X-ray Scattering From Semiconductors (2nd Edition)

X-ray Scattering From Semiconductors (2nd Edition)
Author: Paul F Fewster
Publisher: World Scientific
Total Pages: 315
Release: 2003-07-07
Genre: Technology & Engineering
ISBN: 178326098X

This book presents a practical guide to the analysis of materials and includes a thorough description of the underlying theories and instrumental aberrations caused by real experiments. The main emphasis concerns the analysis of thin films and multilayers, primarily semiconductors, although the techniques are very general. Semiconductors can be very perfect composite crystals and therefore their study can lead to the largest volume of information, since X-ray scattering can assess the deviation from perfection.The description is intentionally conceptual so that the reader can grasp the real processes involved. In this way the analysis becomes significantly easier, making the reader aware of misleading artifacts and assisting in the determination of a more complete and reliable analysis. The theory of scattering is very important and is covered in such a way that the assumptions are clear. Greatest emphasis is placed on the dynamical diffraction theory including new developments extending its applicability to reciprocal space mapping and modelling samples with relaxed and distorted interfaces.A practical guide to the measurement of diffraction patterns, including the smearing effects introduced to the measurement, is also presented.

X-Ray Scattering from Semiconductors and Other Materials

X-Ray Scattering from Semiconductors and Other Materials
Author: Paul F. Fewster
Publisher: World Scientific
Total Pages: 510
Release: 2015
Genre: Science
ISBN: 9814436933

This third edition has been extended considerably to incorporate more information on instrument influences on the interpretation of X-ray scattering profiles and reciprocal space maps. Another significant inclusion is on the scattering from powder samples, covering a new theoretical approach that explains features that conventional theory cannot. The new edition includes some of the latest methodologies and theoretical treatments, including the latest thinking on dynamical theory and diffuse scattering. Recent advances in detectors also present new opportunities for rapid data collection and some very different approaches in data collection techniques; the possibilities associated with these advances will be included. This edition should be of interest to those who use X-ray scattering to understand more about their samples, so that they can make a better judgment of the parameter and confidence levels in their analyses, and how the combination of instrument, sample and detection should be considered as a whole to ensure this.

X-ray Scattering From Semiconductors

X-ray Scattering From Semiconductors
Author: Paul F Fewster
Publisher: World Scientific
Total Pages: 303
Release: 2000-10-27
Genre: Science
ISBN: 1783262079

X-ray scattering is used extensively to provide detailed structural information about materials. Semiconductors have benefited from X-ray scattering techniques as an essential feedback method for crystal growth, including compositional and thickness determination of thin layers. The methods have been developed to reveal very detailed structural information concerning material quality, interface structure, relaxation, defects, surface damage, etc.This book provides a thorough description of the techniques involved in obtaining that information, including X-ray diffractometers and their associated instrument functions, data collection methods, and the simulation of the diffraction patterns observed. Also presented are examples and procedures for interpreting the data to build a picture of the sample, much of which will be common to materials other than semiconductors./a

X-Ray Scattering from Semiconductors (2n

X-Ray Scattering from Semiconductors (2n
Author: Paul F. Fewster
Publisher: Imperial College Pr
Total Pages: 299
Release: 2003
Genre: Science
ISBN: 9781860943607

This book presents a practical guide to the analysis of materials and includes a thorough description of the underlying theories and instrumental aberrations caused by real experiments. The main emphasis concerns the analysis of thin films and multilayers, primarily semiconductors, although the techniques are very general. Semiconductors can be very perfect composite crystals and therefore their study can lead to the largest volume of information, since X-ray scattering can assess the deviation from perfection.The description is intentionally conceptual so that the reader can grasp the real processes involved. In this way the analysis becomes significantly easier, making the reader aware of misleading artifacts and assisting in the determination of a more complete and reliable analysis. The theory of scattering is very important and is covered in such a way that the assumptions are clear. Greatest emphasis is placed on the dynamical diffraction theory including new developments extending its applicability to reciprocal space mapping and modelling samples with relaxed and distorted interfaces.A practical guide to the measurement of diffraction patterns, including the smearing effects introduced to the measurement, is also presented.

High-Resolution X-Ray Scattering

High-Resolution X-Ray Scattering
Author: Ullrich Pietsch
Publisher: Springer Science & Business Media
Total Pages: 410
Release: 2013-03-09
Genre: Technology & Engineering
ISBN: 1475740506

During the last 20 years interest in high-resolution x-ray diffractometry and reflectivity has grown as a result of the development of the semiconductor industry and the increasing interest in material research of thin layers of magnetic, organic, and other materials. For example, optoelectronics requires a subsequent epitaxy of thin layers of different semiconductor materials. Here, the individuallayer thicknesses are scaled down to a few atomic layers in order to exploit quantum effects. For reasons of electronic and optical confinement, these thin layers are embedded within much thicker cladding layers or stacks of multilayers of slightly different chemical composition. It is evident that the interface quality of those quantum weHs is quite important for the function of devices. Thin metallic layers often show magnetic properties which do not ap pear for thick layers or in bulk material. The investigation of the mutual interaction of magnetic and non-magnetic layers leads to the discovery of colossal magnetoresistance, for example. This property is strongly related to the thickness and interface roughness of covered layers.

