Nucleation And Growth Of Thin Films
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Nucleation and Growth of Metals
| Author | : Paul-Henri Haumesser |
| Publisher | : Elsevier |
| Total Pages | : 210 |
| Release | : 2016-07-29 |
| Genre | : Technology & Engineering |
| ISBN | : 0081012039 |
Nucleation and Growth of Metals: From Thin Films to Nanoparticles explores how nucleation and growth phenomena condition the morphology and related characteristics of metallic thin films and nanoparticles to help control the functional properties of these objects. The book brings a rigorous theoretical approach to nucleation and growth phenomena, with a particular focus on the essential aspects and outcomes of this theory. The author explores a general framework for the nucleation and growth of condensed phases from liquid solutions. Practical situations are extensively described, providing state-of-the art information on Cu electroplating and related processes for the fabrication of advanced interconnects and elaboration of metallic nanoparticles. - Derives the basic equations of nucleation from fundamental thermodynamic and kinetic relations - Explores the main outcomes of a range of nucleation theories - Features practical examples to further develop the theoretical aspects - Provides state-of-the art information on Cu electroplating and related processes for the fabrication of advanced interconnects and elaboration of metallic nanoparticles
Surface Science
| Author | : K. Oura |
| Publisher | : Springer Science & Business Media |
| Total Pages | : 443 |
| Release | : 2013-03-14 |
| Genre | : Science |
| ISBN | : 3662051796 |
The most important aspects of modern surface science are covered. All topics are presented in a concise and clear form accessible to a beginner. At the same time, the coverage is comprehensive and at a high technical level, with emphasis on the fundamental physical principles. Numerous examples, references, practice exercises, and problems complement this remarkably complete treatment, which will also serve as an excellent reference for researchers and practitioners. The textbook is idea for students in engineering and physical sciences.
Nucleation Theory and Growth of Nanostructures
| Author | : Vladimir G. Dubrovskii |
| Publisher | : Springer Science & Business Media |
| Total Pages | : 610 |
| Release | : 2013-12-04 |
| Genre | : Science |
| ISBN | : 3642396607 |
Semiconductor nanostructures such as nanowires are promising building blocks of future nanoelectronic, nanophotonic and nanosensing devices. Their physical properties are primarily determined by the epitaxy process which is rather different from the conventional thin film growth. This book shows how the advanced nucleation theory can be used in modeling of growth properties, morphology and crystal phase of such nanostructures. The book represents a systematic account of modern nucleation theory in open systems, nanostructure nucleation and growth mechanisms, and possibilities for tuning the nanostructure properties to the desired values.
Thin Film Physics And Devices: Fundamental Mechanism, Materials And Applications For Thin Films
| Author | : Jianguo Zhu |
| Publisher | : World Scientific |
| Total Pages | : 706 |
| Release | : 2021-06-18 |
| Genre | : Science |
| ISBN | : 9811224005 |
Thin films have an extremely broad range of applications from electronics and optics to new materials and devices. Collaborative and multidisciplinary efforts from physicists, materials scientists, engineers and others have established and advanced a field with key pillars constituting (i) the synthesis and processing of thin films, (ii) the understanding of physical properties in relation to the nanometer scale, (iii) the design and fabrication of nano-devices or devices with thin film materials as building blocks, and (iv) the design and construction of novel tools for characterization of thin films.Against the backdrop of the increasingly interdisciplinary field, this book sets off to inform the basics of thin film physics and thin film devices. Readers are systematically introduced to the synthesis, processing and application of thin films; they will also study the formation of thin films, their structure and defects, and their various properties — mechanical, electrical, semiconducting, magnetic, and superconducting. With a primary focus on inorganic thin film materials, the book also ventures on organic materials such as self-assembled monolayers and Langmuir-Blodgett films.This book will be effective as a teaching or reference material in the various disciplines, ranging from Materials Science and Engineering, Electronic Science and Engineering, Electronic Materials and Components, Semiconductor Physics and Devices, to Applied Physics and more. The original Chinese publication has been instrumental in this purpose across many Chinese universities and colleges.
Advanced Techniques for Surface Engineering
| Author | : W. Gissler |
| Publisher | : Springer Science & Business Media |
| Total Pages | : 416 |
| Release | : 1992-10-31 |
| Genre | : Technology & Engineering |
| ISBN | : 9780792320067 |
The hardest requirements on a material are in general imposed at the surface: it has to be wear resistant for tools and bearings; corrosion resistant for turbine blades; antireflecting for solar cells; and it must combine several of these properties in other applications. `Surface engineering' is the general term that incorporates all the techniques by which a surface modification can be accomplished. These techniques include both the more traditional methods, such as nitriding, boriding and carburizing, and the newer ones, such as ion implantation, laser beam melting and, in particular, coating. This book comprises and compares in a unique way all these techniques of surface engineering. It is a compilation of lectures which were held by renowned scientists and engineers in the frame of the well known `EuroCourses' of the Joint Research Centre of the Commission of the European Communities. The book is principally addressed to material and surface scientists, physicists and chemists, engineers and technicians of industries and institutes where surface engineering problems arise.
