Optical Properties Of Hfo2 Thin Films
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Author | : Uwe Schroeder |
Publisher | : Woodhead Publishing |
Total Pages | : 572 |
Release | : 2019-03-27 |
Genre | : Technology & Engineering |
ISBN | : 0081024312 |
Ferroelectricity in Doped Hafnium Oxide: Materials, Properties and Devices covers all aspects relating to the structural and electrical properties of HfO2 and its implementation into semiconductor devices, including a comparison to standard ferroelectric materials. The ferroelectric and field-induced ferroelectric properties of HfO2-based films are considered promising for various applications, including non-volatile memories, negative capacitance field-effect-transistors, energy storage, harvesting, and solid-state cooling. Fundamentals of ferroelectric and piezoelectric properties, HfO2 processes, and the impact of dopants on ferroelectric properties are also extensively discussed in the book, along with phase transition, switching kinetics, epitaxial growth, thickness scaling, and more. Additional chapters consider the modeling of ferroelectric phase transformation, structural characterization, and the differences and similarities between HFO2 and standard ferroelectric materials. Finally, HfO2 based devices are summarized. - Explores all aspects of the structural and electrical properties of HfO2, including processes, modelling and implementation into semiconductor devices - Considers potential applications including FeCaps, FeFETs, NCFETs, FTJs and more - Provides comparison of an emerging ferroelectric material to conventional ferroelectric materials with insights to the problems of downscaling that conventional ferroelectrics face
Author | : Zhuomin M. Zhang |
Publisher | : Springer Nature |
Total Pages | : 780 |
Release | : 2020-06-23 |
Genre | : Science |
ISBN | : 3030450392 |
This substantially updated and augmented second edition adds over 200 pages of text covering and an array of newer developments in nanoscale thermal transport. In Nano/Microscale Heat Transfer, 2nd edition, Dr. Zhang expands his classroom-proven text to incorporate thermal conductivity spectroscopy, time-domain and frequency-domain thermoreflectance techniques, quantum size effect on specific heat, coherent phonon, minimum thermal conductivity, interface thermal conductance, thermal interface materials, 2D sheet materials and their unique thermal properties, soft materials, first-principles simulation, hyperbolic metamaterials, magnetic polaritons, and new near-field radiation experiments and numerical simulations. Informed by over 12 years use, the author’s research experience, and feedback from teaching faculty, the book has been reorganized in many sections and enriched with more examples and homework problems. Solutions for selected problems are also available to qualified faculty via a password-protected website.• Substantially updates and augments the widely adopted original edition, adding over 200 pages and many new illustrations;• Incorporates student and faculty feedback from a decade of classroom use;• Elucidates concepts explained with many examples and illustrations;• Supports student application of theory with 300 homework problems;• Maximizes reader understanding of micro/nanoscale thermophysical properties and processes and how to apply them to thermal science and engineering;• Features MATLAB codes for working with size and temperature effects on thermal conductivity, specific heat of nanostructures, thin-film optics, RCWA, and near-field radiation.
Author | : Werner Kern |
Publisher | : Elsevier |
Total Pages | : 881 |
Release | : 2012-12-02 |
Genre | : Technology & Engineering |
ISBN | : 0080524214 |
This sequel to the 1978 classic, Thin Film Processes, gives a clear, practical exposition of important thin film deposition and etching processes that have not yet been adequately reviewed. It discusses selected processes in tutorial overviews with implementation guide lines and an introduction to the literature. Though edited to stand alone, when taken together, Thin Film Processes II and its predecessor present a thorough grounding in modern thin film techniques. - Provides an all-new sequel to the 1978 classic, Thin Film Processes - Introduces new topics, and several key topics presented in the original volume are updated - Emphasizes practical applications of major thin film deposition and etching processes - Helps readers find the appropriate technology for a particular application
Author | : Rolf E. Hummel |
Publisher | : CRC Press |
Total Pages | : 378 |
Release | : 1995-02-24 |
Genre | : Science |
ISBN | : 9780849324840 |
Thin Films for Optical Coating emphasizes the applications of thin films, deposition of thin films, and thin film characterization. Unlike monographs on this subject, this book presents the views of many expert authors. Individual chapters span a wide arc of topics within this field of study. The book offers an introduction to usual and unusual applications of optical thin films, treating in a more qualitative way general topics such as anticounterfeiting coatings, decorative coatings, light switches, contrast enhancement coatings, multiplexers, optical memories, and more. Contributors review thin film media for optical data storage, UV broadband and narrow-band filters, and optically active thin film coatings. Ion beam sputtering and magnetron sputtering deposition methods are described in detail. Characterization techniques are provided, including Raman spectroscopy and absorption measurements. The book also offers theories on light scattering of thin dielectric films and the electromagnetic properties of nanocermet thin films. This reference incorporates recent research by the individual authors with their views of current developments in their respective fields. Of particular interest to the reader will be an assessment of the historical developments of thin film physics written by one of the fathers of thin film technology, Professor M. Auwärter.
