Materials And Process Characterization Of Ion Implantation
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| Author | : Bernd Schmidt |
| Publisher | : Springer Science & Business Media |
| Total Pages | : 425 |
| Release | : 2012-12-13 |
| Genre | : Technology & Engineering |
| ISBN | : 3211993568 |
A comprehensive review of ion beam application in modern materials research is provided, including the basics of ion beam physics and technology. The physics of ion-solid interactions for ion implantation, ion beam synthesis, sputtering and nano-patterning is treated in detail. Its applications in materials research, development and analysis, developments of special techniques and interaction mechanisms of ion beams with solid state matter result in the optimization of new material properties, which are discussed thoroughly. Solid-state properties optimization for functional materials such as doped semiconductors and metal layers for nano-electronics, metal alloys, and nano-patterned surfaces is demonstrated. The ion beam is an important tool for both materials processing and analysis. Researchers engaged in solid-state physics and materials research, engineers and technologists in the field of modern functional materials will welcome this text.
| Author | : Norman G. Einspruch |
| Publisher | : Academic Press |
| Total Pages | : 614 |
| Release | : 2014-12-01 |
| Genre | : Technology & Engineering |
| ISBN | : 1483217736 |
VLSI Electronics: Microstructure Science, Volume 6: Materials and Process Characterization addresses the problem of how to apply a broad range of sophisticated materials characterization tools to materials and processes used for development and production of very large scale integration (VLSI) electronics. This book discusses the various characterization techniques, such as Auger spectroscopy, secondary ion mass spectroscopy, X-ray topography, transmission electron microscopy, and spreading resistance. The systematic approach to the technologies of VLSI electronic materials and device manufacture are also considered. This volume is beneficial to materials scientists, chemists, and engineers who are commissioned with the responsibility of developing and implementing the production of materials and devices to support the VLSI era.
| Author | : Michael Nastasi |
| Publisher | : Springer Science & Business Media |
| Total Pages | : 271 |
| Release | : 2007-05-16 |
| Genre | : Science |
| ISBN | : 3540452982 |
Ion implantation is one of the key processing steps in silicon integrated circuit technology. Some integrated circuits require up to 17 implantation steps and circuits are seldom processed with less than 10 implantation steps. Controlled doping at controlled depths is an essential feature of implantation. Ion beam processing can also be used to improve corrosion resistance, to harden surfaces, to reduce wear and, in general, to improve materials properties. This book presents the physics and materials science of ion implantation and ion beam modification of materials. It covers ion-solid interactions used to predict ion ranges, ion straggling and lattice disorder. Also treated are shallow-junction formation and slicing silicon with hydrogen ion beams. Topics important for materials modification, such as ion-beam mixing, stresses, and sputtering, are also described.
| Author | : Bernd O. Kolbesen |
| Publisher | : The Electrochemical Society |
| Total Pages | : 479 |
| Release | : 2009-09 |
| Genre | : Semiconductors |
| ISBN | : 1566777402 |
The proceedings of ALTECH 2009 address recent developments and applications of analytical techniques for semiconductor materials, processes and devices. The papers comprise techniques of elemental and structural analysis for bulk and surface impurities and defects, thin films as well as dopants in ultra-shallow junctions.
| Author | : Xiangfu Zong |
| Publisher | : World Scientific Publishing Company |
| Total Pages | : 594 |
| Release | : 1988 |
| Genre | : Science |
| ISBN | : |
| Author | : United States. Bureau of Mines |
| Publisher | : |
| Total Pages | : 40 |
| Release | : 1980 |
| Genre | : Alloys |
| ISBN | : |
| Author | : Michael Nastasi |
| Publisher | : Cambridge University Press |
| Total Pages | : 572 |
| Release | : 1996-03-29 |
| Genre | : Science |
| ISBN | : 052137376X |
Comprehensive guide to an important materials science technique for students and researchers.
| Author | : Bernd O. Kolbesen (Chemiker.) |
| Publisher | : The Electrochemical Society |
| Total Pages | : 568 |
| Release | : 1999 |
| Genre | : Technology & Engineering |
| ISBN | : 9781566772396 |
| Author | : Norman G. Einspruch |
| Publisher | : |
| Total Pages | : 624 |
| Release | : 1981 |
| Genre | : Integrated circuits |
| ISBN | : |
| Author | : D.F. Downey |
| Publisher | : Elsevier |
| Total Pages | : 716 |
| Release | : 2012-12-02 |
| Genre | : Technology & Engineering |
| ISBN | : 0444599800 |
Ion implantation technology has made a major contribution to the dramatic advances in integrated circuit technology since the early 1970's. The ever-present need for accurate models in ion implanted species will become absolutely vital in the future due to shrinking feature sizes. Successful wide application of ion implantation, as well as exploitation of newly identified opportunities, will require the development of comprehensive implant models. The 141 papers (including 24 invited papers) in this volume address the most recent developments in this field. New structures and possible approaches are described. The implications for ion implantation technology as well as additional observations of needs and opportunities are discussed. The volume will be of value to all those who are interested in acquiring a more complete understanding of the current developments in ion implantation processes and comprehensive implant models.
