Plasma Surface Engineering Research And Its Practical Applications
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| Author | : Ronghua Wei |
| Publisher | : |
| Total Pages | : 407 |
| Release | : 2008-01-01 |
| Genre | : |
| ISBN | : 9788130802572 |
In recent years, research and development (R&D) in plasma surface engineering of materials has intensified worldwide. There are several conferences each year related to this area and the attendees can be found from nearly every corner of the world. The number of publications in scientific periodicals, trade journals and books is increasing exponentially. Because plasma surface engineering is directly related to solving practical engineering problems, R&D is not only conducted at universities or government laboratories, but also by industry. In some areas including hard coatings for cutting tools, decorative or protective coatings for household products such as door knobs or water faucets, nitriding of commercial industrial components, and metallization of polymeric materials for food packaging, plasma engineering has become a mature business with a number of companies worldwide building equipment and providing services. Due to recent rapid expansion in R&D and new technologies emerged in the field, this book aims to provide readers with up-to-date information. Plasma surface engineering is a cross-discipline between plasma science and engineering and materials science and engineering. More specifically, it involves the study of metallurgy, mechanical engineering, surface science, tribology, corrosion science, bioengineering, optics, electrical engineering and electronics. It is difficult to cover all the aspects of plasma surface engineering in one book. Therefore, we focus on four areas: physical vapor deposition (PVD) of hard nitride and nanocomposite coatings, plasma immersion ion implantation and deposition (PIII&D), plasma ion nitriding, and novel plasma processing. In order to provide the most current status in this field, we invited a number of experts worldwide from academia, research institutes and industry to review the status and present the latest research results in the selected areas. In the PVD area, in Chapter 1, Prof. J. Musil and his group review and discuss the latest research in superhard and tough nanocomposite coatings, which have recently become a focal topic for the PVD community. They discuss various groups of nanocomposite coatings of nc-MeN/a-Si3N4, including the well-studied nc-TiN/a-Si3N4, and present the physical mechanisms for the enhanced-hardness of these coatings. They further propose how to enhance the toughness of coatings and to prepare ceramic oxide films at low deposition temperatures (
| Author | : |
| Publisher | : Newnes |
| Total Pages | : 5485 |
| Release | : 2014-04-07 |
| Genre | : Technology & Engineering |
| ISBN | : 0080965334 |
Comprehensive Materials Processing, Thirteen Volume Set provides students and professionals with a one-stop resource consolidating and enhancing the literature of the materials processing and manufacturing universe. It provides authoritative analysis of all processes, technologies, and techniques for converting industrial materials from a raw state into finished parts or products. Assisting scientists and engineers in the selection, design, and use of materials, whether in the lab or in industry, it matches the adaptive complexity of emergent materials and processing technologies. Extensive traditional article-level academic discussion of core theories and applications is supplemented by applied case studies and advanced multimedia features. Coverage encompasses the general categories of solidification, powder, deposition, and deformation processing, and includes discussion on plant and tool design, analysis and characterization of processing techniques, high-temperatures studies, and the influence of process scale on component characteristics and behavior. Authored and reviewed by world-class academic and industrial specialists in each subject field Practical tools such as integrated case studies, user-defined process schemata, and multimedia modeling and functionality Maximizes research efficiency by collating the most important and established information in one place with integrated applets linking to relevant outside sources
| Author | : Sam Zhang |
| Publisher | : CRC Press |
| Total Pages | : 610 |
| Release | : 2015-07-29 |
| Genre | : Science |
| ISBN | : 1482222914 |
Thin Films and Coatings: Toughening and Toughness Characterization captures the latest developments in the toughening of hard coatings and in the measurement of the toughness of thin films and coatings. Featuring chapters contributed by experts from Australia, China, Czech Republic, Poland, Singapore, Spain, and the United Kingdom, this book: Presents the current status of hard-yet-tough ceramic coatings Reviews various toughness evaluation methods for films and hard coatings Explores the toughness and toughening mechanisms of porous thin films and laser-treated surfaces Examines adhesions of the film/substrate interface and the characterization of coating adhesion strength Discusses nanoindentation determination of fracture toughness, resistance to cracking, and sliding contact fracture phenomena Toughening and toughness measurement (of films and coatings) are two related, yet separate, fields of great importance in today’s nanotechnology world. Thin Films and Coatings: Toughening and Toughness Characterization is a timely reference written in such a way that novices will find it a stepping stone to the field and veterans will find it a rich source of information for their research.
