Vacuum Evaporated and Cathodic Sputtered Thin Films

Vacuum Evaporated and Cathodic Sputtered Thin Films
Author: E. Krikorian
Publisher:
Total Pages: 82
Release: 1964
Genre:
ISBN:

The effects of formation conditions on the epitaxial growth of thin films deposited by cathodic sputtering and vacuum evaporation are reported. The primary condition parameters considered are substrate temperature and rate of deposition. Trends have also been established for the effect of thickness, annealing and residual gas pressure. The results of a detailed investigation of Ge sputtered onto single crystal Ge, both (111) and (100), and (111) CaF2, are presented. Less detailed, but consistent results were obtained for identical film-substrate systems obtained by vacuum deposition. Data are also included for Ge deposited on single crystal Si, mica, amorphous quartz and glass. Other film-substrate systems considered include gold on rock salt and glass, silver on rock salt, and Si on Si. (Author).

Vacuum Technology, Thin Films, and Sputtering

Vacuum Technology, Thin Films, and Sputtering
Author: R. V. Stuart
Publisher: Academic Press
Total Pages: 160
Release: 2012-12-02
Genre: Technology & Engineering
ISBN: 0323139159

Vacuum technology is advancing and expanding so rapidly that a major difficulty for most companies in the field is finding qualified technicians needed for expansion and as replacements. The only recourse for most companies is to hire capable, though untrained, people to train them in-house. One of the problems in this course of action is that it repeatedly draws on the valuable time of experienced personnel to explain fundamental concepts to a trainee. Provides a variety of exercises in eac

Handbook of Deposition Technologies for Films and Coatings

Handbook of Deposition Technologies for Films and Coatings
Author: Peter M. Martin
Publisher: William Andrew
Total Pages: 932
Release: 2009-12-01
Genre: Technology & Engineering
ISBN: 0815520328

This 3e, edited by Peter M. Martin, PNNL 2005 Inventor of the Year, is an extensive update of the many improvements in deposition technologies, mechanisms, and applications. This long-awaited revision includes updated and new chapters on atomic layer deposition, cathodic arc deposition, sculpted thin films, polymer thin films and emerging technologies. Extensive material was added throughout the book, especially in the areas concerned with plasma-assisted vapor deposition processes and metallurgical coating applications.

Chemical Physics of Thin Film Deposition Processes for Micro- and Nano-Technologies

Chemical Physics of Thin Film Deposition Processes for Micro- and Nano-Technologies
Author: Y. Pauleau
Publisher: Springer Science & Business Media
Total Pages: 372
Release: 2012-12-06
Genre: Technology & Engineering
ISBN: 940100353X

An up-to-date collection of tutorial papers on the latest advances in the deposition and growth of thin films for micro and nano technologies. The emphasis is on fundamental aspects, principles and applications of deposition techniques used for the fabrication of micro and nano devices. The deposition of thin films is described, emphasising the gas phase and surface chemistry and its effects on the growth rates and properties of films. Gas-phase phenomena, surface chemistry, growth mechanisms and the modelling of deposition processes are thoroughly described and discussed to provide a clear understanding of the growth of thin films and microstructures via thermally activated, laser induced, photon assisted, ion beam assisted, and plasma enhanced vapour deposition processes. A handbook for engineers and scientists and an introduction for students of microelectronics.

Handbook of Physical Vapor Deposition (PVD) Processing

Handbook of Physical Vapor Deposition (PVD) Processing
Author: D. M. Mattox
Publisher: Cambridge University Press
Total Pages: 947
Release: 2014-09-19
Genre: Technology & Engineering
ISBN: 0080946585

This book covers all aspects of physical vapor deposition (PVD) process technology from the characterizing and preparing the substrate material, through deposition processing and film characterization, to post-deposition processing. The emphasis of the book is on the aspects of the process flow that are critical to economical deposition of films that can meet the required performance specifications. The book covers subjects seldom treated in the literature: substrate characterization, adhesion, cleaning and the processing. The book also covers the widely discussed subjects of vacuum technology and the fundamentals of individual deposition processes. However, the author uniquely relates these topics to the practical issues that arise in PVD processing, such as contamination control and film growth effects, which are also rarely discussed in the literature. In bringing these subjects together in one book, the reader can understand the interrelationship between various aspects of the film deposition processing and the resulting film properties. The author draws upon his long experience with developing PVD processes and troubleshooting the processes in the manufacturing environment, to provide useful hints for not only avoiding problems, but also for solving problems when they arise. He uses actual experiences, called ""war stories"", to emphasize certain points. Special formatting of the text allows a reader who is already knowledgeable in the subject to scan through a section and find discussions that are of particular interest. The author has tried to make the subject index as useful as possible so that the reader can rapidly go to sections of particular interest. Extensive references allow the reader to pursue subjects in greater detail if desired. The book is intended to be both an introduction for those who are new to the field and a valuable resource to those already in the field. The discussion of transferring technology between R&D and manufacturing provided in Appendix 1, will be of special interest to the manager or engineer responsible for moving a PVD product and process from R&D into production. Appendix 2 has an extensive listing of periodical publications and professional societies that relate to PVD processing. The extensive Glossary of Terms and Acronyms provided in Appendix 3 will be of particular use to students and to those not fully conversant with the terminology of PVD processing or with the English language.