Langmuir Blodgett Films 1982
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| Author | : G.G. Roberts |
| Publisher | : Elsevier |
| Total Pages | : 344 |
| Release | : 2016-10-26 |
| Genre | : Science |
| ISBN | : 1483289796 |
Thin Films Science and Technology, Volume 3: Langmuir–Blodgett Films, 1982 presents the developments and complementary methods for the production of ultrathin films. This book evaluates the process technology and potential of the films. Organized into two parts encompassing 48 chapters, this volume begins with an overview of the idea that the Langmuir–Blodgett method of superimposing fatty acid monolayers might be suitably modified. This text then examines the behavior of anisotropic photoconductivities in Langmuir films of rhodanine containing merocyanines with three donor nuclei diluted with arachidic acid. Other chapters describe the characteristic of pure Langmuir–Blodgett films of porphyrins. This book discusses as well the preliminary resonance Raman spectroscopy experiments on Langmuir–Blodgett films made of a small number of porphyrin layers. The final chapter deals with the need to fabricate small structures in electronic devices because of the advantages of cost and speed. This book is a valuable resource for scientists and engineers.
| Author | : John H. Moore |
| Publisher | : CRC Press |
| Total Pages | : 715 |
| Release | : 2023-07-03 |
| Genre | : Science |
| ISBN | : 1003803237 |
The Encyclopedia of Physical Chemistry and Chemical Physics introduces possibly unfamiliar areas, explains important experimental and computational techniques, and describes modern endeavors. The encyclopedia quickly provides the basics, defines the scope of each subdiscipline, and indicates where to go for a more complete and detailed explanation. Particular attention has been paid to symbols and abbreviations to make this a user-friendly encyclopedia. Care has been taken to ensure that the reading level is suitable for the trained chemist or physicist. The encyclopedia is divided in three major sections: FUNDAMENTALS: the mechanics of atoms and molecules and their interactions, the macroscopic and statistical description of systems at equilibrium, and the basic ways of treating reacting systems. The contributions in this section assume a somewhat less sophisticated audience than the two subsequent sections. At least a portion of each article inevitably covers material that might also be found in a modern, undergraduate physical chemistry text. METHODS: the instrumentation and fundamental theory employed in the major spectroscopic techniques, the experimental means for characterizing materials, the instrumentation and basic theory employed in the study of chemical kinetics, and the computational techniques used to predict the static and dynamic properties of materials. APPLICATIONS: specific topics of current interest and intensive research. For the practicing physicist or chemist, this encyclopedia is the place to start when confronted with a new problem or when the techniques of an unfamiliar area might be exploited. For a graduate student in chemistry or physics, the encyclopedia gives a synopsis of the basics and an overview of the range of activities in which physical principles are applied to chemical problems. It will lead any of these groups to the salient points of a new field as rapidly as possible and gives pointers as to where to read about the topic in more detail.
| Author | : Klaus D. Sattler |
| Publisher | : CRC Press |
| Total Pages | : 4153 |
| Release | : 2022-01-18 |
| Genre | : Science |
| ISBN | : 1351260553 |
This 21st Century Nanoscience Handbook will be the most comprehensive, up-to-date large reference work for the field of nanoscience. Handbook of Nanophysics, by the same editor, published in the fall of 2010, was embraced as the first comprehensive reference to consider both fundamental and applied aspects of nanophysics. This follow-up project has been conceived as a necessary expansion and full update that considers the significant advances made in the field since 2010. It goes well beyond the physics as warranted by recent developments in the field. Key Features: Provides the most comprehensive, up-to-date large reference work for the field. Chapters written by international experts in the field. Emphasises presentation and real results and applications. This handbook distinguishes itself from other works by its breadth of coverage, readability and timely topics. The intended readership is very broad, from students and instructors to engineers, physicists, chemists, biologists, biomedical researchers, industry professionals, governmental scientists, and others whose work is impacted by nanotechnology. It will be an indispensable resource in academic, government, and industry libraries worldwide. The fields impacted by nanoscience extend from materials science and engineering to biotechnology, biomedical engineering, medicine, electrical engineering, pharmaceutical science, computer technology, aerospace engineering, mechanical engineering, food science, and beyond.
