Ion Implantation Technology - 94

Ion Implantation Technology - 94
Author: S. Coffa
Publisher: Newnes
Total Pages: 1031
Release: 1995-05-16
Genre: Science
ISBN: 044459972X

The aim of these proceedings is to present and stimulate discussion on the many subjects related to ion implantation among a broad mix of specialists from areas as diverse as materials science, device production and advanced ion implanters.The contents open with a paper on the future developments of the microelectronics industry in Europe within the framework of the global competition. The subsequent invited and oral presentations cover in detail the following areas: trends in processing and devices, ion-solid interaction, materials science issues, advanced implanter systms, process control and yield, future trends and applications.

Intrinsic Point Defects, Impurities, and Their Diffusion in Silicon

Intrinsic Point Defects, Impurities, and Their Diffusion in Silicon
Author: Peter Pichler
Publisher: Springer Science & Business Media
Total Pages: 576
Release: 2012-12-06
Genre: Technology & Engineering
ISBN: 3709105978

This book contains the first comprehensive review of intrinsic point defects, impurities and their complexes in silicon. Besides compiling the structures, energetic properties, identified electrical levels and spectroscopic signatures, and the diffusion behaviour from investigations, it gives a comprehensive introduction into the relevant fundamental concepts.

Properties of Crystalline Silicon

Properties of Crystalline Silicon
Author: Robert Hull
Publisher: IET
Total Pages: 1054
Release: 1999
Genre: Science
ISBN: 9780852969335

A unique and well-organized reference, this book provides illuminating data, distinctive insight and expert guidance on silicon properties.