Laser Annealing of Semiconductors
| Author | : J. M. Poate |
| Publisher | : |
| Total Pages | : 584 |
| Release | : 1982 |
| Genre | : Technology & Engineering |
| ISBN | : |
Laser Annealing Of Semiconductors
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Laser Annealing Processes in Semiconductor Technology
| Author | : Fuccio Cristiano |
| Publisher | : Woodhead Publishing |
| Total Pages | : 428 |
| Release | : 2021-04-21 |
| Genre | : Technology & Engineering |
| ISBN | : 0128202564 |
Laser Annealing Processes in Semiconductor Technology: Theory, Modeling and Applications in Nanoelectronics synthesizes the scientific and technological advances of laser annealing processes for current and emerging nanotechnologies. The book provides an overview of the laser-matter interactions of materials and recent advances in modeling of laser-related phenomena, with the bulk of the book focusing on current and emerging (beyond-CMOS) applications. Reviewed applications include laser annealing of CMOS, group IV semiconductors, superconducting materials, photonic materials, 2D materials. This comprehensive book is ideal for post-graduate students, new entrants, and experienced researchers in academia, research and development in materials science, physics and engineering. - Introduces the fundamentals of laser materials and device fabrication methods, including laser-matter interactions and laser-related phenomena - Addresses advances in physical modeling and in predictive simulations of laser annealing processes such as atomistic modeling and TCAD simulations - Reviews current and emerging applications of laser annealing processes such as CMOS technology and group IV semiconductors
Laser Annealing of Semiconductors
| Author | : J Poate |
| Publisher | : Elsevier |
| Total Pages | : 577 |
| Release | : 2012-12-02 |
| Genre | : Technology & Engineering |
| ISBN | : 0323145426 |
Laser Annealing of Semiconductors deals with the materials science of surfaces that have been subjected to ultrafast heating by intense laser or electron beams. This book is organized into 13 chapters that specifically tackle transient annealing of compound semiconductors. After briefly dealing with an overview of laser annealing, this book goes on discussing the concepts of solidification and crystallization pertinent to the field. These topics are followed by discussions on the main mechanisms of interaction of photon and electron beams with condensed matter; the calculation of thermophysical properties of crystalline materials; and high-speed crystal growth by laser annealing of ion-implanted silicon. The subsequent chapters describe the microstructural and topographical properties of annealed semiconductor layers and the epitaxy of ion-implanted silicon irradiated with a laser or electron beam single pulse. This text also explores the electronic and surface properties and the continuous-wave beam processing of semiconductors. The concluding chapters cover various reactions in metal-semiconductor systems, such as fast and laser-induced melting, solidification, mixing, and quenching. Laser-induced interactions in metal-semiconductor systems and the factors involved in control of the heat treatment process are also discussed in these chapters. Materials scientists and researchers and device engineers will find this book invaluable.
Laser Processing and Analysis of Materials
| Author | : Walter W. Duley |
| Publisher | : Springer Science & Business Media |
| Total Pages | : 449 |
| Release | : 2012-12-06 |
| Genre | : Science |
| ISBN | : 1475701934 |
It has often been said that the laser is a solution searching for a problem. The rapid development of laser technology over the past dozen years has led to the availability of reliable, industrially rated laser sources with a wide variety of output characteristics. This, in turn, has resulted in new laser applications as the laser becomes a familiar processing and analytical tool. The field of materials science, in particular, has become a fertile one for new laser applications. Laser annealing, alloying, cladding, and heat treating were all but unknown 10 years ago. Today, each is a separate, dynamic field of research activity with many of the early laboratory experiments resulting in the development of new industrial processing techniques using laser technology. Ten years ago, chemical processing was in its infancy awaiting, primarily, the development of reliable tunable laser sources. Now, with tunability over the entire spectrum from the vacuum ultraviolet to the far infrared, photo chemistry is undergoing revolutionary changes with several proven and many promising commercial laser processing operations as the result. The ability of laser sources to project a probing beam of light into remote or hostile environments has led to the development of a wide variety of new analytical techniques in environmental and laboratory analysis. Many of these are reviewed in this book.
Semiconductors Probed by Ultrafast Laser Spectroscopy
| Author | : R. R. Alfano |
| Publisher | : |
| Total Pages | : 584 |
| Release | : 1984 |
| Genre | : Science |
| ISBN | : |
Semiconductors Probed by Ultrafast Laser Spectroscopy, Volume II discusses the use of ultrafast laser spectroscopy in studying fast physics in semiconductors. It reviews progress on the experimental and theoretical understanding of ultrafast events that occur on a picosecond and nanosecond time scale. This volume discusses electronic relaxation in amorphous semiconductors and the physical mechanisms during and after the interaction of an intense laser pulse with a semiconductor. It also covers the relaxation of carriers in semiconductors; transient optical pulse propagation; and methods of tim ...
