Materials for Optoelectronic Devices, OEICs and Photonics

Materials for Optoelectronic Devices, OEICs and Photonics
Author: H. Schlötterer
Publisher: Elsevier
Total Pages: 542
Release: 1991-10-08
Genre: Science
ISBN: 0444596755

The aim of the contributions in this volume is to give a current overview on the basic properties and applications of semiconductor and nonlinear optical materials for optoelectronics and integrated optics. They provide a cross-linkage between different materials (III-V, II-VI, Si-Ge, glasses, etc.), various sample dimensions (from bulk crystals to quantum dots), and a range of techniques for growth (LPE to MOMBE) and for processing (from surface passivation to ion beams). Major growth techniques and materials are discussed, including the sophisticated technologies required to exploit the exciting properties of low dimensional semiconductors. These proceedings will prove an invaluable guide to the current state of optoelectronic and nonlinear optical materials development, as well as indicating trends and also future markets for optoelectronic devices.

Semiconductor Materials for Optoelectronics and LTMBE Materials

Semiconductor Materials for Optoelectronics and LTMBE Materials
Author: J.P. Hirtz
Publisher: Elsevier
Total Pages: 365
Release: 2016-07-29
Genre: Science
ISBN: 1483290425

These three day symposia were designed to provide a link between specialists from university or industry who work in different fields of semiconductor optoelectronics. Symposium A dealt with topics including: epitaxial growth of III-V, II-VI, IV-VI, Si-based structures; selective-area, localized and non-planar epitaxy, shadow-mask epitaxy; bulk and new optoelectronic materials; polymers for optoelectronics. Symposium B dealt with III-V epitaxial layers grown by low temperature molecular beam epitaxy, a subject which has undergone rapid development in the last three years.

Materials for Optoelectronics

Materials for Optoelectronics
Author: Maurice Quillec
Publisher: Springer Science & Business Media
Total Pages: 404
Release: 1996-01-31
Genre: Technology & Engineering
ISBN: 9780792396659

Optoelectronics ranks one of the highest increasing rates among the different industrial branches. This activity is closely related to devices which are themselves extremely dependent on materials. Indeed, the history of optoelectronic devices has been following closely that of the materials. KLUWER Academic Publishers has thus rightly identified "Materials for Optoelectronics" as a good opportunity for a book in the series entitled "Electronic Materials; Science and Technology". Although a sound background in solid state physics is recommended, the authors have confined their contribution to a graduate student level, and tried to define any concept they use, to render the book as a whole as self-consistent as possible. In the first section the basic aspects are developed. Here, three chapters consider semiconductor materials for optoelectronics under various aspects. Prof. G. E. Stillman begins with an introduction to the field from the point of view of the optoelectronic market. Then he describes how III-V materials, especially the Multi Quantum Structures meet the requirements of optoelectronic functions, including the support of microelectronics for optoelectronic integrated circuits. In chapter 2, Prof.

Optoelectronic Integration: Physics, Technology and Applications

Optoelectronic Integration: Physics, Technology and Applications
Author: Osamu Wada
Publisher: Springer Science & Business Media
Total Pages: 490
Release: 1994-05-31
Genre: Science
ISBN: 9780792394532

By combining optoelectronics with electronics, optoelectronic integration is the challenging merger of many different areas of science and technology. Optoelectronic Integration: Physics, Technology, and Applications presents the basic physics, materials, fabrication techniques, and systems applications of optoelectronic integration in a concise and organized form. Comprehensive and up to date, this book describes fundamental device physics and III-V semiconductor growth and processing; covers the basic design and integration of lasers, photodetectors, waveguides, and transistors; reviews and analyzes optoelectronic integrated circuits (OEICs), photonic integrated circuits (PICs), and vertical optoelectronic functional device arrays; discusses packaging and systems architecture for applications in optical telecommunications, interconnections and signal processing. With numerous cross-references, end-of-chapter references, and extended summaries identifying key issues and prospects in each technical area, Optoelectronic Integration: Physics, Technology, and Applications is an invaluable reference for engineers, scientists and students working in optoelectronics.

Laser Ablation

Laser Ablation
Author: E. Fogarassy
Publisher: Newnes
Total Pages: 943
Release: 2012-12-02
Genre: Technology & Engineering
ISBN: 0444596321

This book contains the proceedings of the largest conference ever held on this subject. The strong interest in this field is largely due to the fact that both fundamental aspects of laser-surface interaction as well as applied techniques for thin film generation and patterning were treated in detail by experts from around the world.

C, H, N and O in Si and Characterization and Simulation of Materials and Processes

C, H, N and O in Si and Characterization and Simulation of Materials and Processes
Author: A. Borghesi
Publisher: Newnes
Total Pages: 580
Release: 2012-12-02
Genre: Technology & Engineering
ISBN: 044459633X

Containing over 200 papers, this volume contains the proceedings of two symposia in the E-MRS series. Part I presents a state of the art review of the topic - Carbon, Hydrogen, Nitrogen and Oxygen in Silicon and in Other Elemental Semiconductors. There was strong representation from the industrial laboratories, illustrating that the topic is highly relevant for the semiconductor industry. The second part of the volume deals with a topic which is undergoing a process of convergence with two concerns that are more particularly application oriented. Firstly, the advanced instrumentation which, through the use of atomic force and tunnel microscopies, high resolution electron microscopy and other high precision analysis instruments, now allows for direct access to atomic mechanisms. Secondly, the technological development which in all areas of applications, particularly in the field of microelectronics and microsystems, requires as a result of the miniaturisation race, a precise mastery of the microscopic mechanisms.