Code Compliance For High Technology Industry
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Author | : William R. Acorn |
Publisher | : Elsevier |
Total Pages | : 374 |
Release | : 1994-12-31 |
Genre | : Technology & Engineering |
ISBN | : 0080945899 |
Facilities which utilize hazardous liquids and gases represent a significant potential liability to the owner, operator, and general public in terms of personnel safety and preservation of assets. It is obvious that a catastrophic incident or loss of property or personnel is to be avoided at all costs. This book was conceived to give the reader a guide to understanding the requirements of the various codes and regulations that apply to the design, construction, and operation of facilities utilizing hazardous materials in their processes.
Author | : Robert B. Cohen |
Publisher | : Routledge |
Total Pages | : 122 |
Release | : 2019-04-02 |
Genre | : Business & Economics |
ISBN | : 0429711662 |
This book describes European and Japanese nontariff barriers (NTBs) in areas of high-technology trade and discusses their impact on the international behavior of U.S. firms. This study was prompted by the rising incidence of nontariff measures in high-technology sectors, as governments increasingly attempt to promote the growth of new industries th
Author | : B. W. Marguglio |
Publisher | : ASTM International |
Total Pages | : 712 |
Release | : 1977 |
Genre | : Technology & Engineering |
ISBN | : 9780803101975 |
Author | : Robert Goldscheider |
Publisher | : John Wiley & Sons |
Total Pages | : 312 |
Release | : 2006-03-31 |
Genre | : Law |
ISBN | : 0471740675 |
"The LESI Guide to Licensing Best Practices, to which I was proud to contribute, has found solid acceptance in the international licensing community. The new volume of Licensing Best Practices maintains this high standard. It was designed to be complementary to its predecessor and broadens the scope of the scholarship. Standing alone, Licensing Best Practices is a valuable source of contemporary information. In combination with The LESI Guide to Licensing Best Practices, we have a very valuable source of insights and practical knowledge." —Heinz Goddar Partner Boehmert & Boehmert "Few if any other intellectual property references lay the required geographic foundation for the scientific, business, and legal issues presented. Goldscheider and Gordon demonstrate that tech transfer occurs in a global arena. The book lives up to its title: Licensing Best Practices." —James E. Malackowski President & CEO, Ocean Tomo, LLC past president, LES-USA & Canada An invaluable complement to the field's acclaimed book on licensing best practices Spanning the globe, from Scandinavia to Japan and Mexico to Korea, Licensing Best Practices provides a comprehensive and user-friendly resource for professionals in licensing and technology management. Featuring contributions from some of the most highly regarded LESI professionals, this definitive guide includes detailed discussions on some of the hottest topics in licensing, including: Licensing and Technology Transfer to China Software Licensing as a Driver of the Indian Economy Secrets of Successful Dealmaking in Asia Licensing in Scandinavia-Home of Entrepreneurial Inventors, Industrialists, and Philanthropists Global Innovation and Licensing Opportunities on the Internet Energy and Environment Driving Technology and Licensing Licensing Nanotechnology Assuring Royalty Compliance in High Technology Licensing Intellectual Property Allocation Strategies in Joint Ventures Applications of Game Theory to IP Royalty Negotiations
Author | : Oleg A. Popov |
Publisher | : Elsevier |
Total Pages | : 467 |
Release | : 1996-12-31 |
Genre | : Science |
ISBN | : 0815517890 |
This book describes the design, physics, and performance of high density plasma sources which have been extensively explored in low pressure plasma processing, such as plasma etching and planarization, plasma enhanced chemical vapor deposition of thin films, sputtered deposition of metals and dielectrics, epitaxial growth of silicon and GaAs, and many other applications. This is a comprehensive survey and a detailed description of most advanced high density plasma sources used in plasma processing. The book is a balanced presentation in that it gives both a theoretical treatment and practical applications. It should be of considerable interest to scientists and engineers working on plasma source design, and process development.
Author | : Tyozi Uyeda |
Publisher | : Elsevier |
Total Pages | : 469 |
Release | : 1995-12-31 |
Genre | : Technology & Engineering |
ISBN | : 0815519419 |
This book was written with several objectives in mind: 1. To share with as many scientists and engineers as possible the intriguing scientific aspects of ultra-fine particles (UFPs) and to show their potential as new materials. 2. Entice such researchers to participate in the development of this emerging field. 3. To publicize the achievements of the Ultra-Fine Particle Project, which was carried out under the auspices of the Exploratory Research for Advanced Technology program (ERATO). In addition to the members of the Ultra-Fine Particle Project, contributions from other pioneers in this field are included. To achieve the first objective described above, the uniformity of the contents and focus on a single central theme have been sacrificed somewhat to provide a broad coverage. It is expected that the reader can discover an appropriate topic for further development of new materials and basic technology by reading selected sections of this book. Alternately, one may gain an overview of this new field by reviewing the entire book, which can potentially lead to new directions in the development of UFPs.
Author | : Raymond L. Boxman |
Publisher | : William Andrew |
Total Pages | : 775 |
Release | : 1996-12-31 |
Genre | : Technology & Engineering |
ISBN | : 0815517793 |
This is a comprehensive text describing the basic physics and technological applications of vacuum arcs. Part I describes basic physics of the vacuum arc, beginning with a brief tutorial review of plasma and electrical discharge physics, then describes the arc ignition process, cathode and anode spots which serve as the locus for plasma generation, and resultant interelectrode plasma. Part II describes the applications of the vacuum arc for depositing thin films and coatings, refining metals, switching high power, and as sources of intense electron, ion, plasma, and x-ray beams.
Author | : Paul H. Holloway |
Publisher | : Cambridge University Press |
Total Pages | : 937 |
Release | : 2008-10-19 |
Genre | : Technology & Engineering |
ISBN | : 0080946143 |
This book reviews the recent advances and current technologies used to produce microelectronic and optoelectronic devices from compound semiconductors. It provides a complete overview of the technologies necessary to grow bulk single-crystal substrates, grow hetero-or homoepitaxial films, and process advanced devices such as HBT's, QW diode lasers, etc.
Author | : Hugh O. Pierson |
Publisher | : William Andrew |
Total Pages | : 363 |
Release | : 1996-12-31 |
Genre | : Technology & Engineering |
ISBN | : 081551770X |
Refractory carbides and nitrides are useful materials with numerous industrial applications and a promising future, in addition to being materials of great interest to the scientific community. Although most of their applications are recent, the refractory carbides and nitrides have been known for over one hundred years. The industrial importance of the refractory carbides and nitrides is growing rapidly, not only in the traditional and well-established applications based on the strength and refractory nature of these materials such as cutting tools and abrasives, but also in new and promising fields such as electronics and optoelectronics.
Author | : |
Publisher | : |
Total Pages | : 640 |
Release | : 2003 |
Genre | : California, Northern |
ISBN | : |