Low-Energy Ion Irradiation of Solid Surfaces
Author | : Hubert Gnaser |
Publisher | : Springer |
Total Pages | : 304 |
Release | : 2014-01-15 |
Genre | : |
ISBN | : 9783662147382 |
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Author | : Hubert Gnaser |
Publisher | : Springer |
Total Pages | : 304 |
Release | : 2014-01-15 |
Genre | : |
ISBN | : 9783662147382 |
Author | : Bernd Rauschenbach |
Publisher | : Springer Nature |
Total Pages | : 763 |
Release | : 2022-08-19 |
Genre | : Technology & Engineering |
ISBN | : 3030972771 |
This book provides a comprehensive introduction to all aspects of low-energy ion–solid interaction from basic principles to advanced applications in materials science. It features a balanced and insightful approach to the fundamentals of the low-energy ion–solid surface interaction, focusing on relevant topics such as interaction potentials, kinetics of binary collisions, ion range, radiation damages, and sputtering. Additionally, the book incorporates key updates reflecting the latest relevant results of modern research on topics such as topography evolution and thin-film deposition under ion bombardment, ion beam figuring and smoothing, generation of nanostructures, and ion beam-controlled glancing angle deposition. Filling a gap of almost 20 years of relevant research activity, this book offers a wealth of information and up-to-date results for graduate students, academic researchers, and industrial scientists working in these areas.
Author | : Hubert Gnaser |
Publisher | : Springer |
Total Pages | : 312 |
Release | : 1999 |
Genre | : Medical |
ISBN | : |
The book presents an overview on important aspects of ion irradiation of surfaces, emphasizing low impact energies. Specifically, ion penetration and implantation into solids, defect creation and amorphization of semiconductors, sputtering of elemental and multicomponent targets, and ionization processes of emitted species are discussed. It provides a synoptic view of these phenomena which are strongly interrelated by the same basic processes, but are often described separately and in diverging terminology. The book tries to bridge this gap, summarizing results from experiments, computer simulations and theoretical approaches.
Author | : Michael Nastasi |
Publisher | : Cambridge University Press |
Total Pages | : 572 |
Release | : 1996-03-29 |
Genre | : Science |
ISBN | : 052137376X |
Comprehensive guide to an important materials science technique for students and researchers.
Author | : Werner Wesch |
Publisher | : Springer |
Total Pages | : 547 |
Release | : 2016-07-14 |
Genre | : Science |
ISBN | : 3319335618 |
This book presents the method of ion beam modification of solids in realization, theory and applications in a comprehensive way. It provides a review of the physical basics of ion-solid interaction and on ion-beam induced structural modifications of solids. Ion beams are widely used to modify the physical properties of materials. A complete theory of ion stopping in matter and the calculation of the energy loss due to nuclear and electronic interactions are presented including the effect of ion channeling. To explain structural modifications due to high electronic excitations, different concepts are presented with special emphasis on the thermal spike model. Furthermore, general concepts of damage evolution as a function of ion mass, ion fluence, ion flux and temperature are described in detail and their limits and applicability are discussed. The effect of nuclear and electronic energy loss on structural modifications of solids such as damage formation, phase transitions and amorphization is reviewed for insulators and semiconductors. Finally some selected applications of ion beams are given.
Author | : Andreas Rosenauer |
Publisher | : Springer |
Total Pages | : 238 |
Release | : 2003-07-03 |
Genre | : Science |
ISBN | : 3540364072 |
This book provides tools well suited for the quantitative investigation of semiconductor electron microscopy. These tools allow for the accurate determination of the composition of ternary semiconductor nanostructures with a spatial resolution at near atomic scales. The book focuses on new methods including strain state analysis as well as evaluation of the composition via the lattice fringe analysis (CELFA) technique. The basics of these procedures as well as their advantages, drawbacks and sources of error are all discussed. The techniques are applied to quantum wells and dots in order to give insight into kinetic growth effects such as segregation and migration. In the first part of the book the fundamentals of transmission electron microscopy are provided. These are needed for an understanding of the digital image analysis techniques described in the second part of the book. There the reader will find information on different methods of composition determination. The third part of the book focuses on applications such as composition determination in InGaAs Stranski--Krastanov quantum dots. Finally it is shown how an improvement in the precision of the composition evaluation can be obtained by combining CELFA with electron holography. This is demonstrated for an AlAs/GaAs superlattice.
Author | : Rainer Behrisch |
Publisher | : Springer Science & Business Media |
Total Pages | : 527 |
Release | : 2007-07-30 |
Genre | : Technology & Engineering |
ISBN | : 3540445005 |
This book provides a long-needed survey of new results. Especially welcome is a new summary of the measured and calculated sputtering yields with an algebraic approximation formula for the energy and angular dependence of the yields, which is useful for researchers who need sputtering yields for physics research or applied problems. The book offers a critical review of computational methods for calculating sputtering yields and also includes molecular dynamics calculations.
Author | : Diederik Depla |
Publisher | : Springer Science & Business Media |
Total Pages | : 584 |
Release | : 2008-06-24 |
Genre | : Technology & Engineering |
ISBN | : 3540766642 |
In this valuable work, all aspects of the reactive magnetron sputtering process, from the discharge up to the resulting thin film growth, are described in detail, allowing the reader to understand the complete process. Hence, this book gives necessary information for those who want to start with reactive magnetron sputtering, understand and investigate the technique, control their sputtering process and tune their existing process, obtaining the desired thin films.
Author | : Kai-Erik Peiponen |
Publisher | : Springer Science & Business Media |
Total Pages | : 152 |
Release | : 1998-11-30 |
Genre | : Technology & Engineering |
ISBN | : 9783540645221 |
This book is devoted to dispersion theory in linear and nonlinear optics. Dispersion relations and methods of analysis in optical spectroscopy are derived with the aid of complex analysis. The book introduces the mathematical basis and derivations of various dispersion relations that are used in optical spectroscopy. In addition, it presents the dispersion theory of the nonlinear optical processes which are essential in modern optical spectroscopy. The book includes new methods such as the maximum entropy model for wavelength-dependent spectra analysis.