Metrology In Industry
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| Author | : French College of Metrology |
| Publisher | : John Wiley & Sons |
| Total Pages | : 187 |
| Release | : 2013-03-01 |
| Genre | : Technology & Engineering |
| ISBN | : 1118614941 |
Metrology is an integral part of the structure of today’s world: navigation and telecommunications require highly accurate time and frequency standards; human health and safety relies on authoritative measurements in diagnosis and treatment, as does food production and trade; global climate studies also depend on reliable and consistent data. Moreover, international trade practices increasingly require institutions to display demonstrated conformity to written standards and specifications. As such, having relevant and reliable results of measurements and tests in compliance with mutually recognised standards can be a technical, commercial and statutory necessity for a company. This book, the results of a working group from the French College of Metrology and featuring chapters written by a range of experts from a variety of European countries, gives a comprehensive and international treatment of the subject. Academics involved in metrology as well as people involved in the metrology capacities of companies and institutions will find this book of great interest.
| Author | : Bo Su |
| Publisher | : |
| Total Pages | : 187 |
| Release | : 2015 |
| Genre | : Integrated circuits |
| ISBN | : 9781628416626 |
Metrology has grown significantly, especially in semiconductor manufacturing, and such growth necessitates increased expertise. Until now, this field has never had book written from the perspective of an engineer in a modern IC manufacturing and development environment. The topics in this Tutorial Text range from metrology at its most basic level to future predictions and challenges, including measurement methods, industrial applications, fundamentals of traditional measurement system characterization and calibration, measurement system characterization and calibration, semiconductor-specific applications, optical metrology measurement techniques, charged particle measurement techniques, x-ray and in situ metrology, hybrid metrology, and mask making. Includes example spreadsheets of measurement uncertainty analysis--specifically, precision, matching, and relative accuracy.
| Author | : Ammar Grous |
| Publisher | : John Wiley & Sons |
| Total Pages | : 570 |
| Release | : 2013-03-04 |
| Genre | : Technology & Engineering |
| ISBN | : 1118622596 |
Applied Metrology for Manufacturing Engineering, stands out from traditional works due to its educational aspect. Illustrated by tutorials and laboratory models, it is accessible to users of non-specialists in the fields of design and manufacturing. Chapters can be viewed independently of each other. This book focuses on technical geometric and dimensional tolerances as well as mechanical testing and quality control. It also provides references and solved examples to help professionals and teachers to adapt their models to specific cases. It reflects recent developments in ISO and GPS standards and focuses on training that goes hand in hand with the progress of practical work and workshops dealing with measurement and dimensioning.
| Author | : D. Keith Bowen |
| Publisher | : CRC Press |
| Total Pages | : 296 |
| Release | : 2018-10-03 |
| Genre | : Technology & Engineering |
| ISBN | : 1420005650 |
The scales involved in modern semiconductor manufacturing and microelectronics continue to plunge downward. Effective and accurate characterization of materials with thicknesses below a few nanometers can be achieved using x-rays. While many books are available on the theory behind x-ray metrology (XRM), X-Ray Metrology in Semiconductor Manufacturing is the first book to focus on the practical aspects of the technology and its application in device fabrication and solving new materials problems. Following a general overview of the field, the first section of the book is organized by application and outlines the techniques that are best suited to each. The next section delves into the techniques and theory behind the applications, such as specular x-ray reflectivity, diffraction imaging, and defect mapping. Finally, the third section provides technological details of each technique, answering questions commonly encountered in practice. The authors supply real examples from the semiconductor and magnetic recording industries as well as more than 150 clearly drawn figures to illustrate the discussion. They also summarize the principles and key information about each method with inset boxes found throughout the text. Written by world leaders in the field, X-Ray Metrology in Semiconductor Manufacturing provides real solutions with a focus on accuracy, repeatability, and throughput.
| Author | : Herbert Steffen Peiser |
| Publisher | : |
| Total Pages | : 188 |
| Release | : 1979 |
| Genre | : Measurement |
| ISBN | : |
| Author | : David J. Whitehouse |
| Publisher | : Elsevier |
| Total Pages | : 425 |
| Release | : 2004-07-01 |
| Genre | : Science |
| ISBN | : 0080518230 |
The importance of surface metrology has long been acknowledged in manufacturing and mechanical engineering, but has now gained growing recognition in an expanding number of new applications in fields such as semiconductors, electronics and optics. Metrology is the scientific study of measurement, and surface metrology is the study of the measurement of rough surfaces. In this book, Professor David Whitehouse, an internationally acknowledged subject expert, covers the wide range of theory and practice, including the use of new methods of instrumentation. · Written by one of the world's leading metrologists · Covers electronics and optics applications as well as mechanical · Written for mechanical and manufacturing engineers, tribologists and precision engineers in industry and academia
| Author | : National Research Council |
| Publisher | : National Academies Press |
| Total Pages | : 228 |
| Release | : 1995-01-03 |
| Genre | : Technology & Engineering |
| ISBN | : 0309176670 |
Manufacturing, reduced to its simplest form, involves the sequencing of product forms through a number of different processes. Each individual step, known as an unit manufacturing process, can be viewed as the fundamental building block of a nation's manufacturing capability. A committee of the National Research Council has prepared a report to help define national priorities for research in unit processes. It contains an organizing framework for unit process families, criteria for determining the criticality of a process or manufacturing technology, examples of research opportunities, and a prioritized list of enabling technologies that can lead to the manufacture of products of superior quality at competitive costs. The study was performed under the sponsorship of the National Science Foundation and the Defense Department's Manufacturing Technology Program.
