Optical Microlithography VI
Author | : Society of Photo-optical Instrumentation Engineers |
Publisher | : |
Total Pages | : 304 |
Release | : 1987 |
Genre | : Technology & Engineering |
ISBN | : |
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Author | : Society of Photo-optical Instrumentation Engineers |
Publisher | : |
Total Pages | : 304 |
Release | : 1987 |
Genre | : Technology & Engineering |
ISBN | : |
Author | : P. Rai-Choudhury |
Publisher | : IET |
Total Pages | : 784 |
Release | : 1997 |
Genre | : Technology & Engineering |
ISBN | : 9780852969069 |
Focusing on the use of microlithography techniques in microelectronics manufacturing, this volume is one of a series addressing a rapidly growing field affecting the integrated circuit industry. New applications in such areas as sensors, actuators and biomedical devices, are described.
Author | : Luc Van den Hove |
Publisher | : SPIE-International Society for Optical Engineering |
Total Pages | : 1114 |
Release | : 1998 |
Genre | : Science |
ISBN | : |
A study of optical microlithography. It contains papers on subjects such as phase-shifting masks, CD control scanners, process optimization, and advanced masks.
Author | : Chris Mack |
Publisher | : John Wiley & Sons |
Total Pages | : 503 |
Release | : 2011-08-10 |
Genre | : Technology & Engineering |
ISBN | : 1119965071 |
The fabrication of an integrated circuit requires a variety of physical and chemical processes to be performed on a semiconductor substrate. In general, these processes fall into three categories: film deposition, patterning, and semiconductor doping. Films of both conductors and insulators are used to connect and isolate transistors and their components. By creating structures of these various components millions of transistors can be built and wired together to form the complex circuitry of modern microelectronic devices. Fundamental to all of these processes is lithography, ie, the formation of three-dimensional relief images on the substrate for subsequent transfer of the pattern to the substrate. This book presents a complete theoretical and practical treatment of the topic of lithography for both students and researchers. It comprises ten detailed chapters plus three appendices with problems provided at the end of each chapter. Additional Information: Visiting http://www.lithoguru.com/textbook/index.html enhances the reader's understanding as the website supplies information on how you can download a free laboratory manual, Optical Lithography Modelling with MATLAB®, to accompany the textbook. You can also contact the author and find help for instructors.
Author | : |
Publisher | : The Electrochemical Society |
Total Pages | : 636 |
Release | : 2001 |
Genre | : Magnetic disks |
ISBN | : 9781566772969 |
Author | : Laszlo Monostori |
Publisher | : Springer |
Total Pages | : 259 |
Release | : 2019-04-30 |
Genre | : Technology & Engineering |
ISBN | : 3030181804 |
This book gathers the proceedings of the 4th International Conference on the Industry 4.0 Model for Advanced Manufacturing (AMP 2019), held in Belgrade, Serbia, on 3–6 June 2019. The event marks the latest in a series of high-level conferences that bring together experts from academia and industry to exchange knowledge, ideas, experiences, research findings, and information in the field of manufacturing. The book addresses a wide range of topics, including: design of smart and intelligent products, developments in CAD/CAM technologies, rapid prototyping and reverse engineering, multistage manufacturing processes, manufacturing automation in the Industry 4.0 model, cloud-based products, and cyber-physical and reconfigurable manufacturing systems. By providing updates on key issues and highlighting recent advances in manufacturing engineering and technologies, the book supports the transfer of vital knowledge to the next generation of academics and practitioners. Further, it will appeal to anyone working or conducting research in this rapidly evolving field.
Author | : Emil Wolf |
Publisher | : Elsevier |
Total Pages | : 378 |
Release | : 2012-09-05 |
Genre | : Science |
ISBN | : 0444594221 |
In the 50 years since the first volume of Progress in Optics was published, optics has become one of the most dynamic fields of science. The volumes in this series that have appeared up to now contain more than 300 review articles by distinguished research workers, which have become permanent records for many important developments, helping optical scientists and optical engineers stay abreast of their fields. Comprehensive, in-depth reviews Edited by the leading authority in the field
Author | : Bruce W. Smith |
Publisher | : CRC Press |
Total Pages | : 800 |
Release | : 1998-05-27 |
Genre | : Technology & Engineering |
ISBN | : 9780824799533 |
This self-contained text details both elementary and advanced aspects of submicron microlithography - providing a balanced treatment of theoretical and operating practices as well as complete information on current research in the field. Including discussions on electron beam, x-ray, and proximal probe techniques and enhanced with timesaving citations to key sources in the literature and more than 600 tables, equations, drawings, and photographs that clarify the material, the book covers mechanical systems, optics, excimer laser light sources, alignment techniques and analysis, resist chemistry, processing, multilayer lithography, plasma and reactive ion etching, metrology, and more.