Various experiments on low energy sputtering (the ejection of particles from a solid surface under ion bombardment in a vacuum) was performed. Apparatus was constructed to coat the tip of thermocouples with a 2 micron layer of nickel obtained by sputtering, for evaluation and comparison with similar films formed by other means. Several thermocouples were coated. Several compound semiconductor crystals were sputtered. This work included measurements of sputtering yields, mass spectrometric study of the sputtered particles, and a study of the angular distribution of the sputtered atoms. The angular distribution of sputtered atoms from metallic single crystals was studied, as a function of target temperature, of bombarding ion energy, of the angle of incidence of the bombarding ion, and finally at very low ion energies. Instrumentation work was done on the measurement of the average kinetic energy of particles sputtered of a Cu single crystal were made, and a search for negative sputtered ions carried out. The sputtering yield of singly crystal faces of Ag at low ion energies were measured. Finally, preliminary work was carried out on the low energy sputtering of insulators. (Author).