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Chemical Vapor Deposition for Microelectronics
Author | : Arthur Sherman |
Publisher | : William Andrew |
Total Pages | : 240 |
Release | : 1987 |
Genre | : Computers |
ISBN | : |
Presents an extensive, comprehensive study of chemical vapor deposition (CVD). Understanding CVD requires knowledge of fluid mechanics, plasma physics, chemical thermodynamics, and kinetics as well as homogenous and heterogeneous chemical reactions. This text presents these aspects of CVD in an integrated fashion, and also reviews films for use in integrated circuit technology.
Handbook of Chemical Vapor Deposition
Author | : Hugh O. Pierson |
Publisher | : William Andrew |
Total Pages | : 459 |
Release | : 2012-12-02 |
Genre | : Technology & Engineering |
ISBN | : 1437744885 |
Handbook of Chemical Vapor Deposition: Principles, Technology and Applications provides information pertinent to the fundamental aspects of chemical vapor deposition. This book discusses the applications of chemical vapor deposition, which is a relatively flexible technology that can accommodate many variations. Organized into 12 chapters, this book begins with an overview of the theoretical examination of the chemical vapor deposition process. This text then describes the major chemical reactions and reviews the chemical vapor deposition systems and equipment used in research and production. Other chapters consider the materials deposited by chemical vapor deposition. This book discusses as well the potential applications of chemical vapor deposition in semiconductors and electronics. The final chapter deals with ion implantation as a major process in the fabrication of semiconductors. This book is a valuable resource for scientists, engineers, and students. Production and marketing managers and suppliers of equipment, materials, and services will also find this book useful.
Chemical Vapor Deposition
Author | : Srinivasan Sivaram |
Publisher | : Springer Science & Business Media |
Total Pages | : 302 |
Release | : 2013-11-11 |
Genre | : Technology & Engineering |
ISBN | : 1475747519 |
In early 1987 I was attempting to develop a CVD-based tungsten process for Intel. At every step ofthe development, information that we were collecting had to be analyzed in light of theories and hypotheses from books and papers in many unrelated subjects. Thesesources were so widely different that I came to realize there was no unifying treatment of CVD and its subprocesses. More interestingly, my colleagues in the industry were from many disciplines (a surface chemist, a mechanical engineer, a geologist, and an electrical engineer werein my group). To help us understand the field of CVD and its players, some of us organized the CVD user's group of Northern California in 1988. The idea for writing a book on the subject occurred to me during that time. I had already organized my thoughts for a course I taught at San Jose State University. Later Van Nostrand agreed to publish my book as a text intended for students at the senior/first year graduate level and for process engineers in the microelectronics industry, This book is not intended to be bibliographical, and it does not cover every new material being studied for chemical vapor deposition. On the other hand, it does present the principles of CVD at a fundamental level while uniting them with the needs of the microelectronics industry.
Chemical Vapor Deposition
Author | : John Milton Blocher |
Publisher | : |
Total Pages | : 426 |
Release | : 1970 |
Genre | : Vapor-plating |
ISBN | : |
Chemical Vapor Deposition
Author | : Electrochemical Society. High Temperature Materials Division |
Publisher | : The Electrochemical Society |
Total Pages | : 1686 |
Release | : 1997 |
Genre | : Science |
ISBN | : 9781566771788 |
Chemical Vapor Deposition
Author | : S Neralla |
Publisher | : BoD – Books on Demand |
Total Pages | : 292 |
Release | : 2016-08-31 |
Genre | : Science |
ISBN | : 9535125729 |
This book provides an overview of chemical vapor deposition (CVD) methods and recent advances in developing novel materials for application in various fields. CVD has now evolved into the most widely used technique for growth of thin films in electronics industry. Several books on CVD methods have emerged in the past, and thus the scope of this book goes beyond providing fundamentals of the CVD process. Some of the chapters included highlight current limitations in the CVD methods and offer alternatives in developing coatings through overcoming these limitations.