Modeling Innovations In Euv And Nanoimprint Lithography
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Microfabrication for Industrial Applications
Author | : Regina Luttge |
Publisher | : William Andrew |
Total Pages | : 314 |
Release | : 2011-09-14 |
Genre | : Science |
ISBN | : 0815515820 |
Microfabrication for Industrial Applications focuses on the industrial perspective for micro- and nanofabrication methods including large-scale manufacturing, transfer of concepts from lab to factory, process tolerance, yield, robustness, and cost. It gives a history of miniaturization, micro- and nanofabrication, and surveys industrial fields of application, illustrating fabrication processes of relevant micro and nano devices. Concerning sub-micron feature manufacture, the book explains: the philosophy of micro/ nanofabrication for integrated circuit industry; thin film deposition; (waveguide, plastic, semiconductor) material processing; packaging; interconnects; stress (e.g., thin film residual); economic; and environmental aspects. Micro/nanomechanical sensors and actuators are explained in depth with information on applications, materials (incl. functional polymers), methods, testing, fabrication, integration, reliability, magnetic microstructures, etc. Shows engineers & students how to evaluate the potential value of current and nearfuture manufacturing processes for miniaturized systems in industrial environments Explains the top-down and bottom up approaches to nanotechnology, nanostructures fabricated with beams, nano imprinting methods, nanoparticle manufacturing (and their health aspects), nanofeature analysis, and connecting nano to micro to macro Discusses issues for practical application cases; possibilities of dimension precision; large volume manufacturing of micro- & nanostructures (machines, materials, costs) Explains applications of Microsystems for information technology, e.g.: data recording (camera, microphone), storage (memories, CDs), communication; computing; and displays (beamers, LCD, TFT) Case studies are given for sensors, resonators, probes, transdermal medical systems, micro- pumps & valves, inkjets, DNA-analysis, lab-on-a-chip, & micro-cooling
Nanoimprint Lithography
Author | : Hongbo Lan |
Publisher | : Nova Science Publishers |
Total Pages | : 0 |
Release | : 2011 |
Genre | : Microlithography |
ISBN | : 9781611225013 |
Lithography, the fundamental fabrication process of semiconductor devices, has been playing a critical role in micro-nanofabrication technologies and manufacturing of Integrated Circuits (IC). Traditional optical lithography including contact and project photolithography has contributed significantly to the semiconductor device advancements. Currently, maintaining the rapid pace of half-pitch reduction requires overcoming the challenge of improving and extending the incumbent optical projection lithography technology while simultaneously developing alternative, next generation lithography (NGL) technologies to be used when optical projection lithography is no longer more economical than the alternatives. Furthermore, NIL is also one of the most promising low-cost, high-throughput technologies for manufacturing nanostructures as this highly technical book will give new insight to.
Nanofabrication
Author | : Maria Stepanova |
Publisher | : Springer Science & Business Media |
Total Pages | : 344 |
Release | : 2011-11-08 |
Genre | : Technology & Engineering |
ISBN | : 3709104246 |
Intended to update scientists and engineers on the current state of the art in a variety of key techniques used extensively in the fabrication of structures at the nanoscale. The present work covers the essential technologies for creating sub 25 nm features lithographically, depositing layers with nanometer control, and etching patterns and structures at the nanoscale. A distinguishing feature of this book is a focus not on extension of microelectronics fabrication, but rather on techniques applicable for building NEMS, biosensors, nanomaterials, photonic crystals, and other novel devices and structures that will revolutionize society in the coming years.
Optical Lithography
Author | : Burn Jeng Lin |
Publisher | : SPIE-International Society for Optical Engineering |
Total Pages | : 0 |
Release | : 2021 |
Genre | : Lasers |
ISBN | : 9781510639959 |
This book is written for new and experienced engineers, technology managers, and senior technicians who want to enrich their understanding of the image formation physics of a lithographic system. Readers will gain knowledge of the basic equations and constants that drive optical lithography, learn the basics of exposure systems and image formation, and come away with a full understanding of system components, processing, and optimization. Readers will also get an overview of the outlook of optical lithography and means to enhance semiconductor manufacturing. This second edition blends the author's unique experience in research, teaching, and world-class high-volume manufacturing to add brand new material on proximity printing, as well as updated and expanded material on exposure systems, image formation, E-D methodology, hardware components, processing and optimization, and EUV and immersion lithographies.
EUV Sources for Lithography
Author | : Vivek Bakshi |
Publisher | : SPIE Press |
Total Pages | : 1104 |
Release | : 2006 |
Genre | : Art |
ISBN | : 9780819458452 |
This comprehensive volume, edited by a senior technical staff member at SEMATECH, is the authoritative reference book on EUV source technology. The volume contains 38 chapters contributed by leading researchers and suppliers in the EUV source field. Topics range from a state-of-the-art overview and in-depth explanation of EUV source requirements, to fundamental atomic data and theoretical models of EUV sources based on discharge-produced plasmas (DPP) and laser-produced plasmas, to a description of prominent DPP and LPP designs and other technologies for producing EUV radiation. Additional topics include EUV source metrology and components (collectors, electrodes), debris mitigation, and mechanisms of component erosion in EUV sources. The volume is intended to meet the needs of both practitioners of the technology and readers seeking an introduction to the subject.