Si
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Author | : Si Robertson |
Publisher | : Simon and Schuster |
Total Pages | : 237 |
Release | : 2013-09-03 |
Genre | : Performing Arts |
ISBN | : 1471133729 |
The star of the global hit TV series Duck Dynasty gives his inside track on life and the Roberston clan. With more than 12 million viewers in the US now tuning in to watch the latest episodes of the Duck Dynasty, and a growing cult following in the UK and around the world, there is sure to be an eager audience for this wonderful volume from the Ducks' favourite uncle. Si is the wise-cracking, tea-drinking uncle of the Robertson clan. His book showcases his unique, often weirdly true (if somewhat nonsensical) sayings about life, ducks and everything in between. He talks about his off-screen family members, including his wife and children, to provide a new insight to the wider Robertson world and give a revealing glimpse into his life and times - something that is sure to delight his millions of fans. In a world that is often made more complicated than it needs to be, the Robertsons show that there is another way to achieve peace and happiness. With more than a million copies already sold in the US, where it has been a No 1 bestseller, Si-Cology 1 is the perfect gift for all fans of the Duck Dynasty.
Author | : Eric Garfunkel |
Publisher | : Springer Science & Business Media |
Total Pages | : 503 |
Release | : 2012-12-06 |
Genre | : Technology & Engineering |
ISBN | : 9401150087 |
An extrapolation of ULSI scaling trends indicates that minimum feature sizes below 0.1 mu and gate thicknesses of Audience: Both expert scientists and engineers who wish to keep up with cutting edge research, and new students who wish to learn more about the exciting basic research issues relevant to next-generation device technology.
Author | : Hisham Z. Massoud |
Publisher | : |
Total Pages | : 562 |
Release | : 2000 |
Genre | : Nature |
ISBN | : |
Author | : Chetan Singh Solanki |
Publisher | : Springer |
Total Pages | : 210 |
Release | : 2017-06-30 |
Genre | : Technology & Engineering |
ISBN | : 9811047715 |
This book offers essential insights into c-Si based solar cells and fundamentals of reflection, refraction, and light trapping. The basic physics and technology for light trapping in c-Si based solar cells are covered, from traditional to advanced light trapping structures. Further, the book discusses the latest developments in plasmonics for c-Si solar cell applications, along with their future scope and the requirements for further research. The book offers a valuable guide for graduate students, researchers and professionals interested in the latest trends in solar cell technologies.
Author | : Lucas Briola |
Publisher | : CUA Press |
Total Pages | : 288 |
Release | : 2022-12-28 |
Genre | : Religion |
ISBN | : 0813235812 |
No other encyclical has generated as much conversation—both Catholic and non-Catholic—as Laudato si’. Often forgotten in these conversations is the theological heart and eucharistic vision of the encyclical and its integral ecology. Even the title of Laudato si’—“Praised be!”—signals the centrality of right praise in caring for our common home. Using Bernard Lonergan’s theology of history, this book unearths the doxological, eucharistic vision that shapes the encyclical’s integral presentation of social and ecological conversion. It offers the first book-length study that recovers the eucharistic nature of Laudato si’. In drawing out the eucharistic vision of Laudato si’, the book accomplishes several feats for the reader. It roots the eucharistic dimensions of the encyclical in the writings of Popes John Paul II and Benedict XVI, showing how Pope Francis develops their thought in notable ways. It introduces Bernard Lonergan’s theology of history, showing how his framework can capture the eucharistic contours of caring for our common home; so too, in light of Laudato si’, does the book expand his theology of history to incorporate both ecological concern and the doxological, eucharistic essence of the church. The book assembles a liturgically shaped, systematic account of the church’s social mission. It joins poles otherwise sundered in a polarized church and world: between worship and justice, between concerns for human life and concerns for the natural world. Realizing the eucharistic vision of Laudato si’ promises much for our contemporary moment. Pope Francis recently observed that the integral ecology of Laudato si’ holds the key for the world’s recovery from the COVID-19 pandemic. The U.S. Catholic Bishops recently launched a Eucharistic Revival that aims to rekindle eucharistic devotion and praxis. The Eucharistic Vision of Laudato Si’: Praise, Conversion, and Integral Ecology supplies a timely study that helps fulfill these intertwined calls.
