Molecular Beam Epitaxy

Molecular Beam Epitaxy
Author: John Orton
Publisher: OUP Oxford
Total Pages: 529
Release: 2015-06-25
Genre: Science
ISBN: 0191061166

The book is a history of Molecular Beam Epitaxy (MBE) as applied to the growth of semiconductor thin films (note that it does not cover the subject of metal thin films). It begins by examining the origins of MBE, first of all looking at the nature of molecular beams and considering their application to fundamental physics, to the development of nuclear magnetic resonance and to the invention of the microwave MASER. It shows how molecular beams of silane (SiH4) were used to study the nucleation of silicon films on a silicon substrate and how such studies were extended to compound semiconductors such as GaAs. From such surface studies in ultra-high vacuum the technique developed into a method of growing high quality single crystal films of a wide range of semiconductors. Comparing this with earlier evaporation methods of deposition and with other epitaxial deposition methods such as liquid phase and vapour phase epitaxy (LPE and VPE). The text describes the development of MBE machines from the early âhome-madeâ variety to that of commercial equipment and show how MBE was gradually refined to produce high quality films with atomic dimensions. This was much aided by the use of various in-situ surface analysis techniques, such as reflection high energy electron diffraction (RHEED) and mass spectrometry, a feature unique to MBE. It looks at various modified versions of the basic MBE process, then proceed to describe their application to the growth of so-called âlow-dimensional structuresâ (LDS) based on ultra-thin heterostructure films with thickness of order a few molecular monolayers. Further chapters cover the growth of a wide range of different compounds and describe their application to fundamental physics and to the fabrication of electronic and opto-electronic devices. The authors study the historical development of all these aspects and emphasise both the (often unexpected) manner of their discovery and development and the unique features which MBE brings to the growth of extremely complex structures with monolayer accuracy.

Surface & Coatings Technology

Surface & Coatings Technology
Author: B. D. Sartwell
Publisher: Elsevier
Total Pages: 665
Release: 2016-06-03
Genre: Technology & Engineering
ISBN: 1483274640

Surface & Coatings Technology, Volumes 59–60 presents the proceedings of the Third International Conference on Plasma Surface Engineering, held in Garmisch-Partenkirchen, Germany, on October 26–29, 1992. This book discusses the widespread applications of plasma and particle beam assisted methods in surface and thin film technology. Volume 59 is organized into 11 parts encompassing 69 chapters while Volume 60 is comprised of eight parts encompassing 49 chapters. This compilation of papers begins with an overview of the kinetic modelling of low pressure high frequency discharges. This text then examines the effect of various deposition parameters on the growth of chamber wall deposits. Other chapters consider the physiochemical behavior of ceramic materials for space applications. This book discusses as well the economic aspects of the application of plasma surface technologies. The reader is also introduced to the environmental aspects of physical vapor deposition coating technology. This book is a valuable resource for plasma surface engineers, technologists, and researchers.

Computer Aided Optimum Design in Engineering X

Computer Aided Optimum Design in Engineering X
Author: S. Hernandez
Publisher: WIT Press
Total Pages: 273
Release: 2007
Genre: Computers
ISBN: 1845640705

Engineering design is enhanced by adding optimisation methods. Their influence cannot be over-emphasised. The resulting solutions provide an efficient way of dealing with some of the most difficult challenges in engineering practice today.Containing papers presented at the Tenth International Conference on this successful series on Optimum Design in Engineering, this book examines the recent development in advanced types of structures, particularly those based on new concepts and new types of materials resulting in optimum solutions. Particular emphasis is placed on computational methods to model, control and manage new structural solutions and material types. Featured topics include: Optimisation and Manufacturing; Structural Optimisation; Optimisation in Biomechanics; Shape and Topology Optimisation; Industrial examples of Design Optimisation; Fluid Structure Interaction; Damage and Fracture Mechanics; Composite Materials Optimisation; Optimum behavior of Fiber Reinforced Polymers; Aerospace Structures; Applications in Mechanical and car engineering; New Algorithms.

Heteroepitaxial Semiconductors for Electronic Devices

Heteroepitaxial Semiconductors for Electronic Devices
Author: G.W. Cullen
Publisher: Springer Science & Business Media
Total Pages: 306
Release: 2013-11-11
Genre: Technology & Engineering
ISBN: 1461262674

Some years ago it was not uncommon for materials scientists, even within the electronics industry, to work relatively independently of device engi neers. Neither group had a means to determine whether or not the materials had been optimized for application in specific device structures. This mode of operation is no longer desirable or possible. The introduction of a new material, or a new form of a well known material, now requires a close collaborative effort between individuals who represent the disciplines of materials preparation, materials characterization, device design and pro cessing, and the analysis of the device operation to establish relationships between device performance and the materials properties. The develop ment of devices in heteroepitaxial thin films has advanced to the present state specifically through the unusually close and active interchange among individuals with the appropriate backgrounds. We find no book available which brings together a description of these diverse disciplines needed for the development of such a materials-device technology. Therefore, the authors of this book, who have worked in close collaboration for a number of years, were motivated to collect their experiences in this volume. Over the years there has been a logical flow of activity beginning with heteroepi taxial silicon and progressing through the III-V and II-VI compounds. For each material the early emphasis on material preparation and characteriza tion later shifted to an emphasis on the analysis of the device characteristics specific to the materials involved.

Food Contact Polymeric Materials

Food Contact Polymeric Materials
Author: J.A. Sidwell
Publisher: iSmithers Rapra Publishing
Total Pages: 122
Release: 1992
Genre: Technology & Engineering
ISBN: 9780902348691

Polymeric materials have revolutionised the way we package store and even cook our food. We now buy soft and alcoholic drinks in transparent, lightc099 plastic bottles, and precooked meals in plastic trays which we reheat in a microwave or conventional oven. This state-of-the-art review draws together the legal framework within which the industry must work, with the technological advances being made both in materials performance and the analysis of migrating monomers and additives. An additional indexed section containing several hundred abstracts from the Rapra Polymer Library database provides useful references for further reading.

Mechanical Behaviour of Materials - VI

Mechanical Behaviour of Materials - VI
Author: M. Jono
Publisher: Elsevier
Total Pages: 3510
Release: 2013-10-22
Genre: Technology & Engineering
ISBN: 1483294137

Significant progress in the science and technology of the mechanical behaviour of materials has been made in recent years. The greatest strides forward have occurred in the field of advanced materials with high performance, such as ceramics, composite materials, and intermetallic compounds. The Sixth International Conference on Mechanical Behaviour of Materials (ICM-6), taking place in Kyoto, Japan, 29 July - 2 August 1991 addressed these issues. In commemorating the fortieth anniversary of the Japan Society of Materials Science, organised by the Foundation for Advancement of International Science and supported by the Science Council of Japan, the information provided in these proceedings reflects the international nature of the meeting. It provides a valuable account of recent developments and problems in the field of mechanical behaviour of materials.