Optical Effects Of Ion Implantation
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Author | : P. D. Townsend |
Publisher | : Cambridge University Press |
Total Pages | : 300 |
Release | : 1994-06-23 |
Genre | : Science |
ISBN | : 0521394309 |
This book describes the use of ion implantation to control the optical properties of solid state materials.
Author | : |
Publisher | : Academic Press |
Total Pages | : 335 |
Release | : 1997-06-12 |
Genre | : Technology & Engineering |
ISBN | : 0080864430 |
Defects in ion-implanted semiconductors are important and will likely gain increased importance as annealing temperatures are reduced with successive IC generations. Novel implant approaches, such as MdV implantation, create new types of defects whose origin and annealing characteristics will need to be addressed. Publications in this field mainly focus on the effects of ion implantation on the material and the modification in the implanted layer after high temperature annealing. The editors of this volume and Volume 45 focus on the physics of the annealing kinetics of the damaged layer. An overview of characterization tehniques and a critical comparison of the information on annealing kinetics is also presented. - Provides basic knowledge of ion implantation-induced defects - Focuses on physical mechanisms of defect annealing - Utilizes electrical, physical, and optical characterization tools for processed semiconductors - Provides the basis for understanding the problems caused by the defects generated by implantation and the means for their characterization and elimination
Author | : |
Publisher | : |
Total Pages | : |
Release | : 19?? |
Genre | : |
ISBN | : 9789535132387 |
Author | : A. D. Pogrebnjak |
Publisher | : Nova Science Publishers |
Total Pages | : 334 |
Release | : 2018-09 |
Genre | : SCIENCE |
ISBN | : 9781536139631 |
"New results in the field of ion implantation from the experienced scientists from different countries are presented in this book. Influence of ion implantation on structure and properties of semi-conducting materials, instrumental steels and alloys, nanocomposite coatings, including multielement ones, titanium alloys with the shape memory effect and super-elasticity are discussed in detail within this book. New data on novel applications of ion implantation for the modification and testing (radiation hardness simulation) of memristive devices, as well as application of ion implantation of group V dopants in the MCT epilayer are presented in this book. Potential use of ion implantation for the synthesis of Ag nanoparticles in a thin Si layer for the development of thin-film solar cells fabrication technology is discussed. The effect of ion implantation on the physical and mechanical properties of the hard alloy plates based on tungsten carbide and a cobalt binder is described. A study of the effects of ion implantation on the phase composition and the structure of materials is presented. The role of defects in the formation of the phase composition of the ion-implanted materials, structural-phase transformations in metals after ion implantation is investigated. This book will be interesting for professionals in the study of solid state physics, nuclear physics, physics of semi-conductors and nanomaterials. It can also be useful for masters and PhD students, as well as for professionals researching the fabrication and investigation of protective materials with enhanced physical-mechanical and tribological properties, good biocompatibility and resistance to irradiation"--
Author | : Ishaq Ahmad |
Publisher | : BoD – Books on Demand |
Total Pages | : 190 |
Release | : 2018-07-18 |
Genre | : Science |
ISBN | : 178923414X |
Ion beam of various energies is a standard research tool in many areas of science, from basic physics to diverse areas in space science and technology, device fabrications, materials science, environment science, and medical sciences. It is an advance and versatile tool to frequently discover applications across a broad range of disciplines and fields. Moreover, scientists are continuously improving the ion beam sources and accelerators to explore ion beam at the forefront of scientific endeavours. This book provides a glance view on MeV ion beam applications, focused ion beam generation and its applications as well as practical applications of ion implantation.
Author | : Ishaq Ahmad |
Publisher | : BoD – Books on Demand |
Total Pages | : 154 |
Release | : 2017-06-14 |
Genre | : Science |
ISBN | : 9535132377 |
Ion implantation is one of the promising areas of sciences and technologies. It has been observed as a continuously evolving technology. In this book, there is a detailed overview of the recent ion implantation research and innovation along with the existing ion implantation technological issues especially in microelectronics. The book also reviews the basic knowledge of the radiation-induced defects production during the ion implantation in case of a semiconductor structure for fabrication and development of the required perfect microelectronic devices. The improvement of the biocompatibility of biomaterials by ion implantation, which is a hot research topic, has been summarized in the book as well. Moreover, advanced materials characterization techniques are also covered in this book to evaluate the ion implantation impact on the materials.
Author | : Mark Goorsky |
Publisher | : BoD – Books on Demand |
Total Pages | : 452 |
Release | : 2012-05-30 |
Genre | : Science |
ISBN | : 9535106341 |
Ion implantation presents a continuously evolving technology. While the benefits of ion implantation are well recognized for many commercial endeavors, there have been recent developments in this field. Improvements in equipment, understanding of beam-solid interactions, applications to new materials, improved characterization techniques, and more recent developments to use implantation for nanostructure formation point to new directions for ion implantation and are presented in this book.
Author | : Bernd Schmidt |
Publisher | : Springer Science & Business Media |
Total Pages | : 425 |
Release | : 2012-12-13 |
Genre | : Technology & Engineering |
ISBN | : 3211993568 |
A comprehensive review of ion beam application in modern materials research is provided, including the basics of ion beam physics and technology. The physics of ion-solid interactions for ion implantation, ion beam synthesis, sputtering and nano-patterning is treated in detail. Its applications in materials research, development and analysis, developments of special techniques and interaction mechanisms of ion beams with solid state matter result in the optimization of new material properties, which are discussed thoroughly. Solid-state properties optimization for functional materials such as doped semiconductors and metal layers for nano-electronics, metal alloys, and nano-patterned surfaces is demonstrated. The ion beam is an important tool for both materials processing and analysis. Researchers engaged in solid-state physics and materials research, engineers and technologists in the field of modern functional materials will welcome this text.
Author | : Feng Chen |
Publisher | : Springer Nature |
Total Pages | : 298 |
Release | : 2020-05-06 |
Genre | : Science |
ISBN | : 981154607X |
This book focuses on the fundamentals, technologies and properties of ion irradiation of dielectric materials (e.g. glasses, crystals) with regard to various photonic applications. It introduces readers to diverse ion-beam techniques for the fabrication and modification of micron- or nanoscale photonic structures, including optical waveguides, photonic crystals, and nanoparticle (nano-spheres and nano-rods) systems, and presents state-of-the-art advances in this multi-disciplinary research field, demonstrating the unique capabilities of ion-beam technologies in optical dielectric materials processing. The book discusses in detail the properties of ion-beam processed waveguides, as well as the modification of dielectrics for photonic applications, such as electro-optic modulation, nonlinear frequency conversion, waveguide amplification and lasing. It also explores synthesis and the correlated optical effects of nanoparticles by ion beams, and features examples of successful micro- and nano-photonic devices. Given its breadth of coverage, the book will particularly appeal to readers interested in ion-beam technology, materials science, and integrated optics.
Author | : R. K. Sharma |
Publisher | : Springer |
Total Pages | : 1260 |
Release | : 2019-01-31 |
Genre | : Technology & Engineering |
ISBN | : 3319976044 |
This book disseminates the current knowledge of semiconductor physics and its applications across the scientific community. It is based on a biennial workshop that provides the participating research groups with a stimulating platform for interaction and collaboration with colleagues from the same scientific community. The book discusses the latest developments in the field of III-nitrides; materials & devices, compound semiconductors, VLSI technology, optoelectronics, sensors, photovoltaics, crystal growth, epitaxy and characterization, graphene and other 2D materials and organic semiconductors.