Introduction To Plasma Spectroscopy
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| Author | : Hans-Joachim Kunze |
| Publisher | : Springer Science & Business Media |
| Total Pages | : 242 |
| Release | : 2009-09-18 |
| Genre | : Science |
| ISBN | : 3642022332 |
Although based on lectures given for graduate students and postgraduates starting in plasma physics, this concise introduction to the fundamental processes and tools is as well directed at established researchers who are newcomers to spectroscopy and seek quick access to the diagnostics of plasmas ranging from low- to high-density technical systems at low temperatures, as well as from low- to high-density hot plasmas. Basic ideas and fundamental concepts are introduced as well as typical instrumentation from the X-ray to the infrared spectral regions. Examples, techniques and methods illustrate the possibilities. This book directly addresses the experimentalist who actually has to carry out the experiments and their interpretation. For that reason about half of the book is devoted to experimental problems, the instrumentation, components, detectors and calibration.
| Author | : John R. Dean |
| Publisher | : John Wiley & Sons |
| Total Pages | : 208 |
| Release | : 2005-08-05 |
| Genre | : Science |
| ISBN | : 0470093501 |
The book provides an up-to-date account of inductively coupled plasmas and their use in atomic emission spectroscopy and mass spectrometry. Specific applications of the use of these techniques are highlighted including applications in environmental, food and industrial analysis. It is written in a distance learning / open learning style; suitable for self study applications. It contains contain self-assessment and discussion questions, worked examples and case studies that allow the reader to test their understanding of the presented material.
| Author | : R.J Goldston |
| Publisher | : CRC Press |
| Total Pages | : 514 |
| Release | : 2020-07-14 |
| Genre | : Science |
| ISBN | : 9781439822074 |
Introduction to Plasma Physics is the standard text for an introductory lecture course on plasma physics. The text's six sections lead readers systematically and comprehensively through the fundamentals of modern plasma physics. Sections on single-particle motion, plasmas as fluids, and collisional processes in plasmas lay the groundwork for a thorough understanding of the subject. The authors take care to place the material in its historical context for a rich understanding of the ideas presented. They also emphasize the importance of medical imaging in radiotherapy, providing a logical link to more advanced works in the area. The text includes problems, tables, and illustrations as well as a thorough index and a complete list of references.
| Author | : Takashi Fujimoto |
| Publisher | : Clarendon Press |
| Total Pages | : 300 |
| Release | : 2004-06-17 |
| Genre | : Science |
| ISBN | : 0191523895 |
This book focuses on the characteristics of optical radiation, or a spectrum, emitted by various plasmas. In plasma, the same atomic species can produce quite different spectra, or colours, depending on the nature of the plasma. This book gives a theoretical framework by which a particular spectrum can be interpreted correctly and coherently. The uniqueness of the book lies in its comprehensive treatment of the intensity distribution of spectral lines and the population density distribution among the atomic levels in plasmas. It is intended to provide beginners with a good perspective of the field, laying out the physics in an extremely clear manner and starting from an elementary level. A useful feature of the book is the asterisked sections and chapters which can be skipped by readers who only wish to gain a quick and basic introduction to plasma spectroscopy. It will also be useful to researchers working actively in the field, acting as a guide for carrying out experiments and interpreting experimental observations.
| Author | : Hans R. Griem |
| Publisher | : |
| Total Pages | : 366 |
| Release | : 1997 |
| Genre | : Science |
| ISBN | : 9780521455046 |
This is a comprehensive description of the theoretical foundations and experimental applications of spectroscopic methods in plasma physics research. It introduces the classical and quantum theory of radiation, with detailed descriptions of line strengths and high density effects, and describes theoretical and experimental aspects of spectral line broadening. The book illustrates the concepts of continuous spectra, level kinetics and cross sections, thermodynamic equilibrium relations, radiative energy transfer, and radiative energy losses. The basics of plasma spectroscopy to density and temperature measurements and to the determination of some other plasma properties are also explored. Over one thousand references not only guide the reader to original research covered in the chapters, but also to experimental details and instrumentation.
