Structural Optical And Electrical Properties Of Yttrium Dopped Hafnium Oxide Nanocrystalline Thin Films
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Chemically Deposited Nanocrystalline Metal Oxide Thin Films
Author | : Fabian I. Ezema |
Publisher | : Springer Nature |
Total Pages | : 926 |
Release | : 2021-06-26 |
Genre | : Technology & Engineering |
ISBN | : 3030684628 |
This book guides beginners in the areas of thin film preparation, characterization, and device making, while providing insight into these areas for experts. As chemically deposited metal oxides are currently gaining attention in development of devices such as solar cells, supercapacitors, batteries, sensors, etc., the book illustrates how the chemical deposition route is emerging as a relatively inexpensive, simple, and convenient solution for large area deposition. The advancement in the nanostructured materials for the development of devices is fully discussed.
Ceramic Abstracts
Author | : American Ceramic Society |
Publisher | : |
Total Pages | : 1000 |
Release | : 1996 |
Genre | : Ceramics |
ISBN | : |
Atomic Layer Deposition for Semiconductors
Author | : Cheol Seong Hwang |
Publisher | : Springer Science & Business Media |
Total Pages | : 266 |
Release | : 2013-10-18 |
Genre | : Science |
ISBN | : 146148054X |
Offering thorough coverage of atomic layer deposition (ALD), this book moves from basic chemistry of ALD and modeling of processes to examine ALD in memory, logic devices and machines. Reviews history, operating principles and ALD processes for each device.
The Environmental Challenges of Nuclear Disarmament
Author | : Thomas E. Baca |
Publisher | : Springer Science & Business Media |
Total Pages | : 376 |
Release | : 2000-08-31 |
Genre | : Medical |
ISBN | : 9780792362029 |
This book draws together recognized experts from numerous institutions in Western Europe, Eastern Europe, the former Soviet Union, and North America. Nuclear facility decontamination and decommissioning, waste treatment, management and disposal, long-term monitoring and surveillance, and prevention of proliferation are the primary topics discussed, including critical assessments of the existing knowledge and identification of the needs for future collaboration. Proposals are presented for a variety of national and international agencies, and preliminary business plans developed for collaboration with private companies. A network of international projects needs to be financed since it is such projects that will ultimately ease tensions, help solve nuclear waste contamination and security problems, and help pave the road toward nuclear weapons disarmament.
Divertor Development for a Future Fusion Power Plant
Author | : Prachai Norajitra |
Publisher | : KIT Scientific Publishing |
Total Pages | : 154 |
Release | : 2014-09 |
Genre | : Technology & Engineering |
ISBN | : 3866447388 |
Nuclear fusion is considered as a future source of sustainable energy supply. Since the H-mode discovery in ASDEX experiment "Divertor I" in 1982, the divertor has been an integral part of all modern tokamaks and stellarators. The major goal of this thesis is to develop a feasible divertor design for a fusion power plant to be built after ITER. The thesis describes the approach in the conceptual development of a helium-cooled divertor and the methods of verification and validation of the design.
Ferroelectricity in Doped Hafnium Oxide
Author | : Uwe Schroeder |
Publisher | : Woodhead Publishing |
Total Pages | : 572 |
Release | : 2019-03-27 |
Genre | : Technology & Engineering |
ISBN | : 0081024312 |
Ferroelectricity in Doped Hafnium Oxide: Materials, Properties and Devices covers all aspects relating to the structural and electrical properties of HfO2 and its implementation into semiconductor devices, including a comparison to standard ferroelectric materials. The ferroelectric and field-induced ferroelectric properties of HfO2-based films are considered promising for various applications, including non-volatile memories, negative capacitance field-effect-transistors, energy storage, harvesting, and solid-state cooling. Fundamentals of ferroelectric and piezoelectric properties, HfO2 processes, and the impact of dopants on ferroelectric properties are also extensively discussed in the book, along with phase transition, switching kinetics, epitaxial growth, thickness scaling, and more. Additional chapters consider the modeling of ferroelectric phase transformation, structural characterization, and the differences and similarities between HFO2 and standard ferroelectric materials. Finally, HfO2 based devices are summarized. - Explores all aspects of the structural and electrical properties of HfO2, including processes, modelling and implementation into semiconductor devices - Considers potential applications including FeCaps, FeFETs, NCFETs, FTJs and more - Provides comparison of an emerging ferroelectric material to conventional ferroelectric materials with insights to the problems of downscaling that conventional ferroelectrics face
Gallium Oxide
Author | : Masataka Higashiwaki |
Publisher | : Springer Nature |
Total Pages | : 768 |
Release | : 2020-04-23 |
Genre | : Technology & Engineering |
ISBN | : 3030371530 |
This book provides comprehensive coverage of the new wide-bandgap semiconductor gallium oxide (Ga2O3). Ga2O3 has been attracting much attention due to its excellent materials properties. It features an extremely large bandgap of greater than 4.5 eV and availability of large-size, high-quality native substrates produced from melt-grown bulk single crystals. Ga2O3 is thus a rising star among ultra-wide-bandgap semiconductors and represents a key emerging research field for the worldwide semiconductor community. Expert chapters cover physical properties, synthesis, and state-of-the-art applications, including materials properties, growth techniques of melt-grown bulk single crystals and epitaxial thin films, and many types of devices. The book is an essential resource for academic and industry readers who have an interest in, or plan to start, a new R&D project related to Ga2O3.
Oxide Electronics
Author | : Asim K. Ray |
Publisher | : John Wiley & Sons |
Total Pages | : 628 |
Release | : 2021-04-12 |
Genre | : Technology & Engineering |
ISBN | : 1119529476 |
Oxide Electronics Multiple disciplines converge in this insightful exploration of complex metal oxides and their functions and properties Oxide Electronics delivers a broad and comprehensive exploration of complex metal oxides designed to meet the multidisciplinary needs of electrical and electronic engineers, physicists, and material scientists. The distinguished author eschews complex mathematics whenever possible and focuses on the physical and functional properties of metal oxides in each chapter. Each of the sixteen chapters featured within the book begins with an abstract and an introduction to the topic, clear explanations are presented with graphical illustrations and relevant equations throughout the book. Numerous supporting references are included, and each chapter is self-contained, making them perfect for use both as a reference and as study material. Readers will learn how and why the field of oxide electronics is a key area of research and exploitation in materials science, electrical engineering, and semiconductor physics. The book encompasses every application area where the functional and electronic properties of various genres of oxides are exploited. Readers will also learn from topics like: Thorough discussions of High-k gate oxide for silicon heterostructure MOSFET devices and semiconductor-dielectric interfaces An exploration of printable high-mobility transparent amorphous oxide semiconductors Treatments of graphene oxide electronics, magnetic oxides, ferroelectric oxides, and materials for spin electronics Examinations of the calcium aluminate binary compound, perovoksites for photovoltaics, and oxide 2Degs Analyses of various applications for oxide electronics, including data storage, microprocessors, biomedical devices, LCDs, photovoltaic cells, TFTs, and sensors Suitable for researchers in semiconductor technology or working in materials science, electrical engineering, and physics, Oxide Electronics will also earn a place in the libraries of private industry researchers like device engineers working on electronic applications of oxide electronics. Engineers working on photovoltaics, sensors, or consumer electronics will also benefit from this book.