| Author | : Alexander Fridman |
| Publisher | : John Wiley & Sons |
| Total Pages | : 805 |
| Release | : 2024-02-05 |
| Genre | : Technology & Engineering |
| ISBN | : 3527349545 |
Plasma Science and Technology An accessible introduction to the fundamentals of plasma science and its applications In Plasma Science and Technology: Lectures in Physics, Chemistry, Biology, and Engineering, distinguished researcher Dr. Alexander Fridman delivers a comprehensive introduction to plasma technology, including fulsome descriptions of the fundamentals of plasmas and discharges. The author discusses a wide variety of practical applications of the technology to medicine, energy, catalysis, coatings, and more, emphasizing engineering and science fundamentals. Offering readers illuminating problems and concept questions to support understanding and self-study, the book also details organic and inorganic applications of plasma technologies, demonstrating its use in nature, in the lab, and in both novel and well-known applications. Readers will also find: A thorough introduction to the kinetics of excited atoms and molecules Comprehensive explorations of non-equilibrium atmospheric pressure cold discharges Practical discussions of plasma processing in microelectronics and other micro-technologies Expert treatments of plasma in environmental control technologies, including the cleaning of air, exhaust gases, water, and soil Perfect for students of chemical engineering, physics, and chemistry, Plasma Science and Technology will also benefit professionals working in these fields who seek a contemporary refresher in the fundamentals of plasma science and its applications.
| Author | : Toshiaki Makabe |
| Publisher | : CRC Press |
| Total Pages | : 414 |
| Release | : 2014-08-27 |
| Genre | : Science |
| ISBN | : 1482222051 |
Beyond enabling new capabilities, plasma-based techniques, characterized by quantum radicals of feed gases, hold the potential to enhance and improve many processes and applications. Following in the tradition of its popular predecessor, Plasma Electronics, Second Edition: Applications in Microelectronic Device Fabrication explains the fundamental physics and numerical methods required to bring these technologies from the laboratory to the factory. Emphasizing computational algorithms and techniques, this updated edition of a popular monograph supplies a complete and up-to-date picture of plasma physics, computational methods, applications, and processing techniques. Reflecting the growing importance of computer-aided approaches to plasma analysis and synthesis, it showcases recent advances in fabrication from micro- and nano-electronics, MEMS/NEMS, and the biological sciences. A helpful resource for anyone learning about collisional plasma structure, function, and applications, this edition reflects the latest progress in the quantitative understanding of non-equilibrium low-temperature plasma, surface processing, and predictive modeling of the plasma and the process. Filled with new figures, tables, problems, and exercises, it includes a new chapter on the development of atmospheric-pressure plasma, in particular microcell plasma, with a discussion of its practical application to improve surface efficiency. The book provides an up-to-date discussion of MEMS fabrication and phase transition between capacitive and inductive modes in an inductively coupled plasma. In addition to new sections on the phase transition between the capacitive and inductive modes in an ICP and MOS-transistor and MEMS fabrications, the book presents a new discussion of heat transfer and heating of the media and the reactor. Integrating physics, numerical methods, and practical applications, this book equips you with the up-to-date understanding required to scale up lab breakthroughs into industrial innovations.
| Author | : Oleg O. Baranov |
| Publisher | : Morgan & Claypool Publishers |
| Total Pages | : 92 |
| Release | : 2020-09-30 |
| Genre | : Technology & Engineering |
| ISBN | : 1681739119 |
Plasma-based techniques are widely and successfully used across the field of materials processing, advanced nanosynthesis, and nanofabrication. The diversity of currently available processing architectures based on or enhanced by the use of plasmas is vast, and one can easily get lost in the opportunities presented by each of these configurations. This mini-book provides a concise outline of the most important concepts and architectures in plasma-assisted processing of materials, helping the reader navigate through the fundamentals of plasma system selection and optimization. Architectures discussed in this book range from the relatively simple, user-friendly types of plasmas produced using direct current, radio-frequency, microwave, and arc systems, to more sophisticated advanced systems based on incorporating and external substrate architectures, and complex control mechanisms of configured magnetic fields and distributed plasma sources.
