Plasma And Surface Diagnostics During Plasma Enhanced Chemical Vapor Deposition Of Silicon Dioxide And Fluorinated Silicon Dioxide
Download Plasma And Surface Diagnostics During Plasma Enhanced Chemical Vapor Deposition Of Silicon Dioxide And Fluorinated Silicon Dioxide full books in PDF, epub, and Kindle. Read online free Plasma And Surface Diagnostics During Plasma Enhanced Chemical Vapor Deposition Of Silicon Dioxide And Fluorinated Silicon Dioxide ebook anywhere anytime directly on your device. Fast Download speed and no annoying ads. We cannot guarantee that every ebooks is available!
Plasma-enhanced Chemical Vapor Deposition of Silicon Dioxide
Author | : Arjen Boogaard |
Publisher | : |
Total Pages | : 186 |
Release | : 2011 |
Genre | : |
ISBN | : 9789036531306 |
Surface Reactions During Plasma Enhanced Chemical Vapor Deposition of Silicon and Silicon Based Dielectrics
Author | : Atul Gupta |
Publisher | : |
Total Pages | : 163 |
Release | : 2001 |
Genre | : |
ISBN | : |
Keywords: Plasma deposition, Surface chemistry, Ab-initio calculations, Reaction mechanisms, Kinetics, Amorphous silicon, Silicon dioxide.
Plasma Processing for VLSI
Author | : Norman G. Einspruch |
Publisher | : Academic Press |
Total Pages | : 544 |
Release | : 2014-12-01 |
Genre | : Technology & Engineering |
ISBN | : 1483217752 |
VLSI Electronics: Microstructure Science, Volume 8: Plasma Processing for VLSI (Very Large Scale Integration) discusses the utilization of plasmas for general semiconductor processing. It also includes expositions on advanced deposition of materials for metallization, lithographic methods that use plasmas as exposure sources and for multiple resist patterning, and device structures made possible by anisotropic etching. This volume is divided into four sections. It begins with the history of plasma processing, a discussion of some of the early developments and trends for VLSI. The second section, Deposition, discusses deposition techniques for VLSI such as sputtering metals for metallization and contacts, plasma-enhanced chemical vapor deposition of metals and suicides, and plasma enhanced chemical vapor deposition of dielectrics. The part on Lithography presents the high-resolution trilayer resist system, pulsed x-ray sources for submicrometer x-ray lithography, and high-intensity deep-UV sources. The last part, Etching, provides methods in etching, like ion-beam etching using reactive gases, low-pressure reactive ion etching, and the uses of inert-gas ion milling. The theory and mechanisms of plasma etching are described and a number of new device structures made possible by anisotropic etching are enumerated as well. Scientists, engineers, researchers, device designers, and systems architects will find the book useful.
Investigations of Surface Interactions and Deposition Mechanisms in Plasma Enhanced Chemical Vapor Deposition of Silicon-based Materials
Author | : Patrick R. McCurdy |
Publisher | : |
Total Pages | : 384 |
Release | : 1999 |
Genre | : Plasma-enhanced chemical vapor deposition |
ISBN | : |
Deposition of Fluorinated Silicon Nitride Using Plasma Enhanced Chemical Vapor Deposition
Author | : Mohammad Ibrahim Khan |
Publisher | : |
Total Pages | : 334 |
Release | : 1990 |
Genre | : Plasma-enhanced chemical vapor deposition |
ISBN | : |
Diagnostic for Plasma Enhanced Chemical Vapor Deposition and Etch Systems
Author | : National Aeronautics and Space Adm Nasa |
Publisher | : Independently Published |
Total Pages | : 28 |
Release | : 2018-09-25 |
Genre | : Science |
ISBN | : 9781724003836 |
In order to meet NASA's requirements for the rapid development and validation of future generation electronic devices as well as associated materials and processes, enabling technologies ion the processing of semiconductor materials arising from understanding etch chemistries are being developed through a research collaboration between Stanford University and NASA-Ames Research Center, Although a great deal of laboratory-scale research has been performed on many of materials processing plasmas, little is known about the gas-phase and surface chemical reactions that are critical in many etch and deposition processes, and how these reactions are influenced by the variation in operating conditions. In addition, many plasma-based processes suffer from stability and reliability problems leading to a compromise in performance and a potentially increased cost for the semiconductor manufacturing industry. Such a lack of understanding has hindered the development of process models that can aid in the scaling and improvement of plasma etch and deposition systems. The research described involves the study of plasmas used in semiconductor processes. An inductively coupled plasma (ICP) source in place of the standard upper electrode assembly of the Gaseous Electronics Conference (GEC) radio-frequency (RF) Reference Cell is used to investigate the discharge characteristics and chemistries. This ICP source generates plasmas with higher electron densities (approximately 10(exp 12)/cu cm) and lower operating pressures (approximately 7 mTorr) than obtainable with the original parallel-plate version of the GEC Cell. This expanded operating regime is more relevant to new generations of industrial plasma systems being used by the microelectronics industry. The motivation for this study is to develop an understanding of the physical phenomena involved in plasma processing and to measure much needed fundamental parameters, such as gas-phase and surface reaction rates. species concentratio
Plasma Applications In Gases, Liquids And Solids: Technology And Methods
Author | : Claudia Riccardi |
Publisher | : World Scientific |
Total Pages | : 296 |
Release | : 2023-09-21 |
Genre | : Science |
ISBN | : 9811275947 |
This book explores the exciting and evolving world of plasma physics in materials manufacturing and processing. From ionized discharges to non-thermal equilibrium plasmas, new phenomena in physics are constantly emerging. Written, organized, and edited by internationally recognized experts, the various chapters delve into diverse issues in plasma science, including new applications at the nanoscale to the development of diagnostic tools and simulations. The interactions between the plasma state and matter, both surface and bulk, as well as gases and liquids, are explored. As electric discharges in plasmas continue to expand towards new horizons, anyone interested in this fascinating field would benefit from this book as an up-to-date and essential resource.