Anomalous X-Ray Scattering for Materials Characterization

Anomalous X-Ray Scattering for Materials Characterization
Author: Yoshio Waseda
Publisher: Springer
Total Pages: 224
Release: 2003-07-01
Genre: Technology & Engineering
ISBN: 354046008X

The production of multi layered thin films with sufficient reliability is a key technology for device fabrication in micro electronics. In the Co/Cu type multi layers, for example, magnetoresistance has been found as large as 80 % at 4. 2 K and 50 % at room temperature. In addition to such gigantic mag netoresistance, these multi layers indicate anti ferromagnetic and ferromag netic oscillation behavior with an increase in the thickness of the layers of the non magnetic component. These interesting properties of the new synthetic flmctional materials are attributed to their periodic and interracial structures at a microscopic level, although the origin of such peculiar features is not fully understood. Information on the surface structure or the number density of atoms in the near surface region may provide better insight. Amorphous alloys, frequently referred to as metallic glasses, are produced by rapid quenching from the melt. The second generation amorphous alloys, called "bulk amorphous alloys", have been discovered in some Pd based and Zr based alloy systems, with a super cooled liquid region at more than 120 K. In these alloy systems, one can obtain a sample thickness of several centime ters. Growing scientific and technological curiosity about the new amorphous alloys has focused on the fundamental factors, such as the atomic scale struc ture, which are responsible for the thermal stability with certain chemical compositions.

X-Ray Metrology in Semiconductor Manufacturing

X-Ray Metrology in Semiconductor Manufacturing
Author: D. Keith Bowen
Publisher: CRC Press
Total Pages: 304
Release: 2018-10-03
Genre: Technology & Engineering
ISBN: 9781420005653

The scales involved in modern semiconductor manufacturing and microelectronics continue to plunge downward. Effective and accurate characterization of materials with thicknesses below a few nanometers can be achieved using x-rays. While many books are available on the theory behind x-ray metrology (XRM), X-Ray Metrology in Semiconductor Manufacturing is the first book to focus on the practical aspects of the technology and its application in device fabrication and solving new materials problems. Following a general overview of the field, the first section of the book is organized by application and outlines the techniques that are best suited to each. The next section delves into the techniques and theory behind the applications, such as specular x-ray reflectivity, diffraction imaging, and defect mapping. Finally, the third section provides technological details of each technique, answering questions commonly encountered in practice. The authors supply real examples from the semiconductor and magnetic recording industries as well as more than 150 clearly drawn figures to illustrate the discussion. They also summarize the principles and key information about each method with inset boxes found throughout the text. Written by world leaders in the field, X-Ray Metrology in Semiconductor Manufacturing provides real solutions with a focus on accuracy, repeatability, and throughput.

X-Ray Diffuse Scattering from Self-Organized Mesoscopic Semiconductor Structures

X-Ray Diffuse Scattering from Self-Organized Mesoscopic Semiconductor Structures
Author: Martin Schmidbauer
Publisher: Springer Science & Business Media
Total Pages: 224
Release: 2004-01-09
Genre: Science
ISBN: 9783540201793

This monograph represents a critical survey of the outstanding capabilities of X-ray diffuse scattering for the structural characterization of mesoscopic material systems. The mesoscopic regime comprises length scales ranging from a few up to some hundreds of nanometers. It is of particular relevance at semiconductor layer systems where, for example, interface roughness or low-dimensional objects such as quantum dots and quantum wires have attracted much interest. An extensive overview of the present state-of-the-art theory of X-ray diffuse scattering at mesoscopic structures is given followed by a valuable description of various experimental techniques. Selected up-to-date examples are discussed. The aim of the present book is to combine aspects of self-organized growth of mesoscopic structures with corresponding X-ray diffuse scattering experiments.

X-Ray Scattering of Soft Matter

X-Ray Scattering of Soft Matter
Author: Norbert Stribeck
Publisher: Springer Science & Business Media
Total Pages: 251
Release: 2007-05-16
Genre: Technology & Engineering
ISBN: 3540698566

This manual is a useful ready-reference guide to the analytical power of modern X-ray scattering in the field of soft matter. The author describes simple tools that can elucidate the mechanisms of structure evolution in the studied materials, and follows this up with a step-by-step guide to more advanced methods. Data analysis based on clear, unequivocal results is rendered simple and straightforward – with a stress on careful planning of experiments and adequate recording of all required data.

X-Ray Diffraction

X-Ray Diffraction
Author: C. Suryanarayana
Publisher: Springer Science & Business Media
Total Pages: 275
Release: 2013-06-29
Genre: Technology & Engineering
ISBN: 1489901485

In this, the only book available to combine both theoretical and practical aspects of x-ray diffraction, the authors emphasize a "hands on" approach through experiments and examples based on actual laboratory data. Part I presents the basics of x-ray diffraction and explains its use in obtaining structural and chemical information. In Part II, eight experimental modules enable the students to gain an appreciation for what information can be obtained by x-ray diffraction and how to interpret it. Examples from all classes of materials -- metals, ceramics, semiconductors, and polymers -- are included. Diffraction patterns and Bragg angles are provided for students without diffractometers. 192 illustrations.