| Author | : Donald Martin |
| Publisher | : Springer Science & Business Media |
| Total Pages | : 183 |
| Release | : 2007-12-26 |
| Genre | : Science |
| ISBN | : 0387377409 |
This book describes the current state of research and development in biomimetic membranes for nanobiotechnology applications. It takes an international perspective on the issue of developing biotechnology applications from an understanding of the biomimetic membrane at the nanoscale. The success of these applications relies on a good understanding of the interaction and incorporation of macromolecules in membranes and the fundamental properties of the membrane itself.
| Author | : Klaus D. Sattler |
| Publisher | : CRC Press |
| Total Pages | : 485 |
| Release | : 2020-11-09 |
| Genre | : Technology & Engineering |
| ISBN | : 1000710157 |
21st Century Nanoscience - A Handbook: Low-Dimensional Materials and Morphologies (Volume 4) will be the most comprehensive, up-to-date large reference work for the field of nanoscience. Handbook of Nanophysics by the same editor published in the fall of 2010 and was embraced as the first comprehensive reference to consider both fundamental and applied aspects of nanophysics. This follow-up project has been conceived as a necessary expansion and full update that considers the significant advances made in the field since 2010. It goes well beyond the physics as warranted by recent developments in the field. This fourth volume in a ten-volume set covers low-dimensional materials and morphologies. Key Features: Provides the most comprehensive, up-to-date large reference work for the field. Chapters written by international experts in the field. Emphasises presentation and real results and applications. This handbook distinguishes itself from other works by its breadth of coverage, readability and timely topics. The intended readership is very broad, from students and instructors to engineers, physicists, chemists, biologists, biomedical researchers, industry professionals, governmental scientists, and others whose work is impacted by nanotechnology. It will be an indispensable resource in academic, government, and industry libraries worldwide. The fields impacted by nanophysics extend from materials science and engineering to biotechnology, biomedical engineering, medicine, electrical engineering, pharmaceutical science, computer technology, aerospace engineering, mechanical engineering, food science, and beyond.
| Author | : C.E. Morosanu |
| Publisher | : Elsevier |
| Total Pages | : 720 |
| Release | : 2016-06-22 |
| Genre | : Technology & Engineering |
| ISBN | : 1483291731 |
The explosive growth in the semiconductor industry has caused a rapid evolution of thin film materials that lend themselves to the fabrication of state-of-the-art semiconductor devices. Early in the 1960s an old research technique named chemical vapour phase deposition (CVD), which has several unique advantages, developed into the most widely used technique for thin film preparation in electronics technology. In the last 25 years, tremendous advances have been made in the science and technology of thin films prepared by means of CVD. This book presents in a single volume, an up-to-date overview of the important field of CVD processes which has never been completely reviewed previously. Contents: Part I. 1. Evolution of CVD Films. Introductory remarks. Short history of CVD thin films. II. Fundamentals. 2. Techniques of Preparing Thin Films. Electrolytic deposition techniques. Vacuum deposition techniques. Plasma deposition techniques. Liquid-phase deposition techniques. Solid-phase deposition techniques. Chemical vapour conversion of substrate. Chemical vapour deposition. Comparison between CVD and other thin film deposition techniques. 3. Chemical Processes Used in CVD. Introduction. Description of chemical reactions used in CVD. 4. Thermodynamics of CVD. Feasibility of a CVD process. Techniques for equilibrium calculations in CVD systems. Examples of thermodynamic studies of CVD systems. 5. Kinetics of CVD. Steps and control type of a CVD heterogeneous reaction. Influence of experimental parameters on thin film deposition rate. Continuous measurement of the deposition rate. Experimental methods for studying CVD kinetics. Role of homogeneous reactions in CVD. Mechanism of CVD processes. Kinetics and mechanism of dopant incorporation. Transport phenomena in CVD. Status of kinetic and mechanism investigations in CVD systems. 6. Measurement of Thin Film Thickness. Mechanical methods. Mechanical-optical methods. Optical methods. Electrical methods. Miscellaneous methods. 