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| Author | : Donald L. Smith |
| Publisher | : McGraw Hill Professional |
| Total Pages | : 648 |
| Release | : 1995-03-22 |
| Genre | : Technology & Engineering |
| ISBN | : 9780070585027 |
Publisher's Note: Products purchased from Third Party sellers are not guaranteed by the publisher for quality, authenticity, or access to any online entitlements included with the product.
| Author | : Donald Leonard Smith |
| Publisher | : McGraw-Hill Companies |
| Total Pages | : 616 |
| Release | : 1995 |
| Genre | : Dispositivos de películas delgadas |
| ISBN | : 9780071139137 |
| Author | : Professor K.S. K.S Sree Harsha |
| Publisher | : Elsevier |
| Total Pages | : 1173 |
| Release | : 2005-12-16 |
| Genre | : Technology & Engineering |
| ISBN | : 0080480314 |
The goal of producing devices that are smaller, faster, more functional, reproducible, reliable and economical has given thin film processing a unique role in technology.Principles of Vapor Deposition of Thin Films brings in to one place a diverse amount of scientific background that is considered essential to become knowledgeable in thin film depostition techniques. Its ultimate goal as a reference is to provide the foundation upon which thin film science and technological innovation are possible.* Offers detailed derivation of important formulae.* Thoroughly covers the basic principles of materials science that are important to any thin film preparation.* Careful attention to terminologies, concepts and definitions, as well as abundance of illustrations offer clear support for the text.
| Author | : Krishna Seshan |
| Publisher | : |
| Total Pages | : 629 |
| Release | : 2002 |
| Genre | : Chemical vapor deposition |
| ISBN | : 9786612253195 |
The 2nd edition contains new chapters on contamination and contamination control that describe the basics and the issues. Another new chapter on meteorology explains the growth of sophisticated, automatic tools capable of measuring thickness and spacing of sub-micron dimensions. The book also covers PVD, laser and e-beam assisted deposition, MBE, and ion beam methods to bring together physical vapor deposition techniques. Two entirely new areas are focused on: chemical mechanical polishing, which helps attain the flatness that is required by modern lithography methods, and new materials used for interconnect dielectric materials, specifically organic polyimide materials.
| Author | : Kiyotaka Wasa |
| Publisher | : William Andrew |
| Total Pages | : 657 |
| Release | : 2012-12-31 |
| Genre | : Technology & Engineering |
| ISBN | : 1437734847 |
This thoroughly updated new edition includes an entirely new team of contributing authors with backgrounds specializing in the various new applications of sputtering technology. It forms a bridge between fundamental theory and practical application, giving an insight into innovative new materials, devices and systems. Organized into three parts for ease of use, this Handbook introduces the fundamentals of thin films and sputtering deposition, explores the theory and practices of this field, and also covers new technology such as nano-functional materials and MEMS. Wide varieties of functional thin film materials and processing are described, and experimental data is provided with detailed examples and theoretical descriptions. - A strong applications focus, covering current and emerging technologies, including nano-materials and MEMS (microelectrolmechanical systems) for energy, environments, communications, and/or bio-medical field. New chapters on computer simulation of sputtering and MEMS completes the update and insures that the new edition includes the most current and forward-looking coverage available - All applications discussed are supported by theoretical discussions, offering readers both the "how" and the "why" of each technique - 40% revision: the new edition includes an entirely new team of contributing authors with backgrounds specializing in the various new applications that are covered in the book and providing the most up-to-date coverage available anywhere
| Author | : Peter M. Martin |
| Publisher | : William Andrew |
| Total Pages | : 932 |
| Release | : 2009-12-01 |
| Genre | : Technology & Engineering |
| ISBN | : 0815520328 |
This 3e, edited by Peter M. Martin, PNNL 2005 Inventor of the Year, is an extensive update of the many improvements in deposition technologies, mechanisms, and applications. This long-awaited revision includes updated and new chapters on atomic layer deposition, cathodic arc deposition, sculpted thin films, polymer thin films and emerging technologies. Extensive material was added throughout the book, especially in the areas concerned with plasma-assisted vapor deposition processes and metallurgical coating applications.
| Author | : Milton Ohring |
| Publisher | : Academic Press |
| Total Pages | : 744 |
| Release | : 1992 |
| Genre | : Science |
| ISBN | : 9780125249904 |
Prepared as a textbook complete with problems after each chapter, specifically intended for classroom use in universities.
| Author | : Cheol Seong Hwang |
| Publisher | : Springer Science & Business Media |
| Total Pages | : 266 |
| Release | : 2013-10-18 |
| Genre | : Science |
| ISBN | : 146148054X |
Offering thorough coverage of atomic layer deposition (ALD), this book moves from basic chemistry of ALD and modeling of processes to examine ALD in memory, logic devices and machines. Reviews history, operating principles and ALD processes for each device.
| Author | : Matthew Pelliccione |
| Publisher | : Springer Science & Business Media |
| Total Pages | : 206 |
| Release | : 2008-01-29 |
| Genre | : Technology & Engineering |
| ISBN | : 0387751092 |
The focus of this book is on modeling and simulations used in research on the morphological evolution during film growth. The authors emphasize the detailed mathematical formulation of the problem. The book will enable readers themselves to set up a computational program to investigate specific topics of interest in thin film deposition. It will benefit those working in any discipline that requires an understanding of thin film growth processes.
| Author | : Donald M. Mattox |
| Publisher | : William Andrew |
| Total Pages | : 383 |
| Release | : 2018-08-21 |
| Genre | : Technology & Engineering |
| ISBN | : 0128130857 |
The Foundations of Vacuum Coating Technology, Second Edition, is a revised and expanded version of the first edition, which was published in 2003. The book reviews the histories of the various vacuum coating technologies and expands on the history of the enabling technologies of vacuum technology, plasma technology, power supplies, and low-pressure plasma-enhanced chemical vapor deposition. The melding of these technologies has resulted in new processes and products that have greatly expanded the application of vacuum coatings for use in our everyday lives. The book is unique in that it makes extensive reference to the patent literature (mostly US) and how it relates to the history of vacuum coating. The book includes a Historical Timeline of Vacuum Coating Technology and a Historical Timeline of Vacuum/Plasma Technology, as well as a Glossary of Terms used in the vacuum coating and surface engineering industries. - History and detailed descriptions of Vacuum Deposition Technologies - Review of Enabling Technologies and their importance to current applications - Extensively referenced text - Patents are referenced as part of the history - Historical Timelines for Vacuum Coating Technology and Vacuum/Plasma Technology - Glossary of Terms for vacuum coating