Author | : A. Borghesi |
Publisher | : Newnes |
Total Pages | : 580 |
Release | : 2012-12-02 |
Genre | : Technology & Engineering |
ISBN | : 044459633X |
Containing over 200 papers, this volume contains the proceedings of two symposia in the E-MRS series. Part I presents a state of the art review of the topic - Carbon, Hydrogen, Nitrogen and Oxygen in Silicon and in Other Elemental Semiconductors. There was strong representation from the industrial laboratories, illustrating that the topic is highly relevant for the semiconductor industry. The second part of the volume deals with a topic which is undergoing a process of convergence with two concerns that are more particularly application oriented. Firstly, the advanced instrumentation which, through the use of atomic force and tunnel microscopies, high resolution electron microscopy and other high precision analysis instruments, now allows for direct access to atomic mechanisms. Secondly, the technological development which in all areas of applications, particularly in the field of microelectronics and microsystems, requires as a result of the miniaturisation race, a precise mastery of the microscopic mechanisms.
Author | : Ajay Kumar Srivastava |
Publisher | : Springer Nature |
Total Pages | : 183 |
Release | : 2019-09-13 |
Genre | : Science |
ISBN | : 3030195317 |
This book reviews the HL-LHC experiments and the fourth-generation photon science experiments, discussing the latest radiation hardening techniques, optimization of device & process parameters using TCAD simulation tools, and the experimental characterization required to develop rad-hard Si detectors for x-ray induced surface damage and bulk damage by hadronic irradiation. Consisting of eleven chapters, it introduces various types of strip and pixel detector designs for the current upgrade, radiation, and dynamic range requirement of the experiments, and presents an overview of radiation detectors, especially Si detectors. It also describes the design of pixel detectors, experiments and characterization of Si detectors. The book is intended for researchers and master’s level students with an understanding of radiation detector physics. It provides a concept that uses TCAD simulation to optimize the electrical performance of the devices used in the harsh radiation environment of the colliders and at XFEL.
Author | : Fred Roozeboom |
Publisher | : The Electrochemical Society |
Total Pages | : 472 |
Release | : 2006 |
Genre | : Gate array circuits |
ISBN | : 1566775027 |
These proceedings describe processing, materials, and equipment for CMOS front-end integration including gate stack, source/drain and channel engineering. Topics: strained Si/SiGe and Si/SiGe on insulator; high-mobility channels including III-V¿s, etc.; nanowires and carbon nanotubes; high-k dielectrics, metal and FUSI gate electrodes; doping/annealing for ultra-shallow junctions; low-resistivity contacts; advanced deposition (e.g. ALD, CVD, MBE), RTP, UV, plasma and laser-assisted processes.
Author | : V. Narayanan |
Publisher | : The Electrochemical Society |
Total Pages | : 367 |
Release | : 2009-05 |
Genre | : Gate array circuits |
ISBN | : 1566777097 |
This issue of ¿ECS Transactions¿ describes processing, materials and equipment for CMOS front-end integration including gate stack, source/drain and channel engineering. Topics include strained Si/SiGe and Si/SiGe on insulator; high-mobility channels including III-V¿s, etc.; nanowires and carbon nanotubes; high-k dielectrics, metal and FUSI gate electrodes; doping/annealing for ultra-shallow junctions; low-resistivity contacts; advanced deposition (e.g. ALD, CVD, MBE), RTP, UV, plasma and laser-assisted processes.
Author | : International Bureau of Weights and Measures |
Publisher | : |
Total Pages | : 52 |
Release | : 1974 |
Genre | : Metric system |
ISBN | : |