Applications Of Thin Film Multilayered Structures To Figured X Ray Optics
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Physics, Fabrication, and Applications of Multilayered Structures
Author | : Claude Weisbuch |
Publisher | : Springer Science & Business Media |
Total Pages | : 414 |
Release | : 2013-06-29 |
Genre | : Science |
ISBN | : 1475700911 |
Low-dimensional materials are of fundamental interest in physics and chemistry and have also found a wide variety of technological applica tions in fields ranging from microelectronics to optics. Since 1986, several seminars and summer schools devoted to low-dimensional systems have been supported by NATO. The present one, Physics, Fabrication and Applications of Multilayered structures, brought together specialists from different fields in order to review fabrication techniques, charac terization methods, physics and applications. Artificially layered materials are attractive because alternately layering two (or more) elements, by evaporation or sputtering, is a way to obtain new materials with (hopefully) new physical properties that pure materials or alloys do not allow. These new possibilities can be ob tained in electronic transport, optics, magnetism or the reflectivity of x-rays and slow neutrons. By changing the components and the thickness of the layers one can track continuously how the new properties appear and follow the importance of the multilayer structure of the materials. In addition, with their large number of interfaces the study of inter face properties becomes easier in multilayered structures than in mono layers or bilayers. As a rule, the role of the interface quality, and also the coupling between layers, increases as the thickness of the layer decreases. Several applications at the development stage require layer thicknesses of just a few atomic layers.
Multilayer Structures and Laboratory X-ray Laser Research
Author | : Natale M. Ceglio |
Publisher | : |
Total Pages | : 252 |
Release | : 1987 |
Genre | : Science |
ISBN | : |
Papers read at the San Diego, Cal. meeting, Aug. 1986.
Thin Film Growth Techniques for Low-Dimensional Structures
Author | : R.F.C. Farrow |
Publisher | : Springer Science & Business Media |
Total Pages | : 548 |
Release | : 2013-03-09 |
Genre | : Technology & Engineering |
ISBN | : 1468491458 |
This work represents the account of a NATO Advanced Research Workshop on "Thin Film Growth Techniques for Low Dimensional Structures", held at the University of Sussex, Brighton, England from 15-19 Sept. 1986. The objective of the workshop was to review the problems of the growth and characterisation of thin semiconductor and metal layers. Recent advances in deposition techniques have made it possible to design new material which is based on ultra-thin layers and this is now posing challenges for scientists, technologists and engineers in the assessment and utilisation of such new material. Molecular beam epitaxy (MBE) has become well established as a method for growing thin single crystal layers of semiconductors. Until recently, MBE was confined to the growth of III-V compounds and alloys, but now it is being used for group IV semiconductors and II-VI compounds. Examples of such work are given in this volume. MBE has one major advantage over other crystal growth techniques in that the structure of the growing layer can be continuously monitored using reflection high energy electron diffraction (RHEED). This technique has offered a rare bonus in that the time dependent intensity variations of RHEED can be used to determine growth rates and alloy composition rather precisely. Indeed, a great deal of new information about the kinetics of crystal growth from the vapour phase is beginning to emerge.
Publications of Los Alamos Research
Author | : Los Alamos National Laboratory |
Publisher | : |
Total Pages | : 190 |
Release | : 1985 |
Genre | : Research |
ISBN | : |
Optical Thin Films and Structures
Author | : Tsvetanka Babeva |
Publisher | : MDPI |
Total Pages | : 128 |
Release | : 2021-06-22 |
Genre | : Science |
ISBN | : 3036508929 |
The book is devoted to the design, application and characterization of thin films and structures, with special emphasis on optical applications. It comprises ten papers—five featured and five regular—authored by scientists all over the world. Diverse materials are studied and their possible applications are demonstrated and discussed—transparent conductive coatings and structures from ZnO doped with Al and Ga and Ti-doped SnO2, polymers and nanosized zeolite thin films for optical sensing, TiO2 with linear and nonlinear optical properties, organic diamagnetic materials, broadband optical coatings, CrWN glass molding coatings, and silicon on insulator waveguides.