Chemical Vapor Deposition of Oriented Tungsten Foils for Thermionic Cathodes

Chemical Vapor Deposition of Oriented Tungsten Foils for Thermionic Cathodes
Author: L. Yang
Publisher:
Total Pages: 21
Release: 1983
Genre:
ISBN:

Efforts under the present contract were devoted to the preparation of CVD tungsten emitters containing a variety of preferred crystallographic orientations. The work is divided into two phases. In Phase I, a CVD tungsten deposition apparatus was built and CVD tungsten samples of various preferred crystallographic orientations were prepared and characterized with respect to microstructures and nature and degree of preferred orientations. These samples were delivered to NRL for the evaluation of their electron emission properties. In Phase II, efforts were made to produce a high degree of preferred crystallographic orientations in thin CVD tungsten deposits (approx. 25 micron thickness) which are amenable to hole drilling by laser. Techniques for preparing CVD tungsten cathode structure were established and samples of oriented tungsten cathode structure were prepared for NRL evaluation.

Chemical Vapor Deposition of Tungsten and Tungsten Silicides for VLSI/ULSI Applications

Chemical Vapor Deposition of Tungsten and Tungsten Silicides for VLSI/ULSI Applications
Author: John E. J. Schmitz
Publisher: William Andrew Publishing
Total Pages: 235
Release: 1992
Genre: Computers
ISBN: 9780815512882

This monograph condenses the relevant and pertinent literature on blanket and selective CVD of tungsten (W) into a single manageable volume. The book supplies the reader with the necessary background to bring up, fine tune, and successfully maintain a CVD-W process in a production set-up. Materials deposition chemistry, equipment, process technology, developments, and applications are described.