| Author | : Olivério D.D. Soares |
| Publisher | : Springer Science & Business Media |
| Total Pages | : 794 |
| Release | : 2012-12-06 |
| Genre | : Science |
| ISBN | : 9400936095 |
Optical Metrology is a rapidly expanding field i'n both its scientific foundations and technological developments, being of major concern to measurements, quality control, non-destructive tes ting and in fundamental research. In order to define the state-of-the-art, and to evaluate pre sent accomplishments, whilst giving an appraisal of how each of the particular topics will evolve the Optical Metrology-anAdvancedStudy Institute was organized with a concourse of the world's acknowledged experts. Thus, the Institute provided a forum for tutorial reviews blended with topics of current research in the form of a progressive and comprehensive presentation of recent promising developments, lea ding techniques and instrumentation in incoherent and coherent optics for Metrology, Sensing and Control in Science, Industry and Biomedici ne. Optical Metrology is a very broad field which is highly inter disciplinary in its applications, and in its scientific and technolo gical background. It is related to such diverse disciplines as physi cal and chemical sciences, engineering, electronics, computer scien ces, biological sciences and theoretical sciences, such as statistics. Although there was an emphasis on photomechanics and industri al applications, a marked diversity was reflected in the different background and interests of the participants. The vitality and viabi lity of the discipline was enhanced not only by the encouraging number of young scientists and industrialists participating and authoring, but also by the remarkably promising prospects found in x the practical applications supported by advanced electronic hybridi zation.
| Author | : Jerzy A. Sładek |
| Publisher | : Springer |
| Total Pages | : 472 |
| Release | : 2015-12-22 |
| Genre | : Technology & Engineering |
| ISBN | : 366248465X |
This book focuses on effective methods for assessing the accuracy of both coordinate measuring systems and coordinate measurements. It mainly reports on original research work conducted by Sladek’s team at Cracow University of Technology’s Laboratory of Coordinate Metrology. The book describes the implementation of different methods, including artificial neural networks, the Matrix Method, the Monte Carlo method and the virtual CMM (Coordinate Measuring Machine), and demonstrates how these methods can be effectively used in practice to gauge the accuracy of coordinate measurements. Moreover, the book includes an introduction to the theory of measurement uncertainty and to key techniques for assessing measurement accuracy. All methods and tools are presented in detail, using suitable mathematical formulations and illustrated with numerous examples. The book fills an important gap in the literature, providing readers with an advanced text on a topic that has been rapidly developing in recent years. The book is intended for master and PhD students, as well as for metrology engineers working at industrial and research laboratories. It not only provides them with a solid background for using existing coordinate metrology methods; it is also meant to inspire them to develop the state-of-the-art technologies that will play an important role in supporting quality growth and innovation in advanced manufacturing.
| Author | : Toru Yoshizawa |
| Publisher | : CRC Press |
| Total Pages | : 866 |
| Release | : 2017-07-28 |
| Genre | : Technology & Engineering |
| ISBN | : 1351831844 |
Handbook of Optical Metrology: Principles and Applications begins by discussing key principles and techniques before exploring practical applications of optical metrology. Designed to provide beginners with an introduction to optical metrology without sacrificing academic rigor, this comprehensive text: Covers fundamentals of light sources, lenses, prisms, and mirrors, as well as optoelectronic sensors, optical devices, and optomechanical elements Addresses interferometry, holography, and speckle methods and applications Explains Moiré metrology and the optical heterodyne measurement method Delves into the specifics of diffraction, scattering, polarization, and near-field optics Considers applications for measuring length and size, displacement, straightness and parallelism, flatness, and three-dimensional shapes This new Second Edition is fully revised to reflect the latest developments. It also includes four new chapters—nearly 100 pages—on optical coherence tomography for industrial applications, interference microscopy for surface structure analysis, noncontact dimensional and profile metrology by video measurement, and optical metrology in manufacturing technology.