| Author | : Zhong Xu |
| Publisher | : Springer |
| Total Pages | : 281 |
| Release | : 2017-09-21 |
| Genre | : Technology & Engineering |
| ISBN | : 9811057249 |
This book provides a comprehensive introduction to and technical description of a unique patented surface-modification technology: plasma surface metallurgy with double-glow discharge plasma process, known as the Xu-Tec process. As such it promotes further attention and interest in scientific research and engineering development in this area, as well as industrial utilization and product commercialization. The Xu-Tec process has opened up a new material engineering field of “Plasma Surface Metallurgy”. This surface-modification process can transform many low-grade and low-cost industrial engineering materials into “gold” materials with a high value and high grade or special functions. This improved material can be widely used in industrial production to improve the surface performance and quality of mechanical parts and manufacturing products, and to conserve expensive alloying elements for the benefit of all mankind. “This book will be valuable to those in the general area of surface metallurgy. The substantial description of the Xu-Tec process is very important and should assist in expanding the use of this superior technique. The in-depth explanation of glow discharges and their use in general will also serve as a valuable reference in the field.” James E. Thompson, Prof. Fellow of the IEEE Dean of Engineering Emeritus University of Missouri, Columbia, Missouri, USA November, 2016 "A BREAKTHROUGH IN MAKING METAL TOUGHER". ---- SCIENCE & TECHNOLOGY Business Week, July 24, 1989 “NOVEL SURFACE ALLOYING PROCESS” --- THE LEADING EDGE TECHNOLOGY WORDWIDE Materials and Processing Report, Dec. 1987
| Author | : Michael Keidar |
| Publisher | : Academic Press |
| Total Pages | : 587 |
| Release | : 2018-08-06 |
| Genre | : Technology & Engineering |
| ISBN | : 0128137037 |
Plasma Engineering, Second Edition, applies the unique properties of plasmas (ionized gases) to improve processes and performance over many fields, such as materials processing, spacecraft propulsion and nanofabrication. The book considers this rapidly expanding discipline from a unified standpoint, addressing fundamentals of physics and modeling, as well as new and real-word applications in aerospace, nanotechnology and bioengineering. This updated edition covers the fundamentals of plasma physics at a level suitable for students using application examples and contains the widest variety of applications of any text on the market, spanning the areas of aerospace engineering, nanotechnology and nanobioengineering. This is highly useful for courses on plasma engineering or plasma physics in departments of Aerospace Engineering, Electrical Engineering and Physics. It is also useful as an introduction to plasma engineering and its applications for early career researchers and practicing engineers. Features new material relevant to application, including emerging areas of plasma nanotechnology and medicine Contains a new chapter on plasma-based control, as well as a description of RF and microwave-based plasma applications, plasma lighting, reforming and other most recent application areas Provides a technical treatment of the fundamental and engineering principles used in plasma applications
| Author | : International Conference on Plasma Surface Engineering |
| Publisher | : |
| Total Pages | : 628 |
| Release | : 1995 |
| Genre | : |
| ISBN | : |
| Author | : Daniel Lundin |
| Publisher | : Elsevier |
| Total Pages | : 398 |
| Release | : 2019-08-28 |
| Genre | : Technology & Engineering |
| ISBN | : 0128124555 |
High Power Impulse Magnetron Sputtering: Fundamentals, Technologies, Challenges and Applications is an in-depth introduction to HiPIMS that emphasizes how this novel sputtering technique differs from conventional magnetron processes in terms of both discharge physics and the resulting thin film characteristics. Ionization of sputtered atoms is discussed in detail for various target materials. In addition, the role of self-sputtering, secondary electron emission and the importance of controlling the process gas dynamics, both inert and reactive gases, are examined in detail with an aim to generate stable HiPIMS processes. Lastly, the book also looks at how to characterize the HiPIMS discharge, including essential diagnostic equipment. Experimental results and simulations based on industrially relevant material systems are used to illustrate mechanisms controlling nucleation kinetics, column formation and microstructure evolution. Includes a comprehensive description of the HiPIMS process from fundamental physics to applications Provides a distinctive link between the process plasma and thin film communities Discusses the industrialization of HiPIMS and its real world applications
