Photolithographer
Download Photolithographer full books in PDF, epub, and Kindle. Read online free Photolithographer ebook anywhere anytime directly on your device. Fast Download speed and no annoying ads. We cannot guarantee that every ebooks is available!
Author | : Chris Mack |
Publisher | : John Wiley & Sons |
Total Pages | : 503 |
Release | : 2011-08-10 |
Genre | : Technology & Engineering |
ISBN | : 1119965071 |
The fabrication of an integrated circuit requires a variety of physical and chemical processes to be performed on a semiconductor substrate. In general, these processes fall into three categories: film deposition, patterning, and semiconductor doping. Films of both conductors and insulators are used to connect and isolate transistors and their components. By creating structures of these various components millions of transistors can be built and wired together to form the complex circuitry of modern microelectronic devices. Fundamental to all of these processes is lithography, ie, the formation of three-dimensional relief images on the substrate for subsequent transfer of the pattern to the substrate. This book presents a complete theoretical and practical treatment of the topic of lithography for both students and researchers. It comprises ten detailed chapters plus three appendices with problems provided at the end of each chapter. Additional Information: Visiting http://www.lithoguru.com/textbook/index.html enhances the reader's understanding as the website supplies information on how you can download a free laboratory manual, Optical Lithography Modelling with MATLAB®, to accompany the textbook. You can also contact the author and find help for instructors.
Author | : Bruce E. Tory |
Publisher | : Sydney : [s.n.] |
Total Pages | : 264 |
Release | : 1959 |
Genre | : Photolithography |
ISBN | : |
Author | : John Joseph Helmsen |
Publisher | : |
Total Pages | : 448 |
Release | : 1994 |
Genre | : |
ISBN | : |
Author | : Harry J. Levinson |
Publisher | : SPIE Press |
Total Pages | : 446 |
Release | : 2005 |
Genre | : Technology & Engineering |
ISBN | : 9780819456601 |
Lithography is a field in which advances proceed at a swift pace. This book was written to address several needs, and the revisions for the second edition were made with those original objectives in mind. Many new topics have been included in this text commensurate with the progress that has taken place during the past few years, and several subjects are discussed in more detail. This book is intended to serve as an introduction to the science of microlithography for people who are unfamiliar with the subject. Topics directly related to the tools used to manufacture integrated circuits are addressed in depth, including such topics as overlay, the stages of exposure, tools, and light sources. This text also contains numerous references for students who want to investigate particular topics in more detail, and they provide the experienced lithographer with lists of references by topic as well. It is expected that the reader of this book will have a foundation in basic physics and chemistry. No topics will require knowledge of mathematics beyond elementary calculus.
Author | : Michael Frank Klein |
Publisher | : |
Total Pages | : 430 |
Release | : 1985 |
Genre | : |
ISBN | : |
Author | : Uzodinma Okoroanyanwu |
Publisher | : SPIE Press |
Total Pages | : 0 |
Release | : 2011-03-08 |
Genre | : Technology & Engineering |
ISBN | : 9781118030028 |
Chemistry and Lithography provides a comprehensive treatment of the chemical phenomena in lithography in a manner that is accessible to a wide readership. The book presents topics on the optical and charged particle physics practiced in lithography, with a broader view of how the marriage between chemistry and optics has made possible the print and electronic revolutions of the digital age. The related aspects of lithography are thematically presented to convey a unified view of the developments in the field over time, from the very first recorded reflections on the nature of matter to the latest developments at the frontiers of lithography science and technology. Part I presents several important chemical and physical principles involved in the invention and evolution of lithography. Part II covers the processes for the synthesis, manufacture, usage, and handling of lithographic chemicals and materials. Part III investigates several important chemical and physical principles involved in the practice of lithography. Chemistry and Lithography is a useful reference for anyone working in the semiconductor industry.
Author | : Chris A. Mack |
Publisher | : Society of Photo Optical |
Total Pages | : 122 |
Release | : 2006 |
Genre | : Technology & Engineering |
ISBN | : 9780819462077 |
This Field Guide distills the material written by Chris Mack over the past 20 years, including notes from his graduate-level lithography course at the University of Texas at Austin. It details the lithography process, image formation, imaging onto a photoresist, photoresist chemistry, and lithography control and optimization. An introduction to next-generation lithographic technologies is also included, as well as an extensive lithography glossary and a summation of salient equations critical to anyone involved in the lithography industry.
Author | : Nickhil Harsh Jakatdar |
Publisher | : |
Total Pages | : 240 |
Release | : 2000 |
Genre | : |
ISBN | : |
Author | : Julius Schnauss |
Publisher | : |
Total Pages | : 194 |
Release | : 1889 |
Genre | : Collotype |
ISBN | : |
Author | : Karsten König |
Publisher | : Walter de Gruyter GmbH & Co KG |
Total Pages | : 360 |
Release | : 2015-05-19 |
Genre | : Science |
ISBN | : 3110383500 |
Nanostructuring of materials is a task at the heart of many modern disciplines in mechanical engineering, as well as optics, electronics, and the life sciences. This book includes an introduction to the relevant nonlinear optical processes associated with very short laser pulses for the generation of structures far below the classical optical diffraction limit of about 200 nanometers as well as coverage of state-of-the-art technical and biomedical applications. These applications include silicon and glass wafer processing, production of nanowires, laser transfection and cell reprogramming, optical cleaning, surface treatments of implants, nanowires, 3D nanoprinting, STED lithography, friction modification, and integrated optics. The book highlights also the use of modern femtosecond laser microscopes and nanoscopes as novel nanoprocessing tools.