Laser and Electron Beam Processing of Materials
| Author | : C.W. White |
| Publisher | : Elsevier |
| Total Pages | : 788 |
| Release | : 2012-12-02 |
| Genre | : Technology & Engineering |
| ISBN | : 0323142532 |
Laser and Electron Beam Processing of Materials contains the papers presented at the symposium on "Laser and Electron Beam Processing of Materials," held in Cambridge, Massachusetts, in November 1979, sponsored by the Materials Research Society. The compilation presents reports and research papers on the use of directed energy sources, such as lasers and electron beams for materials processing. The majority of the materials presented emphasize results on semiconductor materials research. Substantial findings on research on metals, alloys, and other materials are presented as well. Topics covered by the papers include the use of scanned cw sources (both photons and electrons) to recrystallize amorphous layers, enhanced substitutional solubility, solute trapping, zone refining of impurities, and constitutional supercooling. The use of lasers and electron beams to anneal ion implant damage and contacts formation, processing of ion-implanted metals, and surface alloying of films deposited on metallic surfaces are also discussed. Metallurgists, engineers, and materials scientists will find the book very insightful.
Nanoplasmonics
| Author | : Grégory Barbillon |
| Publisher | : BoD – Books on Demand |
| Total Pages | : 496 |
| Release | : 2017-06-21 |
| Genre | : Science |
| ISBN | : 9535132776 |
Nanoplasmonics is a young topic of research, which is part of nanophotonics and nano-optics. Nanoplasmonics concerns to the investigation of electron oscillations in metallic nanostructures and nanoparticles. Surface plasmons have optical properties, which are very interesting. For instance, surface plasmons have the unique capacity to confine light at the nanoscale. Moreover, surface plasmons are very sensitive to the surrounding medium and the properties of the materials on which they propagate. In addition to the above, the surface plasmon resonances can be controlled by adjusting the size, shape, periodicity, and materials' nature. All these optical properties can enable a great number of applications, such as biosensors, optical modulators, photodetectors, and photovoltaic devices. This book is intended for a broad audience and provides an overview of some of the fundamental knowledges and applications of nanoplasmonics.
Advances in Semiconductor Nanostructures
| Author | : Alexander V. Latyshev |
| Publisher | : Elsevier |
| Total Pages | : 553 |
| Release | : 2016-11-10 |
| Genre | : Technology & Engineering |
| ISBN | : 0128105135 |
Advances in Semiconductor Nanostructures: Growth, Characterization, Properties and Applications focuses on the physical aspects of semiconductor nanostructures, including growth and processing of semiconductor nanostructures by molecular-beam epitaxy, ion-beam implantation/synthesis, pulsed laser action on all types of III–V, IV, and II–VI semiconductors, nanofabrication by bottom-up and top-down approaches, real-time observations using in situ UHV-REM and high-resolution TEM of atomic structure of quantum well, nanowires, quantum dots, and heterostructures and their electrical, optical, magnetic, and spin phenomena. The very comprehensive nature of the book makes it an indispensable source of information for researchers, scientists, and post-graduate students in the field of semiconductor physics, condensed matter physics, and physics of nanostructures, helping them in their daily research. - Presents a comprehensive reference on the novel physical phenomena and properties of semiconductor nanostructures - Covers recent developments in the field from all over the world - Provides an International approach, as chapters are based on results obtained in collaboration with research groups from Russia, Germany, France, England, Japan, Holland, USA, Belgium, China, Israel, Brazil, and former Soviet Union countries
Atomic Layer Deposition for Semiconductors
| Author | : Cheol Seong Hwang |
| Publisher | : Springer Science & Business Media |
| Total Pages | : 266 |
| Release | : 2013-10-18 |
| Genre | : Science |
| ISBN | : 146148054X |
Offering thorough coverage of atomic layer deposition (ALD), this book moves from basic chemistry of ALD and modeling of processes to examine ALD in memory, logic devices and machines. Reviews history, operating principles and ALD processes for each device.
Reliability And Radiation Effects In Compound Semiconductors
| Author | : Allan H Johnston |
| Publisher | : World Scientific |
| Total Pages | : 376 |
| Release | : 2010-04-27 |
| Genre | : Technology & Engineering |
| ISBN | : 9814467650 |
This book focuses on reliability and radiation effects in compound semiconductors, which have evolved rapidly during the last 15 years. It starts with first principles, and shows how advances in device design and manufacturing have suppressed many of the older reliability mechanisms.It is the first book that comprehensively covers reliability and radiation effects in optoelectronic as well as microelectronic devices. It contrasts reliability mechanisms of compound semiconductors with those of silicon-based devices, and shows that the reliability of many compound semiconductors has improved to the level where they can be used for ten years or more with low failure rates.
