Polycrystalline Thin Films
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| Author | : Lawrence Kazmerski |
| Publisher | : Elsevier |
| Total Pages | : 321 |
| Release | : 2012-12-02 |
| Genre | : Technology & Engineering |
| ISBN | : 0323156045 |
Polycrystalline and Amorphous Thin Films and Devices is a compilation of papers that discusses the electronic, optical, and physical properties of thin material layers and films. This compilation reviews the different applications of thin films of various materials used as protective and optical coatings, thermal transfer layers, and selective membranes from submicron- area VLSI memory units to large-area energy conservation devices. Some papers discuss the basic properties, such as growth, structure, electrical, and optical mechanisms that are encountered in amorphous and polycrystalline thin semiconductor films. For example, experiments on electronic structure of dislocations have led to a model for the intrinsic properties of grain boundaries in polycrystalline semiconductor thin films that can have an impact on the designs of high-efficiency, thin-film solar cells. Other papers review the problems encountered in these thin layers in active semiconductor devices and passive technologies. Techniques in film growth and control variables of source, substrate temperature, and substrate properties will determine the successful performance of the devices installed with these thin film layers. This compilation can prove valuable for chemists, materials engineers, industrial technologists, and researchers in thin-film technology.
| Author | : F. C. Matacotta |
| Publisher | : World Scientific |
| Total Pages | : 369 |
| Release | : 1995 |
| Genre | : Science |
| ISBN | : 9810221932 |
This book brings together detailed discussions by leading experts on the various innovative aspects of thin films growth, deposition and characterization techniques, and new thin film materials and devices. It addresses through the different viewpoints of the contributors, the major problem of thin films science - the relation between the energy of the condensing species and the resulting properties of the films. Some of the issues considered include energetic condensation, bombardment stabilization, pulsed electron beam ablation, orientation and self-organization of organic, ferroelectric and nanoparticle thin films. Several chapters focus on applications such as the recent developments in organic optoelectronics, large area electronic technology and superconducting thin film devices.
| Author | : Katayun Barmak |
| Publisher | : Woodhead Publishing |
| Total Pages | : 671 |
| Release | : 2014-02-13 |
| Genre | : Technology & Engineering |
| ISBN | : 085709629X |
Metallic films play an important role in modern technologies such as integrated circuits, information storage, displays, sensors, and coatings. Metallic Films for Electronic, Optical and Magnetic Applications reviews the structure, processing and properties of metallic films. Part one explores the structure of metallic films using characterization methods such as x-ray diffraction and transmission electron microscopy. This part also encompasses the processing of metallic films, including structure formation during deposition and post-deposition reactions and phase transformations. Chapters in part two focus on the properties of metallic films, including mechanical, electrical, magnetic, optical, and thermal properties. Metallic Films for Electronic, Optical and Magnetic Applications is a technical resource for electronics components manufacturers, scientists, and engineers working in the semiconductor industry, product developers of sensors, displays, and other optoelectronic devices, and academics working in the field. Explores the structure of metallic films using characterization methods such as x-ray diffraction and transmission electron microscopy Discusses processing of metallic films, including structure formation during deposition and post-deposition reactions and phase transformations Focuses on the properties of metallic films, including mechanical, electrical, magnetic, optical, and thermal properties
| Author | : Alfred L. Davis |
| Publisher | : Nova Science Publishers |
| Total Pages | : 0 |
| Release | : 2017 |
| Genre | : Polycrystalline semiconductors |
| ISBN | : 9781536107968 |
This book provides new research on polycrystalline films. Chapter One reviews the characterisation of polycrystalline Cu2ZnSn(SxSe1-x)4 thin-films and solar-cells. Chapter Two explains the chemical vapor deposition process accelerated by the fragments of monomethylsilane. Chapter Three studies the regularities of formation of the nanostructured films of polycrystalline silicon doped with germanium as isovalent impurity.
| Author | : Milton Ohring |
| Publisher | : Academic Press |
| Total Pages | : 744 |
| Release | : 1992 |
| Genre | : Science |
| ISBN | : 9780125249904 |
Prepared as a textbook complete with problems after each chapter, specifically intended for classroom use in universities.
| Author | : Katayun Barmak |
| Publisher | : |
| Total Pages | : 806 |
| Release | : 1994 |
| Genre | : Polycrystals |
| ISBN | : |
| Author | : |
| Publisher | : |
| Total Pages | : 516 |
| Release | : 1997 |
| Genre | : Thin films |
| ISBN | : |
| Author | : L. B. Freund |
| Publisher | : Cambridge University Press |
| Total Pages | : 772 |
| Release | : 2004-01-08 |
| Genre | : Technology & Engineering |
| ISBN | : 9781139449823 |
Thin film mechanical behavior and stress presents a technological challenge for materials scientists, physicists and engineers. This book provides a comprehensive coverage of the major issues and topics dealing with stress, defect formation, surface evolution and allied effects in thin film materials. Physical phenomena are examined from the continuum down to the sub-microscopic length scales, with the connections between the structure of the material and its behavior described. Theoretical concepts are underpinned by discussions on experimental methodology and observations. Fundamental scientific concepts are embedded through sample calculations, a broad range of case studies with practical applications, thorough referencing, and end of chapter problems. With solutions to problems available on-line, this book will be essential for graduate courses on thin films and the classic reference for researchers in the field.
| Author | : Mario Birkholz |
| Publisher | : John Wiley & Sons |
| Total Pages | : 378 |
| Release | : 2006-05-12 |
| Genre | : Technology & Engineering |
| ISBN | : 3527607048 |
With contributions by Paul F. Fewster and Christoph Genzel While X-ray diffraction investigation of powders and polycrystalline matter was at the forefront of materials science in the 1960s and 70s, high-tech applications at the beginning of the 21st century are driven by the materials science of thin films. Very much an interdisciplinary field, chemists, biochemists, materials scientists, physicists and engineers all have a common interest in thin films and their manifold uses and applications. Grain size, porosity, density, preferred orientation and other properties are important to know: whether thin films fulfill their intended function depends crucially on their structure and morphology once a chemical composition has been chosen. Although their backgrounds differ greatly, all the involved specialists a profound understanding of how structural properties may be determined in order to perform their respective tasks in search of new and modern materials, coatings and functions. The author undertakes this in-depth introduction to the field of thin film X-ray characterization in a clear and precise manner.
| Author | : René Guinebretière |
| Publisher | : John Wiley & Sons |
| Total Pages | : 290 |
| Release | : 2013-03-01 |
| Genre | : Technology & Engineering |
| ISBN | : 1118613953 |
This book presents a physical approach to the diffraction phenomenon and its applications in materials science. An historical background to the discovery of X-ray diffraction is first outlined. Next, Part 1 gives a description of the physical phenomenon of X-ray diffraction on perfect and imperfect crystals. Part 2 then provides a detailed analysis of the instruments used for the characterization of powdered materials or thin films. The description of the processing of measured signals and their results is also covered, as are recent developments relating to quantitative microstructural analysis of powders or epitaxial thin films on the basis of X-ray diffraction. Given the comprehensive coverage offered by this title, anyone involved in the field of X-ray diffraction and its applications will find this of great use.