Author | : Olaf Stenzel |
Publisher | : Springer Nature |
Total Pages | : 454 |
Release | : |
Genre | : |
ISBN | : 3031650301 |
Author | : Dong-Sing Wuu |
Publisher | : MDPI |
Total Pages | : 160 |
Release | : 2020-05-29 |
Genre | : Science |
ISBN | : 3039288377 |
This Special Issue on Functional Oxide-Based Thin-Film Materials touches on the latest advancements in several aspects related to material science: the synthesis of novel oxide, photoluminescence characteristics, photocatalytic ability, energy storage, light emitter studies, low-emissivity glass coatings, and investigations of both nanostructure and thin-film properties. It represents an amalgamation of specialists working with device applications and shedding light on the properties and behavior of thin-film oxides (e.g., GaOx, Ga2O3, HfO2, LiNbO3, and doped ZnO, among numerous others). The papers cover many aspects of thin-film science and technology, from thin film to nanostructure and from material properties to optoelectronic applications, thus reflecting the many interests of the community of scientists active in the field.
Author | : Hiroyuki Fujiwara |
Publisher | : John Wiley & Sons |
Total Pages | : 388 |
Release | : 2007-09-27 |
Genre | : Technology & Engineering |
ISBN | : 9780470060186 |
Ellipsometry is a powerful tool used for the characterization of thin films and multi-layer semiconductor structures. This book deals with fundamental principles and applications of spectroscopic ellipsometry (SE). Beginning with an overview of SE technologies the text moves on to focus on the data analysis of results obtained from SE, Fundamental data analyses, principles and physical backgrounds and the various materials used in different fields from LSI industry to biotechnology are described. The final chapter describes the latest developments of real-time monitoring and process control which have attracted significant attention in various scientific and industrial fields.
Author | : Ronald R. Willey |
Publisher | : CRC Press |
Total Pages | : 542 |
Release | : 2002-07-09 |
Genre | : Science |
ISBN | : 0824743466 |
Providing insider viewpoints and perspectives unavailable in any other text, this book presents useful guidelines and tools to produce effective coatings and films. Covering subjects ranging from materials selection and process development to successful system construction and optimization, it contains expanded discussions on design visualization, dense wavelength division multiplexing, new coating equipment, electrochromic and chemically active coatings, ion-assisted deposition, and optical monitoring sensitivity. Furnishing real-world examples and know-how, the book introduces Fourier analysis and synthesis without difficult mathematical concepts and equations.
Author | : Toru Yoshizawa |
Publisher | : CRC Press |
Total Pages | : 866 |
Release | : 2017-07-28 |
Genre | : Technology & Engineering |
ISBN | : 1351831844 |
Handbook of Optical Metrology: Principles and Applications begins by discussing key principles and techniques before exploring practical applications of optical metrology. Designed to provide beginners with an introduction to optical metrology without sacrificing academic rigor, this comprehensive text: Covers fundamentals of light sources, lenses, prisms, and mirrors, as well as optoelectronic sensors, optical devices, and optomechanical elements Addresses interferometry, holography, and speckle methods and applications Explains Moiré metrology and the optical heterodyne measurement method Delves into the specifics of diffraction, scattering, polarization, and near-field optics Considers applications for measuring length and size, displacement, straightness and parallelism, flatness, and three-dimensional shapes This new Second Edition is fully revised to reflect the latest developments. It also includes four new chapters—nearly 100 pages—on optical coherence tomography for industrial applications, interference microscopy for surface structure analysis, noncontact dimensional and profile metrology by video measurement, and optical metrology in manufacturing technology.
Author | : Pascal Richet |
Publisher | : John Wiley & Sons |
Total Pages | : 1568 |
Release | : 2021-02-05 |
Genre | : Technology & Engineering |
ISBN | : 1118799399 |
This Encyclopedia begins with an introduction summarizing itsscope and content. Glassmaking; Structure of Glass, GlassPhysics,Transport Properties, Chemistry of Glass, Glass and Light,Inorganic Glass Families, Organic Glasses, Glass and theEnvironment, Historical and Economical Aspect of Glassmaking,History of Glass, Glass and Art, and outlinepossible newdevelopments and uses as presented by the best known people in thefield (C.A. Angell, for example). Sections and chapters arearranged in a logical order to ensure overall consistency and avoiduseless repetitions. All sections are introduced by a briefintroduction and attractive illustration. Newly investigatedtopics will be addresses, with the goal of ensuring that thisEncyclopedia remains a reference work for years to come.