Fabrication of Porous Gallium Nitride by Photoelectrochemical Etching Method (Penerbit USM)

Fabrication of Porous Gallium Nitride by Photoelectrochemical Etching Method (Penerbit USM)
Author: Cheah Sook Fong
Publisher: Penerbit USM
Total Pages: 100
Release: 2017
Genre: Science
ISBN: 9674611231

Photoelectrochemical (PEC) etching is a simple and inexpensive wet etching approach that is widely used to fabricate porous gallium nitride (GaN) thin films. However, many fundamental issues on the etching mechanism and the optical response of the fabricated porous structure still remain unclear. In this book, PEC etched porous GaN thin films with a variety of morphologies such as circular, hexagonal, leaf like-, and honeycomb-like patterns were described in detail. The effects of semiconductor types, etching voltage and etching duration on the surface morphology and the optical response of the fabricated porous structure were discussed. Attenuated total reflection method which is very sensitive to the surface layer of the porous GaN was applied to extract the carrier concentration, porosity, and layer thicknesses or the porous layer. Through this book, a better understanding of the PEC etching of the porous GaN can be obtained.

Porous Silicon Carbide and Gallium Nitride

Porous Silicon Carbide and Gallium Nitride
Author: Randall M. Feenstra
Publisher: John Wiley & Sons
Total Pages: 332
Release: 2008-04-15
Genre: Technology & Engineering
ISBN: 9780470751824

Porous Silicon Carbide and Gallium Nitride: Epitaxy, Catalysis, and Biotechnology Applications presents the state-of-the-art in knowledge and applications of porous semiconductor materials having a wide band gap. This comprehensive reference begins with an overview of porous wide-band-gap technology, and describes the underlying scientific basis for each application area. Additional chapters cover preparation, characterization, and topography; processing porous SiC; medical applications; magnetic ion behavior, and many more

Gallium Nitride Materials and Devices

Gallium Nitride Materials and Devices
Author: Cole W. Litton
Publisher: SPIE-International Society for Optical Engineering
Total Pages: 322
Release: 2006
Genre: Science
ISBN: 9780819461636

Proceedings of SPIE present the original research papers presented at SPIE conferences and other high-quality conferences in the broad-ranging fields of optics and photonics. These books provide prompt access to the latest innovations in research and technology in their respective fields. Proceedings of SPIE are among the most cited references in patent literature.

Solid State Science and Technology IV

Solid State Science and Technology IV
Author: Nay Ming Huang
Publisher: Trans Tech Publications Ltd
Total Pages: 586
Release: 2014-02-13
Genre: Technology & Engineering
ISBN: 3038264148

Selected, peer reviewed papers from the 4th International Conference on Solid State Science and Technology, (ICSSST 2012), December 18-20, 2012, Melaka, Malaysia

Optoelectronic Devices

Optoelectronic Devices
Author: M Razeghi
Publisher: Elsevier
Total Pages: 602
Release: 2004
Genre: Science
ISBN: 9780080444260

Tremendous progress has been made in the last few years in the growth, doping and processing technologies of the wide bandgap semiconductors. As a result, this class of materials now holds significant promis for semiconductor electronics in a broad range of applications. The principal driver for the current revival of interest in III-V Nitrides is their potential use in high power, high temperature, high frequency and optical devices resistant to radiation damage. This book provides a wide number of optoelectronic applications of III-V nitrides and covers the entire process from growth to devices and applications making it essential reading for those working in the semiconductors or microelectronics. Broad review of optoelectronic applications of III-V nitrides

CRC Handbook of Metal Etchants

CRC Handbook of Metal Etchants
Author: Perrin Walker
Publisher: CRC Press
Total Pages: 1434
Release: 1990-12-11
Genre: Science
ISBN: 9781439822531

This publication presents cleaning and etching solutions, their applications, and results on inorganic materials. It is a comprehensive collection of etching and cleaning solutions in a single source. Chemical formulas are presented in one of three standard formats - general, electrolytic or ionized gas formats - to insure inclusion of all necessary operational data as shown in references that accompany each numbered formula. The book describes other applications of specific solutions, including their use on other metals or metallic compounds. Physical properties, association of natural and man-made minerals, and materials are shown in relationship to crystal structure, special processing techniques and solid state devices and assemblies fabricated. This publication also presents a number of organic materials which are widely used in handling and general processing...waxes, plastics, and lacquers for example. It is useful to individuals involved in study, development, and processing of metals and metallic compounds. It is invaluable for readers from the college level to industrial R & D and full-scale device fabrication, testing and sales. Scientific disciplines, work areas and individuals with great interest include: chemistry, physics, metallurgy, geology, solid state, ceramic and glass, research libraries, individuals dealing with chemical processing of inorganic materials, societies and schools.