Ulsi Science And Technology 1991
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ULSI Science and Technology, 1991
Author | : John M. Andrews |
Publisher | : |
Total Pages | : 962 |
Release | : 1991 |
Genre | : Integrated circuits |
ISBN | : |
ULSI Science and Technology/1997
Author | : Hisham Z. Massoud |
Publisher | : The Electrochemical Society |
Total Pages | : 686 |
Release | : 1997 |
Genre | : Computers |
ISBN | : 9781566771306 |
Proceedings of the Fourth International Symposium on Cleaning Technology in Semiconductor Device Manufacturing
Author | : Richard E. Novak |
Publisher | : The Electrochemical Society |
Total Pages | : 642 |
Release | : 1996 |
Genre | : Technology & Engineering |
ISBN | : 9781566771153 |
Silicon Materials Science and Technology
Author | : Howard R. Huff |
Publisher | : The Electrochemical Society |
Total Pages | : 894 |
Release | : 1998 |
Genre | : Technology & Engineering |
ISBN | : 9781566771931 |
Proceedings of the First International Symposium on Chemical Mechanical Planarization
Author | : Iqbal Ali |
Publisher | : The Electrochemical Society |
Total Pages | : 294 |
Release | : 1997 |
Genre | : Science |
ISBN | : 9781566771726 |
Proceedings of the Symposia on Patterning Science and Technology II
Author | : International Symposium on Patterning Science and Technology. 2, 1991, Phoenix, Ariz.. |
Publisher | : |
Total Pages | : |
Release | : 1992 |
Genre | : |
ISBN | : 9781566770071 |
Rapid Thermal Processing
Author | : Richard B. Fair |
Publisher | : Academic Press |
Total Pages | : 441 |
Release | : 2012-12-02 |
Genre | : Technology & Engineering |
ISBN | : 0323139809 |
This is the first definitive book on rapid thermal processing (RTP), an essential namufacturing technology for single-wafer processing in highly controlled environments. Written and edited by nine experts in the field, this book covers a range of topics for academics and engineers alike, moving from basic theory to advanced technology for wafer manufacturing. The book also provides new information on the suitability or RTP for thin film deposition, junction formation, silicides, epitaxy, and in situ processing. Complete discussions on equipment designs and comparisons between RTP and other processing approaches also make this book useful for supplemental information on silicon processing, VLSI processing, and integrated circuit engineering.
Proceedings of the Symposium on Contamination Control and Defect Reduction in Semiconductor Manufacturing III
Author | : Dennis N. Schmidt |
Publisher | : The Electrochemical Society |
Total Pages | : 454 |
Release | : 1994 |
Genre | : Technology & Engineering |
ISBN | : 9781566770415 |