Laser Techniques in Extreme Ultraviolet
Author | : Stephen Ernest Harris |
Publisher | : American Institute of Physics |
Total Pages | : 552 |
Release | : 1984 |
Genre | : Technology & Engineering |
ISBN | : |
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Author | : Stephen Ernest Harris |
Publisher | : American Institute of Physics |
Total Pages | : 552 |
Release | : 1984 |
Genre | : Technology & Engineering |
ISBN | : |
Author | : Thomas J. McIlrath |
Publisher | : American Institute of Physics |
Total Pages | : 520 |
Release | : 1982 |
Genre | : Science |
ISBN | : |
Author | : Seymour Edwin Harris |
Publisher | : |
Total Pages | : 530 |
Release | : 1984 |
Genre | : Laser spectroscopy |
ISBN | : |
Author | : David Attwood |
Publisher | : Cambridge University Press |
Total Pages | : 611 |
Release | : 2007-02-22 |
Genre | : Technology & Engineering |
ISBN | : 1139643428 |
This detailed, comprehensive book describes the fundamental properties of soft X-rays and extreme ultraviolet (EUV) radiation and discusses their applications in a wide variety of fields, including EUV lithography for semiconductor chip manufacture and soft X-ray biomicroscopy. The author begins by presenting the relevant basic principles such as radiation and scattering, wave propagation, diffraction, and coherence. He then goes on to examine a broad range of phenomena and applications. The topics covered include spectromicroscopy, EUV astronomy, synchrotron radiation, and soft X-ray lasers. The author also provides a wealth of useful reference material such as electron binding energies, characteristic emission lines and photo-absorption cross-sections. The book will be of great interest to graduate students and researchers in engineering, physics, chemistry, and the life sciences. It will also appeal to practising engineers involved in semiconductor fabrication and materials science.
Author | : David Attwood |
Publisher | : Cambridge University Press |
Total Pages | : 655 |
Release | : 2016 |
Genre | : Science |
ISBN | : 1107062896 |
Master the physics and understand the current applications of modern X-ray and EUV sources with this fully updated second edition.
Author | : Vivek Bakshi |
Publisher | : SPIE Press |
Total Pages | : 1104 |
Release | : 2006 |
Genre | : Art |
ISBN | : 9780819458452 |
This comprehensive volume, edited by a senior technical staff member at SEMATECH, is the authoritative reference book on EUV source technology. The volume contains 38 chapters contributed by leading researchers and suppliers in the EUV source field. Topics range from a state-of-the-art overview and in-depth explanation of EUV source requirements, to fundamental atomic data and theoretical models of EUV sources based on discharge-produced plasmas (DPP) and laser-produced plasmas, to a description of prominent DPP and LPP designs and other technologies for producing EUV radiation. Additional topics include EUV source metrology and components (collectors, electrodes), debris mitigation, and mechanisms of component erosion in EUV sources. The volume is intended to meet the needs of both practitioners of the technology and readers seeking an introduction to the subject.
Author | : Prabhakar Misra |
Publisher | : CRC Press |
Total Pages | : 572 |
Release | : 2002-02-25 |
Genre | : Science |
ISBN | : 0824744063 |
This volume presents a complete and thorough examination of advances in the instrumentation, evaluation, and implementation of UV technology for reliable and efficient data acquisition and analysis. It provides real-world applications in expanding fields such as chemical physics, plasma science, photolithography, laser spectroscopy, astronomy and atmospheric science.
Author | : Neal B. Abraham |
Publisher | : Springer |
Total Pages | : 487 |
Release | : 2013-12-19 |
Genre | : Technology & Engineering |
ISBN | : 1475761872 |
This volume contains the lectures and seminars presented at the NATO Advanced Study Institute on "Physics of New Laser Sources", the twelfth course of the Europhysics School of Quantum Electronics, held under the supervision of the Quantum Electronics Division of the European Physical Society. The Institute was held at Centro "I Cappuccini" San Miniato, Tuscany, July 11-21, 1984. The Europhysics School of Quantum Electronics was started in 1970 with the aim of providing instruction for young researchers and advanced students already engaged in the area of quantum electronics or for those wishing to switch into this area after working previously in other areas. From the outset, the School has been under the direction of Prof. F. T. Arecchi, then at the University of Pavia, now at the University of Florence, and Dr. D. Roess of Heraeus, Hanau. In 1981, Prof. H. Walther, University of Munich and Max-Planck Institut fur Quantenoptik joined as co-director. Each year the Directors choose a subj~ct of particular interest, alternating fundamental topics with technological ones, and ask colleagues specifically competent in the chosen areas to take the scientific responsibility for that course.
Author | : David L. Elliott |
Publisher | : Academic Press |
Total Pages | : 367 |
Release | : 2014-06-28 |
Genre | : Science |
ISBN | : 1483296512 |
Ultraviolet Laser Technology and Applications is a hands-on reference text that identifies the main areas of UV laser technology; describes how each is applied; offers clearly illustrated examples of UV opticalsystems applications; and includes technical data on optics, lasers, materials, and systems. This book is unique for its comprehensive, in-depth coverage. Each chapter deals with a different aspect of the subject, beginning with UV light itself; moving through the optics, sources, and systems; and concluding with detailed descriptions of applications in various fields. The text enables practicing engineers and researchers to utilize concepts and innovations to solve actual problems encountered in UV optical technology applications. It also offers a wealth of information for equipment designers and manufacturers. Those in laser fields (including medical, electronics, and semiconductors), students, engineers, technicians, as well as newcomers to the subject who require a basic introduction to the topic, will all find Ultraviolet Laser Technology and Applications to be an essential resource. Serves as a valuable, practical reference to UV laser technology Presents detailed technical data and techniques Offers highly illustrated optics designs and beam delivery systems Includes an extensive bibliography, references, and glossary Covers all major UV laser markets and technology systems