Basic Atomic Interactions of Accelerated Heavy Ions in Matter

Basic Atomic Interactions of Accelerated Heavy Ions in Matter
Author: Inga Tolstikhina
Publisher: Springer
Total Pages: 228
Release: 2018-02-28
Genre: Science
ISBN: 3319749927

This book provides an overview of the recent experimental and theoretical results on interactions of heavy ions with gaseous, solid and plasma targets from the perspective of atomic physics. The topics discussed comprise stopping power, multiple-electron loss and capture processes, equilibrium and non-equilibrium charge-state fractions in penetration of fast ion beams through matter including relativistic domain. It also addresses mean charge-states and equilibrium target thickness in ion-beam penetrations, isotope effects in low-energy electron capture, lifetimes of heavy ion beams, semi-empirical formulae for effective cross sections. The book is intended for researchers and graduate students working in atomic, plasma and accelerator physics.

Swift Heavy Ions for Materials Engineering and Nanostructuring

Swift Heavy Ions for Materials Engineering and Nanostructuring
Author: Devesh Kumar Avasthi
Publisher: Springer Science & Business Media
Total Pages: 292
Release: 2011-05-24
Genre: Science
ISBN: 9400712294

Ion beams have been used for decades for characterizing and analyzing materials. Now energetic ion beams are providing ways to modify the materials in unprecedented ways. This book highlights the emergence of high-energy swift heavy ions as a tool for tailoring the properties of materials with nanoscale structures. Swift heavy ions interact with materials by exciting/ionizing electrons without directly moving the atoms. This opens a new horizon towards the 'so-called' soft engineering. The book discusses the ion beam technology emerging from the non-equilibrium conditions and emphasizes the power of controlled irradiation to tailor the properties of various types of materials for specific needs.

Erosion and Growth of Solids Stimulated by Atom and Ion Beams

Erosion and Growth of Solids Stimulated by Atom and Ion Beams
Author: G. Kiriakidis
Publisher: Springer Science & Business Media
Total Pages: 476
Release: 2012-12-06
Genre: Technology & Engineering
ISBN: 9400944225

The members of the organising Committee and their colleagues have, for many years been investigating the evol ution of the fas'cinating surface features which develop during sputtering erosion of solids. Such experimental, theoretical and computational studies have also been carried out in many international laboratories and, as well as much cow~onality and agreement, substantial disagreements were unresolved. In view of the increasing importance of such processes in technological applications such as microlitho graphic etching for the patterning of solid state devices and in fusion technology it was felt opportune to hold a meeting in this area. Furthermore the use of energetic atomic and ion fluxes is also becoming of increasing importance in assisting or modifying the growth of thin films in a number of important industrial processes and it was therefore rational to combine the, study of both erosional and growth processes in a single meeting. These proceedings include 16 invited review and 15 oral or poster presented contributions to the NATO Advanced Study Institute on the "Erosion and Growth of Solids Stimulated by Atom and Ion Beams". The review contributions span the range from the fundamental concepts of ballistic sputtering, and how this influences surface morphology evolution, through processes involving entrapment of incident species to mechanisms involved in'the use of chemically reactive ion species. Further reviews outline the influence of energetic irradiation upon surface growth by atomic deposition whilst others discuss technologkal applications of both areas of growth and erosion.

Plasma Applications for Material Modification

Plasma Applications for Material Modification
Author: Francisco L. Tabarés
Publisher: CRC Press
Total Pages: 317
Release: 2021-09-24
Genre: Science
ISBN: 1000245276

This book is an up-to-date review of the most important plasma-based techniques for material modification, from microelectronics to biological materials and from fusion plasmas to atmospheric ones. Each its technical chapters is written by long-experienced, internationally recognised researchers. The book provides a deep and comprehensive insight into plasma technology and its associated elemental processes and is illustrated throughout with excellent figures and references to complement each section. Although some of the topics covered can be traced back several decades, care has been taken to emphasize the most recent findings and expected evolution. The first time the word ‘plasma’ appeared in print in a scientific text related to the study of electrical discharges in gases was 1928, when Irving Langmuir published his article ‘Oscillations in Ionized Gases’. It was the baptism of the predominant state of matter in the known universe (it is estimated that up to 99% of matter is plasma), although not on earth, where the conditions of pressure and temperature make normal the states of matter (solid, liquid, gas) which, in global terms, are exotic. It is enough to add energy to a solid (in the form of heat or electromagnetic radiation) to go into the liquid state, from which gas is obtained through an additional supply of energy. If we continue adding energy to the gas, we will partially or totally ionise it and reach a new state of matter, plasma, made up of free electrons, atoms and molecules (electrically neutral particles) and ions (endowed with a positive or a negative electric charge).

Materials Processing by Cluster Ion Beams

Materials Processing by Cluster Ion Beams
Author: Isao Yamada
Publisher: CRC Press
Total Pages: 258
Release: 2015-08-20
Genre: Science
ISBN: 1498711766

Materials Processing by Cluster Ion Beams: History, Technology, and Applications discusses the contemporary physics, materials science, surface engineering issues, and nanotechnology capabilities of cluster beam processing. Written by the originator of the gas cluster ion beam (GCIB) concept, this book:Offers an overview of ion beam technologies, f

SiC, Natural and Synthetic Diamond and Related Materials

SiC, Natural and Synthetic Diamond and Related Materials
Author: A.A. Gippius
Publisher: Elsevier
Total Pages: 392
Release: 1992-04-24
Genre: Science
ISBN: 0444596771

This volume addresses the burgeoning field of wide band gap materials. The 64 contributed and invited papers will do much to stimulate the well-justified ongoing work, both theoretical and experimental, in this area. The high standard of the papers attests to the significant progress that has been made in this field, as well as reporting on the challenging problems that still remain to be solved.

Handbook of Deposition Technologies for Films and Coatings

Handbook of Deposition Technologies for Films and Coatings
Author: Peter M. Martin
Publisher: William Andrew
Total Pages: 932
Release: 2009-12-01
Genre: Technology & Engineering
ISBN: 0815520328

This 3e, edited by Peter M. Martin, PNNL 2005 Inventor of the Year, is an extensive update of the many improvements in deposition technologies, mechanisms, and applications. This long-awaited revision includes updated and new chapters on atomic layer deposition, cathodic arc deposition, sculpted thin films, polymer thin films and emerging technologies. Extensive material was added throughout the book, especially in the areas concerned with plasma-assisted vapor deposition processes and metallurgical coating applications.