Handbook of Crystal Growth
| Author | : Tatau Nishinaga |
| Publisher | : Elsevier |
| Total Pages | : 1216 |
| Release | : 2014-11-04 |
| Genre | : Science |
| ISBN | : 0444593764 |
Volume IAHandbook of Crystal Growth, 2nd Edition (Fundamentals: Thermodynamics and Kinetics) Volume IA addresses the present status of crystal growth science, and provides scientific tools for the following volumes: Volume II (Bulk Crystal Growth) and III (Thin Film Growth and Epitaxy). Volume IA highlights thermodynamics and kinetics. After historical introduction of the crystal growth, phase equilibria, defect thermodynamics, stoichiometry, and shape of crystal and structure of melt are described. Then, the most fundamental and basic aspects of crystal growth are presented, along with the theories of nucleation and growth kinetics. In addition, the simulations of crystal growth by Monte Carlo, ab initio-based approach and colloidal assembly are thoroughly investigated. Volume IBHandbook of Crystal Growth, 2nd Edition (Fundamentals: Transport and Stability) Volume IB discusses pattern formation, a typical problem in crystal growth. In addition, an introduction to morphological stability is given and the phase-field model is explained with comparison to experiments. The field of nanocrystal growth is rapidly expanding and here the growth from vapor is presented as an example. For the advancement of life science, the crystal growth of protein and other biological molecules is indispensable and biological crystallization in nature gives many hints for their crystal growth. Another subject discussed is pharmaceutical crystal growth. To understand the crystal growth, in situ observation is extremely powerful. The observation techniques are demonstrated. Volume IA - Explores phase equilibria, defect thermodynamics of Si, stoichiometry of oxides and atomistic structure of melt and alloys - Explains basic ideas to understand crystal growth, equilibrium shape of crystal, rough-smooth transition of step and surface, nucleation and growth mechanisms - Focuses on simulation of crystal growth by classical Monte Carlo, ab-initio based quantum mechanical approach, kinetic Monte Carlo and phase field model. Controlled colloidal assembly is presented as an experimental model for crystal growth. Volume IIB - Describes morphological stability theory and phase-field model and comparison to experiments of dendritic growth - Presents nanocrystal growth in vapor as well as protein crystal growth and biological crystallization - Interprets mass production of pharmaceutical crystals to be understood as ordinary crystal growth and explains crystallization of chiral molecules - Demonstrates in situ observation of crystal growth in vapor, solution and melt on the ground and in space
Nucleation
| Author | : Dimo Kashchiev |
| Publisher | : Elsevier |
| Total Pages | : 551 |
| Release | : 2000-02-22 |
| Genre | : Technology & Engineering |
| ISBN | : 0080537839 |
This book represents a detailed and systematic account of the basic principles, developments and applications of the theory of nucleation. The formation of new phases begins with the process of nucleation and is, therefore, a widely spread phenomenon in both nature and technology. Condensation and evaporation, crystal growth, electrodeposition, melt crystallization, growth of thin films for microelectronics, volcano eruption and formation of particulate matter in space are only a few of the processes in which nucleation plays a prominent role. The book has four parts, which are devoted to the thermodynamics of nucleation, the kinetics of nucleation, the effect of various factors on nucleation and the application of the theory to other processes, which involve nucleation. The first two parts describe in detail the two basic approaches in nucleation theory - the thermodynamic and the kinetic ones. They contain derivations of the basic and most important formulae of the theory and discuss their limitations and possibilities for improvement. The third part deals with some of the factors that can affect nucleation and is a natural continuation of the first two chapters. The last part is devoted to the application of the theory to processes of practical importance such as melt crystallization and polymorphic transformation, crystal growth and growth of thin solid films, size distribution of droplets and crystallites in condensation and crystallization. The book is not just an account of the status quo in nucleation theory - throughout the book there are a number of new results as well as extensions and generalisations of existing ones.
Crystal Growth for Beginners
| Author | : Ivan V. Markov |
| Publisher | : World Scientific |
| Total Pages | : 566 |
| Release | : 2003 |
| Genre | : Science |
| ISBN | : 9812382453 |
This is the first-ever textbook on the fundamentals of nucleation, crystal growth and epitaxy. It has been written from a unified point of view and is thus a non-eclectic presentation of this interdisciplinary topic in materials science. The reader is required to possess some basic knowledge of mathematics and physics. All formulae and equations are accompanied by examples that are of technological importance. The book presents not only the fundamentals but also the state of the art in the subject. The second revised edition includes two separate chapters dealing with the effect of the Enrich-Schwoebel barrier for down-step diffusion, as well as the effect of surface active species, on the morphology of the growing surfaces. In addition, many other chapters are updated accordingly. Thus, it serves as a valuable reference book for both graduate students and researchers in materials science.
The Materials Science of Thin Films
| Author | : Milton Ohring |
| Publisher | : Academic Press |
| Total Pages | : 744 |
| Release | : 1992 |
| Genre | : Science |
| ISBN | : 9780125249904 |
Prepared as a textbook complete with problems after each chapter, specifically intended for classroom use in universities.
