Chemical Vapor Deposition of Refractory Metals and Ceramics III: Volume 363

Chemical Vapor Deposition of Refractory Metals and Ceramics III: Volume 363
Author: Bernard M. Gallois
Publisher:
Total Pages: 312
Release: 1995-04-05
Genre: Science
ISBN:

CVD (chemical vapor deposition) technology is receiving much interest in the scientific community, in particular for synthesizing new materials with tailored chemical composition and physical properties that offer multiple functionality. Multiphase or multilayered films, functionally graded materials (FGMs), "smart" material structures and nanocomposites are just a few examples of the new classes of materials being produced via CVD. This third volume in the series from MRS offers an interdisciplinary perspective on technological issues relevant to CVD materials and processes, and provides a forum for the exchange of new scientific results. Topics include: fundamentals, modeling and diagnostics; process/microstructure/property relationships; diamond, cubic boron nitride and related materials; organometallic chemical vapor deposition and novel approaches.

Chemical Vapor Deposition of Refractory Metals and Ceramics:

Chemical Vapor Deposition of Refractory Metals and Ceramics:
Author: Theodore M. Besmann
Publisher: Cambridge University Press
Total Pages: 426
Release: 2014-06-05
Genre: Technology & Engineering
ISBN: 9781107410275

The MRS Symposium Proceeding series is an internationally recognised reference suitable for researchers and practitioners.