Permanent And Transient Radiation Effects On Thin Oxide 200 A Mos Transistors
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Author | : Stewart Share |
Publisher | : |
Total Pages | : 24 |
Release | : 1976 |
Genre | : |
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An approach for hardening metal oxide semiconductor (MOS) transistors to ionizing radiation by reducing the thickness of the gate oxide is presented. It is shown that Si gate, n-channel MOS field-effect transistors with oxides 200 A thick continue to operate in the enhancement mode after irradiation to 1,000,000 rads (Si) with a positive bias applied to the gate during the irradiation. This represents a considerable improvement over conventional thick-oxide (approximately 1000-A) devices, which go into the depletion mode of operation at 100,000 rads (Si). The thin-oxide devices after exposure to pulsed ionizing radiation showed improved performance over that of thick-oxide devices. It was found also that device operation following irradiation depended on the source-drain spacing (Channel length): Shortening the channel length leads to an increased shift of the threshold voltage induced by irradiation. (Author).
Author | : |
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Total Pages | : 702 |
Release | : 1995 |
Genre | : Aeronautics |
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Author | : United States. Energy Research and Development Administration |
Publisher | : |
Total Pages | : 906 |
Release | : 1977 |
Genre | : Medicine |
ISBN | : |
Author | : United States. Energy Research and Development Administration. Technical Information Center |
Publisher | : |
Total Pages | : 982 |
Release | : 1977 |
Genre | : Force and energy |
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Author | : |
Publisher | : |
Total Pages | : 1468 |
Release | : 1989 |
Genre | : Power resources |
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Author | : |
Publisher | : |
Total Pages | : 412 |
Release | : 1978 |
Genre | : Integrated circuits |
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Author | : Phillip Roger Olson |
Publisher | : |
Total Pages | : 41 |
Release | : 1968 |
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Radiation effects on Metal-Oxide-Silicon Field Effect Transistors are studied. A brief history of development, theory of operation and survey of previous radiation effect work is given. Previous work points to a charge buildup in the oxide layer and a possible increase in fast surface state density as being the causes of semi-permanent degradation. Experimental work was done using a FI 100 p-channel MOSFET to determine the feasibility of studying radiation effects using available equipment at the Naval Postgraduate School. It was found that the study of charge buildup is feasible. Data obtained agreed qualitatively with previous results. Thermal annealing of a device after irradiation reduced the semi-permanent degradation significantly as is seen in previous work. Transient photocurrents produced in the oxide layer were examined and problems were revealed which must be solved before such work will become meaningful. Package and charge scattering effects may be masking the real effects. Suggestions for future work are included. (Author).
Author | : United States. Energy Research and Development Administration |
Publisher | : |
Total Pages | : 768 |
Release | : 1977-08 |
Genre | : Power resources |
ISBN | : |
Author | : William C. Bowman |
Publisher | : |
Total Pages | : 89 |
Release | : 1965 |
Genre | : |
ISBN | : |
Eleven microcircuit logic gates, representing five types of construction techniques, and a number of thin-film components were tested for transient responses using pulsed ionizing radiation and for permanent damage using neutrons. A linear accelerator provided the radiation for both tests (10-Mev electrons and uranium photoneutrons respectively). Logic failures due to ionizing radiation pulses required from 6 to 1,000 rads (Si) or from 10 to the 8 power to 10 to the 10 power rads (Si)/sec and occurred usually in the 1 state but occasionally at lower radiation levels in the 0 state. Detailed studies were also made on components that were electrically isolated from each circuit. Results indicate that the failure levels are primarily a function of circuit design and that construction methods, although having some effect, are of less significance. Responses of thin-film components were attributed mainly to secondary-emission effects. Neutron irradiation caused all circuits to fail at about 10 to the 15 power n/cm/sq (E> 10 kev). The circuit degradation was due entirely to the degradation of the circuit transistors. Higher leakage currents developed in monolithic circuits had no effect on circuit performance. Failure levels depended on the transistor gain degradation, its initial value, and the minimum gain required for the circuit to function. (Author).
Author | : Institute of Electrical and Electronics Engineers |
Publisher | : |
Total Pages | : 296 |
Release | : 1972 |
Genre | : Electric engineering |
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