Papers from a September 1997 symposium held in Las Vegas, Nevada, report on the status, future directions, challenges, and opportunities in the area of polymeric materials for use in micro- and nano-scale patterning. Selections are arranged in parts on novel patterning chemistry and processing, microlithographic and advanced microlithographic chemistry and processing, and lithographic materials and processes. Subjects include modeling of polymeric microstructures, photoacid diffusion in chemically amplified DUV resists, calixarene resists for nanolithography, and photoacid generating polymers for surface modification resists. Annotation copyrighted by Book News, Inc., Portland, OR