Springer Science & Business Media
Total Pages: 462
Release: 2013-06-29
Genre: Science
ISBN: 1489913378

In this unique textbook and reference source, the authors integrate theoretical and applied research from a host of disciplines, including materials science, plasma physics, and advanced transport phenomena. Volume 1, the first of two, covers the fundamentals of plasma physics and gaseous electronics, thermodynamics, and transport properties of plasma.