Rapid Thermal Processing for Future Semiconductor Devices

Rapid Thermal Processing for Future Semiconductor Devices
Author: H. Fukuda
Publisher: Elsevier
Total Pages: 161
Release: 2003-04-02
Genre: Science
ISBN: 0080540260

This volume is a collection of papers which were presented at the 2001 International Conference on Rapid Thermal Processing (RTP 2001) held at Ise Shima, Mie, on November 14-16, 2001. This symposium is second conference followed the previous successful first International RTP conference held at Hokkaido in 1997. The RTP 2001 covered the latest developments in RTP and other short-time processing continuously aiming to point out the future direction in the Silicon ULSI devices and II-VI, III-V compound semiconductor devices.This book covers the following areas: advanced MOS gate stack, integration technologies, advancd channel engineering including shallow junction, SiGe, hetero-structure, novel metallization, inter-connect, silicidation, low-k materials, thin dielectrics including gate dielectrics and high-k materials, thin film deposition including SiGe, SOI and SiC, process and device modelling, Laser-assisted crystallization and TFT device fabrication technologies, temperature monitoring and slip-free technologies.

Handbook of Semiconductor Manufacturing Technology

Handbook of Semiconductor Manufacturing Technology
Author: Yoshio Nishi
Publisher: CRC Press
Total Pages: 3276
Release: 2017-12-19
Genre: Technology & Engineering
ISBN: 1351829823

Retaining the comprehensive and in-depth approach that cemented the bestselling first edition's place as a standard reference in the field, the Handbook of Semiconductor Manufacturing Technology, Second Edition features new and updated material that keeps it at the vanguard of today's most dynamic and rapidly growing field. Iconic experts Robert Doering and Yoshio Nishi have again assembled a team of the world's leading specialists in every area of semiconductor manufacturing to provide the most reliable, authoritative, and industry-leading information available. Stay Current with the Latest Technologies In addition to updates to nearly every existing chapter, this edition features five entirely new contributions on... Silicon-on-insulator (SOI) materials and devices Supercritical CO2 in semiconductor cleaning Low-κ dielectrics Atomic-layer deposition Damascene copper electroplating Effects of terrestrial radiation on integrated circuits (ICs) Reflecting rapid progress in many areas, several chapters were heavily revised and updated, and in some cases, rewritten to reflect rapid advances in such areas as interconnect technologies, gate dielectrics, photomask fabrication, IC packaging, and 300 mm wafer fabrication. While no book can be up-to-the-minute with the advances in the semiconductor field, the Handbook of Semiconductor Manufacturing Technology keeps the most important data, methods, tools, and techniques close at hand.

Rapid Thermal Processing of Semiconductors

Rapid Thermal Processing of Semiconductors
Author: Victor E. Borisenko
Publisher: Springer Science & Business Media
Total Pages: 374
Release: 2013-11-22
Genre: Technology & Engineering
ISBN: 1489918043

Rapid thermal processing has contributed to the development of single wafer cluster processing tools and other innovations in integrated circuit manufacturing environments. Borisenko and Hesketh review theoretical and experimental progress in the field, discussing a wide range of materials, processes, and conditions. They thoroughly cover the work of international investigators in the field.

Subsecond Annealing of Advanced Materials

Subsecond Annealing of Advanced Materials
Author: Wolfgang Skorupa
Publisher: Springer Science & Business Media
Total Pages: 330
Release: 2013-12-16
Genre: Technology & Engineering
ISBN: 3319031317

The thermal processing of materials ranges from few fem to seconds by Swift Heavy Ion Implantation to about one second using advanced Rapid Thermal Annealing. This book offers after an historical excursus selected contributions on fundamental and applied aspects of thermal processing of classical elemental semiconductors and other advanced materials including nanostructures with novel optoelectronic, magnetic, and superconducting properties. Special emphasis is given on the diffusion and segregation of impurity atoms during thermal treatment. A broad range of examples describes the solid phase and/or liquid phase processing of elemental and compound semiconductors, dielectric composites and organic materials.

Rapid Thermal Processing: Volume 52

Rapid Thermal Processing: Volume 52
Author: Thomas O. Sedgwick
Publisher: Mrs Proceedings
Total Pages: 512
Release: 1986-04-15
Genre: Technology & Engineering
ISBN:

The MRS Symposium Proceeding series is an internationally recognised reference suitable for researchers and practitioners.

Flash Lamp Annealing

Flash Lamp Annealing
Author: Lars Rebohle
Publisher: Springer
Total Pages: 304
Release: 2019-07-27
Genre: Technology & Engineering
ISBN: 3030232999

This book provides a comprehensive survey of the technology of flash lamp annealing (FLA) for thermal processing of semiconductors. It gives a detailed introduction to the FLA technology and its physical background. Advantages, drawbacks and process issues are addressed in detail and allow the reader to properly plan and perform their own thermal processing. Moreover, this books gives a broad overview of the applications of flash lamp annealing, including a comprehensive literature survey. Several case studies of simulated temperature profiles in real material systems give the reader the necessary insight into the underlying physics and simulations. This book is a valuable reference work for both novice and advanced users.