| Author | : Krzysztof J. Jankowski |
| Publisher | : Royal Society of Chemistry |
| Total Pages | : 263 |
| Release | : 2011 |
| Genre | : Science |
| ISBN | : 1849730520 |
This book is the most comprehensive publication on MWP technology and MWP-OES analytical spectrometry with an emphasis on practical issues.
| Author | : A. I. Morozov |
| Publisher | : CRC Press |
| Total Pages | : 828 |
| Release | : 2012-12-06 |
| Genre | : Science |
| ISBN | : 1439881332 |
As the twenty-first century progresses, plasma technology will play an increasing role in our lives, providing new sources of energy, ion-plasma processing of materials, wave electromagnetic radiation sources, space plasma thrusters, and more. Studies of the plasma state of matter not only accelerate technological developments but also improve the
| Author | : G. J. Tallents |
| Publisher | : Cambridge University Press |
| Total Pages | : 313 |
| Release | : 2018-02-22 |
| Genre | : Science |
| ISBN | : 1108318010 |
Plasmas comprise more than 99% of the observable universe. They are important in many technologies and are key potential sources for fusion power. Atomic and radiation physics is critical for the diagnosis, observation and simulation of astrophysical and laboratory plasmas, and plasma physicists working in a range of areas from astrophysics, magnetic fusion, and inertial fusion utilise atomic and radiation physics to interpret measurements. This text develops the physics of emission, absorption and interaction of light in astrophysics and in laboratory plasmas from first principles using the physics of various fields of study including quantum mechanics, electricity and magnetism, and statistical physics. Linking undergraduate level atomic and radiation physics with the advanced material required for postgraduate study and research, this text adopts a highly pedagogical approach and includes numerous exercises within each chapter for students to reinforce their understanding of the key concepts.
| Author | : Francis F. Chen |
| Publisher | : Springer Science & Business Media |
| Total Pages | : 213 |
| Release | : 2012-12-06 |
| Genre | : Science |
| ISBN | : 1461501814 |
Plasma processing of semiconductors is an interdisciplinary field requiring knowledge of both plasma physics and chemical engineering. The two authors are experts in each of these fields, and their collaboration results in the merging of these fields with a common terminology. Basic plasma concepts are introduced painlessly to those who have studied undergraduate electromagnetics but have had no previous exposure to plasmas. Unnecessarily detailed derivations are omitted; yet the reader is led to understand in some depth those concepts, such as the structure of sheaths, that are important in the design and operation of plasma processing reactors. Physicists not accustomed to low-temperature plasmas are introduced to chemical kinetics, surface science, and molecular spectroscopy. The material has been condensed to suit a nine-week graduate course, but it is sufficient to bring the reader up to date on current problems such as copper interconnects, low-k and high-k dielectrics, and oxide damage. Students will appreciate the web-style layout with ample color illustrations opposite the text, with ample room for notes. This short book is ideal for new workers in the semiconductor industry who want to be brought up to speed with minimum effort. It is also suitable for Chemical Engineering students studying plasma processing of materials; Engineers, physicists, and technicians entering the semiconductor industry who want a quick overview of the use of plasmas in the industry.
| Author | : Steve J. Hill |
| Publisher | : John Wiley & Sons |
| Total Pages | : 448 |
| Release | : 2008-04-15 |
| Genre | : Science |
| ISBN | : 1405172584 |
The first edition of Inductively Coupled Plasma Spectrometry andits Applications was written as a handbook for users who wanted abetter understanding of the theory augmented by a practical insightof how best to approach a range of applications, and to provide auseful starting point for users trying an approach or technique newto them. These objectives have been retained in the second editionbut a slight shift in emphasis gives the volume an overallperspective that is more forward looking. Structured into 11 chapters, the current edition is a thoroughrevision of the original, covering the principles of inductivelycoupled plasmas, instrumentation, methodology and applicationswithin environmental analysis, earth science, food science andclinical medicine. Each chapter, written by internationallyrecognised leaders in their specific subject areas, provides enoughdetail to be useful to both the new and experienced users. Fullaccount is taken of recent developments, such as high resolutioninstruments, novel detection systems and electrospraytechniques. Written for all analytical scientists but particularly thoseinvolved in atomic spectroscopy and in environmental, geochemical,clinical or food analysis, this timely and informative book will bean essential reference in their use of inductively coupled plasmasto achieve their own scientific goals.