7. Nucleation and Growth of CVD Films. Stages in the nucleation and growth mechanism. Regimes of nucleation and growth. Nucleation theory. Dependence of nucleation on deposition parameters. Heterogeneous nucleation and CVD film structural forms. Homogeneous nucleation. Experimental techniques. Experimental results of CVD film nucleation. 8. Thin Film Structure. Techniques for studying thin film structure. Structural defects in CVD thin films. 9. Analysis of CVD Films. Analysis techniques of thin film bulk. Analysis techniques of thin film surfaces. Film composition measurement. Depth concentration profiling. 10. Properties of CVD Films. Mechanical properties. Thermal properties. Optical properties. Photoelectric properties. Electrical properties. Magnetic properties. Chemical properties. Part III. 11. Equipment and Substrates. Equipment for CVD. Safety in CVD. Substrates. 12. Preparation and Properties of Semiconducting Thin Films. Homoepitaxial semiconducting films. Heteroepitaxial semiconducting films. 13. Preparation and Properties of Amorphous Insulating Thin Films. Oxides. Nitrides and Oxynitrides. Polymeric thin films. 14. Preparation and Properties of Conductive Thin Films. Metals and metal alloys. Resistor materials. Transparent conducting films. Miscellaneous materials. 15. Preparation and Properties of Superconducting and Magnetic Thin Films. Superconducting materials. Magnetic materials. 16. Uses of CVD Thin Films. Applications in electronics and microelectronics. Applications in the field of microwaves and optoelectronics. Miscellaneous applications. Artificial heterostructures (Quantum wells, superlattices, monolayers, two-dimensional electron gases). Part V. 17. Present and Future Importance of CVD Films.
| Author | : |
| Publisher | : |
| Total Pages | : 1234 |
| Release | : 1985 |
| Genre | : Engineering |
| ISBN | : |
| Author | : |
| Publisher | : |
| Total Pages | : |
| Release | : 1983 |
| Genre | : |
| ISBN | : |
| Author | : L. Aleksandrov |
| Publisher | : Elsevier |
| Total Pages | : 335 |
| Release | : 2016-10-27 |
| Genre | : Science |
| ISBN | : 1483289877 |
Written for physicists, chemists, and engineers specialising in crystal and film growth, semiconductor electronics, and various applications of thin films, this book reviews promising scientific and engineering trends in thin films and thin-films materials science. The first part discusses the physical characteristics of the processes occurring during the deposition and growth of films, the principal methods of obtaining semiconductor films and of reparing substrate surfaces on which crystalline films are grown, and the main applications of films. The second part contains data on epitaxial interfaces and on ways of reducing transition regions in films and film-type devices, on the processes of crystallization and recrystallization of amorphous films, and on thermodynamic conditions, mechanisms and kinetic parameters of accelerated crystallization.
| Author | : Michel Froment |
| Publisher | : Elsevier |
| Total Pages | : 784 |
| Release | : 2013-09-03 |
| Genre | : Technology & Engineering |
| ISBN | : 1483102629 |
Passivity of Metals and Semiconductors covers the proceedings of the Fifth International Symposium on Passivity, held in Bombannes, France on May30 - June3, 1983. The said symposium is concerned with passivity of metallic materials, localized corrosion, experimental techniques, and classical techniques such as optical techniques and electron spectroscopy. The book is divided into five sections. Section I deals with the concepts involved in the composition-transport phenomena and covers topics such as the transport of oxygen and water in oxide layers; the kinetics of oxidation of silicon; and the oxidation rate laws of metals that form nonstoichiometric oxides. Section II covers related techniques and their specific applications such as study of passivity of iron by in situ methods; optical methods in the study of passive films; and the analysis of multiple layer surface films by modulated reflection spectroscopy. Section III tackles amorphous metals - their passivity, their depassivation and repassivation in localized corrosion, and a comparison of models for localized breakdown of passivity. Part IV discusses the photoelectrochemistry of semiconductors; Part V tackles passivation and localized corrosion of stainless steels. The text is recommended for organic chemists, metallurgists, and engineers who would like to know more about the passivity of metals and their applications in different fields.
