Introduction To Microelectronic Fabrication
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| Author | : Richard C. Jaeger |
| Publisher | : Pearson |
| Total Pages | : 0 |
| Release | : 2002 |
| Genre | : Integrated circuit |
| ISBN | : 9780201444940 |
For courses in Theory and Fabrication of Integrated Circuits. The author's goal in writing this text was to present a concise survey of the most up-to-date techniques in the field. It is devoted exclusively to processing, and is highlighted by careful explanations, clear, simple language, and numerous fully-solved example problems. This work assumes a minimal knowledge of integrated circuits and of terminal behavior of electronic components such as resistors, diodes, and MOS and bipolar transistors.
| Author | : Stephen A. Campbell |
| Publisher | : Oxford University Press, USA |
| Total Pages | : 572 |
| Release | : 1996 |
| Genre | : Technology & Engineering |
| ISBN | : |
The Science and Engineering of Microelectronic Fabrication provides an introduction to microelectronic processing. Geared towards a wide audience, it may be used as a textbook for both first year graduate and upper level undergraduate courses and as a handy reference for professionals. The text covers all the basic unit processes used to fabricate integrated circuits including photolithography, plasma and reactive ion etching, ion implantation, diffusion, oxidation, evaporation, vapor phase epitaxial growth, sputtering and chemical vapor deposition. Advanced processing topics such as rapid thermal processing, nonoptical lithography, molecular beam epitaxy, and metal organic chemical vapor deposition are also presented. The physics and chemistry of each process is introduced along with descriptions of the equipment used for the manufacturing of integrated circuits. The text also discusses the integration of these processes into common technologies such as CMOS, double poly bipolar, and GaAs MESFETs. Complexity/performance tradeoffs are evaluated along with a description of the current state-of-the-art devices. Each chapter includes sample problems with solutions. The book also makes use of the process simulation package SUPREM to demonstrate impurity profiles of practical interest.
| Author | : Sami Franssila |
| Publisher | : John Wiley & Sons |
| Total Pages | : 424 |
| Release | : 2005-01-28 |
| Genre | : Technology & Engineering |
| ISBN | : 0470020563 |
Microfabrication is the key technology behind integrated circuits,microsensors, photonic crystals, ink jet printers, solar cells andflat panel displays. Microsystems can be complex, but the basicmicrostructures and processes of microfabrication are fairlysimple. Introduction to Microfabrication shows how the commonmicrofabrication concepts can be applied over and over again tocreate devices with a wide variety of structures andfunctions. Featuring: * A comprehensive presentation of basic fabrication processes * An emphasis on materials and microstructures, rather than devicephysics * In-depth discussion on process integration showing how processes,materials and devices interact * A wealth of examples of both conceptual and real devices Introduction to Microfabrication includes 250 homework problems forstudents to familiarise themselves with micro-scale materials,dimensions, measurements, costs and scaling trends. Both researchand manufacturing topics are covered, with an emphasis on silicon,which is the workhorse of microfabrication. This book will serve as an excellent first text for electricalengineers, chemists, physicists and materials scientists who wishto learn about microstructures and microfabrication techniques,whether in MEMS, microelectronics or emerging applications.
| Author | : George Brewer |
| Publisher | : Elsevier |
| Total Pages | : 377 |
| Release | : 2012-12-02 |
| Genre | : Technology & Engineering |
| ISBN | : 0323153410 |
Electron-Beam Technology in Microelectronic Fabrication presents a unified description of the technology of high resolution lithography. This book is organized into six chapters, each treating a major segment of the technology of high resolution lithography. The book examines topics such as the physics of interaction of the electrons with the polymer resist in which the patterns are drawn, the machines that generate and control the beam, and ways of applying electron-beam lithography in device fabrication and in the making of masks for photolithographic replication. Chapter 2 discusses fundamental processes by which patterns are created in resist masks. Chapter 3 describes electron-beam lithography machines, including some details of each of the major elements in the electron-optical column and their effect on the focused electron beam. Chapter 4 presents the use of electron-beam lithography to make discrete devices and integrated circuits. Chapter 5 looks at the techniques and economics of mask fabrication by the use of electron beams. Finally, Chapter 6 presents a comprehensive description and evaluation of the several high resolution replication processes currently under development. This book will be of great value to students and to engineers who want to learn the unique features of high resolution lithography so that they can apply it in research, development, or production of the next generation of microelectronic devices and circuits.
| Author | : Stephen A. Campbell |
| Publisher | : OUP USA |
| Total Pages | : 0 |
| Release | : 2008-01-10 |
| Genre | : Technology & Engineering |
| ISBN | : 9780195320176 |
Designed for advanced undergraduate or first-year graduate courses in semiconductor or microelectronic fabrication, the third edition of Fabrication Engineering at the Micro and Nanoscale provides a thorough and accessible introduction to all fields of micro and nano fabrication.
