Frontiers Of Characterization And Metrology For Nanoelectronics 2017
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Frontiers of Characterization and Metrology for Nanoelectronics
Author | : David G. Seiler |
Publisher | : American Institute of Physics |
Total Pages | : 0 |
Release | : 2009-10-26 |
Genre | : Technology & Engineering |
ISBN | : 9780735407121 |
As the semiconductor industry continues to move toward silicon nanoelectronics and beyond, the introduction of new materials, innovative processing and assembly, and novel devices brings formidable metrology challenges. We have entered an era where nanotechnology is required to meet the demand for smaller, faster, cheaper, and more complex functional chips. Innovative metrology and characterization methods have become critical. This book emphasizes the frontiers of innovation in the characterization and metrology needed to advance nanoelectronics. It comprises applications in nanoelectronic materials and devices, research and development, and manufacturing and diagnostics. Novel characterization methods for beyond CMOS and extreme CMOS devices are addressed, as well as electrical measurements, interconnects, patterning, microscopy, and modeling. The Editors believe that this book of collected papers from world-class leaders provides a basis and effective portrayal of the industry’s characterization and metrology needs and how they are being addressed by industry, academia, and government to continue the dramatic progress in semiconductors into the nanoelectronic regime. It also provides a foundation for stimulating further advances in metrology and new ideas for research and development.
Metrology and Diagnostic Techniques for Nanoelectronics
Author | : Zhiyong Ma |
Publisher | : CRC Press |
Total Pages | : 1454 |
Release | : 2017-03-27 |
Genre | : Science |
ISBN | : 1351733958 |
Nanoelectronics is changing the way the world communicates, and is transforming our daily lives. Continuing Moore’s law and miniaturization of low-power semiconductor chips with ever-increasing functionality have been relentlessly driving R&D of new devices, materials, and process capabilities to meet performance, power, and cost requirements. This book covers up-to-date advances in research and industry practices in nanometrology, critical for continuing technology scaling and product innovation. It holistically approaches the subject matter and addresses emerging and important topics in semiconductor R&D and manufacturing. It is a complete guide for metrology and diagnostic techniques essential for process technology, electronics packaging, and product development and debugging—a unique approach compared to other books. The authors are from academia, government labs, and industry and have vast experience and expertise in the topics presented. The book is intended for all those involved in IC manufacturing and nanoelectronics and for those studying nanoelectronics process and assembly technologies or working in device testing, characterization, and diagnostic techniques.
Frontiers of Characterization and Metrology for Nanoelectronics
Author | : David G. Seiler |
Publisher | : American Inst. of Physics |
Total Pages | : 0 |
Release | : 2007-09-26 |
Genre | : Science |
ISBN | : 9780735404410 |
This book contains peer-reviewed papers presented at the 2007 International Conference on Frontiers of Characterization and Metrology. It emphasizes the frontiers of innovation in the characterization and metrology needed to advance nanoelectronics. It provides an effective portrayal of the industry’s characterization and metrology needs and how they are being addressed. It also offers a foundation for further advances in metrology and new ideas for research and development.
ISTFA 2017: Proceedings from the 43rd International Symposium for Testing and Failure Analysis
Author | : ASM International |
Publisher | : ASM International |
Total Pages | : 666 |
Release | : 2017-12-01 |
Genre | : Technology & Engineering |
ISBN | : 1627081518 |
The theme for the November 2017 conference was Striving for 100% Success Rate. Papers focus on the tools and techniques needed for maximizing the success rate in every aspect of the electronic device failure analysis process.
ISTFA 2019: Proceedings of the 45th International Symposium for Testing and Failure Analysis
Author | : |
Publisher | : ASM International |
Total Pages | : 540 |
Release | : 2019-12-01 |
Genre | : Technology & Engineering |
ISBN | : 1627082735 |
The theme for the 2019 conference is Novel Computing Architectures. Papers will include discussions on the advent of Artificial Intelligence and the promise of quantum computing that are driving disruptive computing architectures; Neuromorphic chip designs on one hand, and Quantum Bits on the other, still in R&D, will introduce new computing circuitry and memory elements, novel materials, and different test methodologies. These novel computing architectures will require further innovation which is best achieved through a collaborative Failure Analysis community composed of chip manufacturers, tool vendors, and universities.
Frontiers of Characterization and Metrology for Nanoelectronics, 2011
Author | : D. G. Seiler |
Publisher | : Springer |
Total Pages | : 377 |
Release | : 2011 |
Genre | : Nanoelectronics |
ISBN | : 9780735409651 |
National Semiconductor Metrology Program
Author | : National Institute of Standards and Technology (U.S.) |
Publisher | : |
Total Pages | : 146 |
Release | : 1995 |
Genre | : Semiconductors |
ISBN | : |