Plasma Assisted Synthesis And Physical Chemical Characterization Of Titanium Nitride Films
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Synthesis of Titanium Based Nitride Thin Films By Plasma Focus
| Author | : Tousif Hussain |
| Publisher | : LAP Lambert Academic Publishing |
| Total Pages | : 168 |
| Release | : 2012 |
| Genre | : |
| ISBN | : 9783659295331 |
The dense plasma focus system of energy 2.3 kJ was used to synthesize titanium based nitride thin films. The book contains the details of research work including the introduction, plasma focus experimental setup, results obtained and their detailed discussion. It reports growth of titanium based nitride thin films specifically titanium-aluminum nitrides, nano composite-titanium nitride/amorphous-silicon nitride, nano composite (titanium, aluminum) nitride/ amorphous-silicon nitride and titanium-silicon-nitride. The results of these experiments show the successful synthesis of titanium based nitride thin films using the plasma focus system. The research work is motivated by the remarkable mechanical, thermal and electronic properties of titanium based nitride thin films, having many applications ranging from coatings on cutting tools to diffusion barrier in microelectronics.
Silicon Nanocrystals
| Author | : Lorenzo Pavesi |
| Publisher | : John Wiley & Sons |
| Total Pages | : 648 |
| Release | : 2010-02-02 |
| Genre | : Technology & Engineering |
| ISBN | : 9783527629961 |
This unique collection of knowledge represents a comprehensive treatment of the fundamental and practical consequences of size reduction in silicon crystals. This clearly structured reference introduces readers to the optical, electrical and thermal properties of silicon nanocrystals that arise from their greatly reduced dimensions. It covers their synthesis and characterization from both chemical and physical viewpoints, including ion implantation, colloidal synthesis and vapor deposition methods. A major part of the text is devoted to applications in microelectronics as well as photonics and nanobiotechnology, making this of great interest to the high-tech industry.
Low Pressure Chemical Vapor Deposition (LPCVD) of Titanium Nitride
| Author | : Sameer Narsinha Dharmadhikari |
| Publisher | : |
| Total Pages | : 110 |
| Release | : 1999 |
| Genre | : Chemical vapor deposition |
| ISBN | : |
Titanium tetrachioride and ammonia were used as precursors in a Jow pressure chemical vapor deposition process to deposit titanium nitride films on silicon wafers. The process was carried out at temperatures from 450 to 850°C and the activation energy for the reaction was determined. The order of the reaction, with respect to the partial pressures of the reactant gases, was determined by carrying out the reaction at varying partial pressures of the reactant gases. The following rate equation was established for the reaction: rate = 4.35*10-5exp( -5150/T)*(PNH3)1.37(PTicl4)-0.42 The titanium nitride thin films deposited were characterized for properties like resistivity, stress, hardness, and density. The effects of varying the process parameters (temperature, flow ratio, etc.) on these film properties were studied.
Advances in Thin Films, Nanostructured Materials, and Coatings
| Author | : Alexander D. Pogrebnjak |
| Publisher | : Springer |
| Total Pages | : 380 |
| Release | : 2019-02-08 |
| Genre | : Technology & Engineering |
| ISBN | : 9811361339 |
This book highlights the latest advances in chemical and physical methods for thin-film deposition and surface engineering, including ion- and plasma-assisted processes, focusing on explaining the synthesis/processing–structure–properties relationship for a variety of thin-film systems. It covers topics such as advances in thin-film synthesis; new thin-film materials: diamond-like films, granular alloys, high-entropy alloys, oxynitrides, and intermetallic compounds; ultra-hard, wear- and oxidation-resistant and multifunctional coatings; superconducting, magnetic, semiconducting, and dielectric films; electrochemical and electroless depositions; thin-film characterization and instrumentation; and industrial applications.
Transmission Electron Microscopy Characterization of Nanomaterials
| Author | : Challa S.S.R. Kumar |
| Publisher | : Springer Science & Business Media |
| Total Pages | : 718 |
| Release | : 2013-12-09 |
| Genre | : Science |
| ISBN | : 3642389341 |
Third volume of a 40volume series on nanoscience and nanotechnology, edited by the renowned scientist Challa S.S.R. Kumar. This handbook gives a comprehensive overview about Transmission electron microscopy characterization of nanomaterials. Modern applications and state-of-the-art techniques are covered and make this volume an essential reading for research scientists in academia and industry.