| Author | : Toshiaki Makabe |
| Publisher | : CRC Press |
| Total Pages | : 355 |
| Release | : 2006-03-27 |
| Genre | : Science |
| ISBN | : 1420012274 |
Without plasma processing techniques, recent advances in microelectronics fabrication would not have been possible. But beyond simply enabling new capabilities, plasma-based techniques hold the potential to enhance and improve many processes and applications. They are viable over a wide range of size and time scales, and can be used for deposition,
| Author | : Manoj Kumar Majumder |
| Publisher | : CRC Press |
| Total Pages | : 373 |
| Release | : 2020-11-24 |
| Genre | : Science |
| ISBN | : 1000223078 |
Focussing on micro- and nanoelectronics design and technology, this book provides thorough analysis and demonstration, starting from semiconductor devices to VLSI fabrication, designing (analog and digital), on-chip interconnect modeling culminating with emerging non-silicon/ nano devices. It gives detailed description of both theoretical as well as industry standard HSPICE, Verilog, Cadence simulation based real-time modeling approach with focus on fabrication of bulk and nano-devices. Each chapter of this proposed title starts with a brief introduction of the presented topic and ends with a summary indicating the futuristic aspect including practice questions. Aimed at researchers and senior undergraduate/graduate students in electrical and electronics engineering, microelectronics, nanoelectronics and nanotechnology, this book: Provides broad and comprehensive coverage from Microelectronics to Nanoelectronics including design in analog and digital electronics. Includes HDL, and VLSI design going into the nanoelectronics arena. Discusses devices, circuit analysis, design methodology, and real-time simulation based on industry standard HSPICE tool. Explores emerging devices such as FinFETs, Tunnel FETs (TFETs) and CNTFETs including their circuit co-designing. Covers real time illustration using industry standard Verilog, Cadence and Synopsys simulations.
| Author | : Gary S. May |
| Publisher | : John Wiley & Sons |
| Total Pages | : 428 |
| Release | : 2006-05-26 |
| Genre | : Technology & Engineering |
| ISBN | : 0471790273 |
A practical guide to semiconductor manufacturing from processcontrol to yield modeling and experimental design Fundamentals of Semiconductor Manufacturing and Process Controlcovers all issues involved in manufacturing microelectronic devicesand circuits, including fabrication sequences, process control,experimental design, process modeling, yield modeling, and CIM/CAMsystems. Readers are introduced to both the theory and practice ofall basic manufacturing concepts. Following an overview of manufacturing and technology, the textexplores process monitoring methods, including those that focus onproduct wafers and those that focus on the equipment used toproduce wafers. Next, the text sets forth some fundamentals ofstatistics and yield modeling, which set the foundation for adetailed discussion of how statistical process control is used toanalyze quality and improve yields. The discussion of statistical experimental design offers readers apowerful approach for systematically varying controllable processconditions and determining their impact on output parameters thatmeasure quality. The authors introduce process modeling concepts,including several advanced process control topics such asrun-by-run, supervisory control, and process and equipmentdiagnosis. Critical coverage includes the following: * Combines process control and semiconductor manufacturing * Unique treatment of system and software technology and managementof overall manufacturing systems * Chapters include case studies, sample problems, and suggestedexercises * Instructor support includes electronic copies of the figures andan instructor's manual Graduate-level students and industrial practitioners will benefitfrom the detailed exami?nation of how electronic materials andsupplies are converted into finished integrated circuits andelectronic products in a high-volume manufacturingenvironment. An Instructor's Manual presenting detailed solutions to all theproblems in the book is available from the Wiley editorialdepartment. An Instructor Support FTP site is also available.
| Author | : Gary S. May |
| Publisher | : John Wiley & Sons |
| Total Pages | : 0 |
| Release | : 2004 |
| Genre | : Integrated circuits |
| ISBN | : 9780471452386 |
"This concise introduction to semiconductor fabrication technology covers everything professionals need to know, from crystal growth to integrated devices and circuits. Throughout, the authors address both theory and the practical aspects of each major fabrication step, including crystal growth, silicon oxidation, photolithography, etching, diffusion, ion implantation, and thin film deposition. The book integrates Computer Modeling & Simulation tools throughout. Process simulation is used as a tool for what-if analysis and discussion. Comprehensive coverage of process sequence helps readers connect individual steps into a cohesive whole."--
| Author | : John D. Cressler |
| Publisher | : CRC Press |
| Total Pages | : 590 |
| Release | : 2017-11-22 |
| Genre | : Science |
| ISBN | : 1498708277 |
We are in the center of the most life-changing technological revolution the Earth has ever known. In little more than 65 years, an eye-blink in human history, a single technological invention has launched the proverbial thousand ships, producing the most sweeping and pervasive set of changes ever to wash over humankind; changes that are reshaping the very core of human existence, on a global scale, at a relentlessly accelerating pace. And we are just at the very beginning. Silicon Earth: Introduction to Microelectronics and Nanotechnology introduces readers with little or no technical background to the marvels of microelectronics and nanotechnology, using straightforward language, an intuitive approach, minimal math, and lots of pictures. The general scientific and engineering underpinnings of microelectronics and nanotechnology are described, as well as how this new technological revolution is transforming a broad array of interdisciplinary fields, and civilization as a whole. Special "widget deconstruction" chapters address the inner workings of ubiquitous micro/nano-enabled pieces of technology, such as smartphones, flash drives, and digital cameras. Completely updated and upgraded to full color, the Second Edition: Includes new material on the design of electronic systems, the future of electronics, and the societal impact of micro/nanotechnology Provides new widget deconstructions of cutting-edge tech gadgets like the GPS-enabled smartwatch Adds end-of-chapter study questions and hundreds of new color photos Silicon Earth: Introduction to Microelectronics and Nanotechnology, Second Edition is a pick-up-and-read-cover-to-cover book for those curious about the micro/nanoworld, as well as a classroom-tested, student-and-professor-approved text ideal for an undergraduate-level university course. Lecture slides, homework examples, a deconstruction project, and discussion threads are available via an author-maintained website.
