Pulsed Plasma-enhanced Chemical Vapor Deposition of Nanolaminates and Metal Oxide Alloys
Author | : Pieter C. Rowlette |
Publisher | : |
Total Pages | : 304 |
Release | : 2010 |
Genre | : Ceramic to metal bonding |
ISBN | : |
Download Pulsed Plasma Enhanced Chemical Vapor Deposition Of Nanolaminates And Metal Oxide Alloys full books in PDF, epub, and Kindle. Read online free Pulsed Plasma Enhanced Chemical Vapor Deposition Of Nanolaminates And Metal Oxide Alloys ebook anywhere anytime directly on your device. Fast Download speed and no annoying ads. We cannot guarantee that every ebooks is available!
Author | : Pieter C. Rowlette |
Publisher | : |
Total Pages | : 304 |
Release | : 2010 |
Genre | : Ceramic to metal bonding |
ISBN | : |
Author | : Rakhi P. Patel |
Publisher | : |
Total Pages | : 270 |
Release | : 2012 |
Genre | : Ceramic to metal bonding |
ISBN | : |
Author | : |
Publisher | : |
Total Pages | : |
Release | : 2000 |
Genre | : |
ISBN | : |
A method is disclosed of forming a vanadium oxide film on a substrate utilizing plasma enhanced chemical vapor deposition. The method includes positioning a substrate within a plasma reaction chamber and then forming a precursor gas comprised of a vanadium-containing chloride gas in an inert carrier gas. This precursor gas is then mixed with selected amounts of hydrogen and oxygen and directed into the reaction chamber. The amounts of precursor gas, oxygen and hydrogen are selected to optimize the final properties of the vanadium oxide film An rf plasma is generated within the reaction chamber to chemically react the precursor gas with the hydrogen and the oxygen to cause deposition of a vanadium oxide film on the substrate while the chamber deposition pressure is maintained at about one torr or less. Finally, the byproduct gases are removed from the plasma reaction chamber.
Author | : Pietro Mandracci |
Publisher | : BoD – Books on Demand |
Total Pages | : 166 |
Release | : 2019-01-10 |
Genre | : Technology & Engineering |
ISBN | : 1789849608 |
Chemical vapor deposition (CVD) techniques have played a major role in the development of modern technology, and the rise of nanotechnology has further increased their importance, thanks to techniques such as atomic layer deposition (ALD) and vapor liquid solid growth, which are able to control the growth process at the nanoscale. This book aims to contribute to the knowledge of recent developments in CVD technology and its applications. To this aim, important process innovations, such as spatial ALD, direct liquid injection CVD, and electron cyclotron resonance CVD, are presented. Moreover, some of the most recent applications of CVD techniques for the growth of nanomaterials, including graphene, nanofibers, and diamond-like carbon, are described in the book.
Author | : Larry M. Miller |
Publisher | : |
Total Pages | : 84 |
Release | : 1993 |
Genre | : Aluminum oxide |
ISBN | : |
Author | : Christopher S. Lange |
Publisher | : |
Total Pages | : 91 |
Release | : 2011 |
Genre | : Chemical vapor deposition |
ISBN | : |
Author | : Tommi Kääriäinen |
Publisher | : John Wiley & Sons |
Total Pages | : 274 |
Release | : 2013-05-28 |
Genre | : Technology & Engineering |
ISBN | : 1118062779 |
Since the first edition was published in 2008, Atomic Layer Deposition (ALD) has emerged as a powerful, and sometimes preferred, deposition technology. The new edition of this groundbreaking monograph is the first text to review the subject of ALD comprehensively from a practical perspective. It covers ALD's application to microelectronics (MEMS) and nanotechnology; many important new and emerging applications; thermal processes for ALD growth of nanometer thick films of semiconductors, oxides, metals and nitrides; and the formation of organic and hybrid materials.