ULSI Process Integration 6

ULSI Process Integration 6
Author: C. Claeys
Publisher: The Electrochemical Society
Total Pages: 547
Release: 2009-09
Genre: Integrated circuits
ISBN: 1566777445

ULSI Process Integration 6 covers all aspects of process integration. Sections are devoted to 1) Device Technologies, 2) Front-end-of-line integration (gate stacks, shallow junctions, dry etching, etc.), 3) Back-end-of-line integration (CMP, low-k, Cu interconnect, air-gaps, 3D packaging, etc.), 4) Alternative channel technologies (Ge, III-V, hybrid integration), and 5) Emerging technologies (CNT, graphene, polymer electronics, nanotubes).

ULSI Process Integration 5

ULSI Process Integration 5
Author: Cor L. Claeys
Publisher: The Electrochemical Society
Total Pages: 509
Release: 2007
Genre: Integrated circuits
ISBN: 1566775728

The symposium provided a forum for reviewing and discussing all aspects of process integration, with special focus on nanoscaled technologies, 65 nm and beyond on DRAM, SRAM, flash memory, high density logic-low power, RF, mixed analog-digital, process integration yield, CMP chemistries, low-k processes, gate stacks, metal gates, rapid thermal processing, silicides, copper interconnects, carbon nanotubes, novel materials, high mobility substrates (SOI, sSi, SiGe, GeOI), strain engineering, and hybrid integration.

ULSI Process Integration III

ULSI Process Integration III
Author: Electrochemical Society. Meeting
Publisher: The Electrochemical Society
Total Pages: 620
Release: 2003
Genre: Technology & Engineering
ISBN: 9781566773768

ULSI Process Integration II

ULSI Process Integration II
Author: Cor L. Claeys
Publisher: The Electrochemical Society
Total Pages: 636
Release: 2001
Genre: Technology & Engineering
ISBN: 9781566773089

SiGe, Ge, and Related Compounds 4: Materials, Processing, and Devices

SiGe, Ge, and Related Compounds 4: Materials, Processing, and Devices
Author: D. Harame
Publisher: The Electrochemical Society
Total Pages: 1066
Release: 2010-10
Genre: Science
ISBN: 1566778255

Advanced semiconductor technology is depending on innovation and less on "classical" scaling. SiGe, Ge, and Related Compounds has become a key component in the arsenal in improving semiconductor performance. This symposium discusses the technology to form these materials, process them, FET devices incorporating them, Surfaces and Interfaces, Optoelectronic devices, and HBT devices.